Abstract: A product registration apparatus (20) includes a comparison unit (22) and a registration unit (24). The comparison unit (22) compares a first frame and a second frame of a video. The second frame is generated at a time later than the first frame. The comparison unit (22) determines a product that is not included in the first frame but included in the second frame. Then, the registration unit (24) registers the determined product (product that is not included in the first frame but included in the second frame) as a payment target.

Abstract: There is provided a checkout apparatus (10) including an image data acquisition unit(11) which acquires data on an image, an image analysis unit (12) which recognizes a product in the image, using a feature value of appearance of each of a plurality of products registered in a feature value storage unit (14) and the image data; a registration unit (13) which registers the product recognized by the image analysis unit (12) as a checkout target, and a projection unit (15) which projects an image related to a checkout process on the product and/or a placement surface of a placement platform of the product.

Abstract: Provided is a technology in which even if input is performed in a state where a hand supporting a pen or the like is placed upon a touch panel, erroneous input from the hand can be prevented. A touch panel control unit acquires from a control unit, image data in which a user who will perform input in a detection area of a touch panel was imaged. The touch panel control unit analyzes the image data, identifies an instruction input unit and a hand of a user supporting the input instruction unit, and identifies a reference input location in the detection area. On the basis of a positional relationship of the instruction input unit and the hand of the user, a predicted input area within the detection area, in which input by the input instruction unit may occur, is then set. On the basis of a detection result obtained from the touch panel, the touch panel control unit identifies and outputs an input location in the predicted input area.

Abstract: A stereoscopic display device includes: a parallax barrier in which light transmission parts that transmit light and light shielding parts that block light are formed alternately, and a display panel that displays a stereoscopic image. A plurality of pixels for displaying the stereoscopic image are formed on the display panel. Each pixel includes a plurality of color forming subpixels that contribute to the color formation of the stereoscopic image, and a contrasting subpixel that contributes to the contrast of the stereoscopic image. In each pixel, the contrasting subpixel is positioned at both ends of the pixel in a direction in which the light transmission parts and the light shielding parts are arranged alternately. In each pixel that overlaps the light shielding part when the display panel is viewed from front, the contrasting subpixel is positioned at both ends of the light shielding part.

Abstract: An object of the present invention is, in a display device to be seen by a plurality of users, to improve visual properties for a user who carries out a task such as an input, without sacrificing visual properties in the screen as a whole. A display control device illuminates a backlight to reach a first luminosity of a predetermined first display condition in a display region of a display panel. When a contact location is detected, the display control device identifies a control region for which the contact location in the display region is a reference. Then, the display control device switches from illuminating the backlight at the first display condition to illuminating the backlight at a second luminance of a second display condition in which the perceived brightness is lower than that of the first display condition, whereas the backlight is illuminated at the first luminance of the first display condition in areas other than the control region.

Abstract: A stereoscopic display device includes: a parallax barrier in which light transmission parts that transmit light and light shielding parts that block light are formed alternately, and a display panel that displays a stereoscopic image. A plurality of pixels for displaying the stereoscopic image are formed on the display panel. Each pixel includes a plurality of color forming subpixels that contribute to the color formation of the stereoscopic image, and a contrasting subpixel that contributes to the contrast of the stereoscopic image. In each pixel, the contrasting subpixel is positioned at both ends of the pixel in a direction in which the light transmission parts and the light shielding parts are arranged alternately. In each pixel that overlaps the light shielding part when the display panel is viewed from front, the contrasting subpixel is positioned at both ends of the light shielding part.

Abstract: A method of manufacturing a semiconductor device includes preparing a semiconductor wafer having a device area, an end face, and a surface peripheral area located outside the device area and between the end face and the device area. Forming a Cu layer on the semiconductor wafer and rotating the wafer in a horizontal plane. Emitting a first liquid from an edge nozzle towards the surface peripheral area which selectively removes a first unnecessary material in the surface peripheral area. Emitting a protecting liquid toward the semiconductor wafer, thereby protecting the device area from the first liquid. An angle of a longitudinal axis of the edge nozzle with respect to a tangent of the semiconductor wafer at a point, where the longitudinal axis of the edge nozzle intersects the end face of the wafer, is set in the range of 0 to 90 degrees in plan view.

Abstract: A method of manufacturing a semiconductor device includes preparing a semiconductor wafer having a device area, an end face, and a surface peripheral area located outside the device area and between the end face and the device area. Forming a Cu layer on the semiconductor wafer and rotating the wafer in a horizontal plane. Emitting a first liquid from an edge nozzle towards the surface peripheral area which selectively removes a first unnecessary material in the surface peripheral area. Emitting a protecting liquid toward the semiconductor wafer, thereby protecting the device area from the first liquid. An angle of a longitudinal axis of the edge nozzle with respect to a tangent of the semiconductor wafer at a point, where the longitudinal axis of the edge nozzle intersects the end face of the wafer, is set in the range of 0 to 90 degrees in plan view.

Abstract: An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with good controllability. The apparatus comprises (a) a rotating means for holding a semiconductor wafer and for rotating the wafer in a horizontal plane; the wafer having a device area and a surface peripheral area on its surface; the surface peripheral area being located outside the device area; and (b) an edge nozzle for emitting an etching/cleaning liquid toward a surface peripheral area of the wafer. The etching/cleaning liquid emitted from the edge nozzle selectively removes an unnecessary material existing in the surface peripheral area.

Abstract: A remote troubleshooting system comprises a vehicle that transmits vehicle data regarding a stress factor of a specific onboard component at a specified timing, and a troubleshooting server that is connected to the vehicle via a network, receives the vehicle data from the vehicle, and performs the troubleshooting of the onboard component. The server determines a precaution level based on the vehicle data from the vehicle, selects a troubleshooting program that is suitable to the precaution level determined, and transmits this to the vehicle. The vehicle replaces the troubleshooting program currently stored by a memory with the troubleshooting program received. Thereby, the reliability of the troubleshooting can be improved.

Abstract: A solid soap composition which comprises as essential ingredients a soap ingredient (a), a specific polyoxyalkylene-modified polysiloxane Co), and a tetrakis(2-hydroxyalkyl)ethylenediamine(c). It is a detergent with which makeup removal and ordinary face washing can be simultaneously conducted at a time. It lathers well and gives a fresh use feeling after washing. It can sufficiently remove not only foundations but acid pigments.

Abstract: A remote troubleshooting system comprises a vehicle that transmits vehicle data regarding a stress factor of a specific onboard component at a specified timing, and a troubleshooting server that is connected to the vehicle via a network, receives the vehicle data from the vehicle, and performs the troubleshooting of the onboard component. The server determines a precaution level based on the vehicle data from the vehicle, selects a troubleshooting program that is suitable to the precaution level determined, and transmits this to the vehicle. The vehicle replaces the troubleshooting program currently stored by a memory with the troubleshooting program received. Thereby, the reliability of the troubleshooting can be improved.

Abstract: The present invention provides a solid soap composition comprising: a soap component (a); polyoxyalkylene-modified polysiloxane (b) that is expressed by formula (1) below, (where, R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 to 60, n represents an integer of 1 to 60, a represents an integer of 1 to 10, b represents an integer of 1 to 30, and c represents an integer of 0 to 30); and tetrakis (2-hydroxyalkyl) ethylene diamine (c) that is expressed by formula (2) below, (where, R2 to R5 are the same or different and each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms), as essential components.

Abstract: For a car as merchandise specified by remote negotiation, a commercial transaction document such as an estimate, a contract, or a purchase order which decides an amount related to providing of the merchandise is prepared on the same system and stored in a database in accordance with an operation on a salesperson terminal by a salesperson (provider). A receiver such as a customer can browse (display) the prepared commercial transaction document by using a user terminal. The commercial transaction document to be browsed is provided as document data or a printing product.

Abstract: An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with good controllability. The apparatus comprises (a) a rotating means for holding a semiconductor wafer and for rotating the wafer in a horizontal plane; the wafer having a device area and a surface peripheral area on its surface; the surface peripheral area being located outside the device area; and (b) an edge nozzle for emitting an etching/cleaning liquid toward a surface peripheral area of the wafer. The etching/cleaning liquid emitted from the edge nozzle selectively removes an unnecessary material existing in the surface peripheral area.

Abstract: An etching/cleaning apparatus is provided, which makes it possible to effectively remove an unnecessary material or materials existing on a semiconductor wafer without damaging the device area with good controllability. The apparatus comprises (a) a rotating means for holding a semiconductor wafer and for rotating the wafer in a horizontal plane; the wafer having a device area and a surface peripheral area on its surface; the surface peripheral area being located outside the device area; and (b) an edge nozzle for emitting an etching/cleaning liquid toward a surface peripheral area of the wafer. The etching/cleaning liquid emitted from the edge nozzle selectively removes an unnecessary material existing in the surface peripheral area.

Abstract: In an apparatus, after completion of a CMP (i.e., chemical mechanical polishing) operation of a semiconductor wafer, the thus polished wafer is temporarily stored in a water tank before it is subjected to a post-CMP cleaning operation. During its storage period in the water tank, the wafer is prevented from being chemically attacked by an oxidizing agent contained in an abrasive used in the CMP operation. The apparatus includes: the water tank for storing the wafer therein; a pure water supply pipe for supplying pure water to the water tank; an anticorrosion agent supply pipe for supplying an anticorrosion agent to the pure water; a drain pipe connected with a lower portion of the water tank to discharge the water from the water tank; a return pipe for returning the discharged water to an upper portion of the water tank through a pump and a filter, the return pipe branching-off from the drain pipe; and, valves mounted on these pipes.