Patents by Inventor Shiuan Chen

Shiuan Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9535317
    Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: January 3, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Pei-Cheng Hsu, Chih-Cheng Lin, Ta-Cheng Lien, Wei-Shiuan Chen, Hsin-Chang Lee, Anthony Yen
  • Patent number: 9442391
    Abstract: One embodiment relates to a method to achieve enhanced overlay control while maintaining manufacturing throughput for a fabrication process. Locations of a plurality of alignment structures on a wafer comprising a plurality of reticle fields are determined with a layout tool to define a layout-based wafer map. The topography of the wafer is then measured as a function of wafer position by a surface measuring tool. The layout-based wafer map is then projected onto the measured wafer topography to define a modeled wafer map. A subset of alignment structure locations are measured with an alignment tool in an in-line fabrication flow so as not to delay subsequent fabrication steps. Disagreement between the measured alignment structure locations and modeled alignment structure locations is then minimized mathematically to enhance overlay control while maintaining manufacturing throughput.
    Type: Grant
    Filed: July 16, 2013
    Date of Patent: September 13, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Han-Ming Hsieh, Li-Shiuan Chen, Chung-Hao Chang, Li-Kong Turn
  • Publication number: 20160187770
    Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.
    Type: Application
    Filed: December 24, 2014
    Publication date: June 30, 2016
    Inventors: Pei-Cheng Hsu, Chih-Cheng Lin, Ta-Cheng Lien, Wei-Shiuan Chen, Hsin-Chang Lee, Anthony Yen
  • Publication number: 20140278213
    Abstract: One embodiment relates to a method to achieve enhanced overlay control while maintaining manufacturing throughput for a fabrication process. Locations of a plurality of alignment structures on a wafer comprising a plurality of reticle fields are determined with a layout tool to define a layout-based wafer map. The topography of the wafer is then measured as a function of wafer position by a surface measuring tool. The layout-based wafer map is then projected onto the measured wafer topography to define a modeled wafer map. A subset of alignment structure locations are measured with an alignment tool in an in-line fabrication flow so as not to delay subsequent fabrication steps. Disagreement between the measured alignment structure locations and modeled alignment structure locations is then minimized mathematically to enhance overlay control while maintaining manufacturing throughput.
    Type: Application
    Filed: July 16, 2013
    Publication date: September 18, 2014
    Inventors: Han-Ming Hsieh, Li-Shiuan Chen, Chung-Hao Chang, Li-Kong Turn
  • Patent number: 8476003
    Abstract: An iterative rinse for fabrication of semiconductor devices is described. The iterative rinse includes a plurality of rinse cycles, wherein each of the plurality of rinse cycles has a different resistivity. The plurality of rinse cycles may include a first rinse of a semiconductor substrate with de-ionized (DI) water and carbon dioxide (CO2), followed by a second rinse the semiconductor substrate with DI water and CO2. The first rinse has a first resistivity; the second rinse has a second resistivity lower than the first resistivity.
    Type: Grant
    Filed: March 9, 2011
    Date of Patent: July 2, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Yao Lee, Wei-Hong Chuang, Li-Shiuan Chen, Ping-Hsi Yang
  • Publication number: 20120231395
    Abstract: An iterative rinse for fabrication of semiconductor devices is described. The iterative rinse includes a plurality of rinse cycles, wherein each of the plurality of rinse cycles has a different resistivity. The plurality of rinse cycles may include a first rinse of a semiconductor substrate with de-ionized (DI) water and carbon dioxide (CO2), followed by a second rinse the semiconductor substrate with DI water and CO2. The first rinse has a first resistivity; the second rinse has a second resistivity lower than the first resistivity.
    Type: Application
    Filed: March 9, 2011
    Publication date: September 13, 2012
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
    Inventors: Yung-Yao Lee, Wei-Hong Chuang, Li-Shiuan Chen, Ping-Hsi Yang
  • Patent number: 7956526
    Abstract: An organic electro-luminescence device including an anode, a cathode, an organic light emitting layer and a hole-transporting layer is provided. The cathode has a calcium electrode and an aluminum electrode adjacent thereto. The organic light emitting layer is disposed between the anode and the calcium electrode, and has a polymer, a phosphorescence dopant and an organic electron-transporting material, wherein a ratio of contents of the organic electron-transporting material to contents of the polymer in the organic light emitting layer is substantially between 0.1 and 1. The organic electron-transporting material is 1,3-bis(N,Nt-butyl-phenyl)-1,3,4-oxadiazole. The hole-transporting layer is disposed between the light emitting layer and the anode.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: June 7, 2011
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Fang-Chung Chen, Yung-Shiuan Chen, Shang-Chieh Chien, Chi-Neng Mo, Chien-Lung Tsou, Jan-Tian Lian
  • Publication number: 20100141121
    Abstract: An organic electro-luminescence device including an anode, a cathode, an organic light emitting layer and a hole-transporting layer is provided. The cathode has a calcium electrode and an aluminum electrode adjacent thereto. The organic light emitting layer is disposed between the anode and the calcium electrode, and has a polymer, a phosphorescence dopant and an organic electron-transporting material, wherein a ratio of contents of the organic electron-transporting material to contents of the polymer in the organic light emitting layer is substantially between 0.1 and 1. The organic electron-transporting material is 1,3-bis(N,Nt-butyl-phenyl)-1,3,4-oxadiazole. The hole-transporting layer is disposed between the light emitting layer and the anode.
    Type: Application
    Filed: February 5, 2009
    Publication date: June 10, 2010
    Applicant: Chunghwa Picture Tubes, LTD.
    Inventors: Fang-Chung Chen, Yung-Shiuan Chen, Sheng-Chieh Chien, Chi-Neng Mo, Chien-Lung Tsou, Jan-Tian Lian
  • Patent number: 7223548
    Abstract: The invention relates to assays for screening for chemicals which affect the binding between proteins comprising an SH3 binding motif (such as Proline-rich Nuclear Receptor Co-regulatory protein (PNRC)) and nuclear receptor proteins. Compounds which affect the binding of PNRC to nuclear receptors can affect the expression of genes whose expression is under the control of nuclear receptors to which PNRC binds. PNRC interacts with the orphan receptors SF1 and ERR?1 in a ligand-independent manner and interacts with the ligand-binding domains of nuclear receptors such as ER, AR, PR, TR, BAR, and RXR in a ligand-dependent manner. A 23-amino acid region in the carboxy-terminal proline-rich region which contains an SH3-binding motif is sufficient for the interaction with nuclear receptors.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: May 29, 2007
    Assignee: City of Hope
    Inventors: Shiuan Chen, Dujin Zhou
  • Publication number: 20060241094
    Abstract: Disclosed are compositions for treating an estrogen receptor (ER) or estrogen related receptor (ERR) mediated disorder, comprising a therapeutically effective amount of a compound selected from the group consisting of Compound Nos. 1-9, 7-2, 7-4, 7-5, 7-7, 7-8, 8-2 and 3-15 set forth herein or a pharmaceutically acceptable salt thereof, wherein said compound modulates estrogen receptors and/or estrogen-related receptors and methods for use of said compositions.
    Type: Application
    Filed: April 6, 2006
    Publication date: October 26, 2006
    Inventor: Shiuan Chen
  • Patent number: 7078127
    Abstract: A method for producing a positive electrode material adapted to the Li-ion secondary batteries is disclosed. The produced material has the following formula (I), Li1+xMn2?yMyO4 ??(I) wherein M is Mg, Al, Cr, Fe, Co, or Ni; 0?x?0.4, and 0?y?0.2. The method is achieved by co-precipitating a gel salts with an organic acid. First, salts of Li, Mn and M are mixed with at least a solvent to form an initial solution. The mole ratio of Li, Mn and M ions in their respective salts is (1+x):(2?y):y. Next, at least a chelate is added into the initial solution to form a suspension, which is then filtered to obtain a co-precipitate. Finally, the co-precipitate is calcined and heated to obtain the final product.
    Type: Grant
    Filed: June 11, 2003
    Date of Patent: July 18, 2006
    Assignee: Tatung Co., Ltd.
    Inventors: She-Huang Wu, Yung-Jen Lin, Mu-Rong Yang, Wen-Jen Liu, Yi-Shiuan Chen
  • Publication number: 20060106092
    Abstract: Anti-aromatase procyanidin B suppresses estrogen production, thus preventing or treating estrogen-related diseases such as breast tumors, hormone-dependent tumors and hormone-related disorders.
    Type: Application
    Filed: November 7, 2005
    Publication date: May 18, 2006
    Inventor: Shiuan Chen
  • Patent number: 6972178
    Abstract: Assays are presented for screening for chemicals which affect the binding between proteins comprising an SH3 binding motif and nuclear receptor proteins. PNRC (Proline-rich Nuclear Receptor Co-regulatory protein) is a co-regulatory protein comprising an SH3 binding motif and was identified using bovine SF1 as the bait in a yeast two-hybrid screening of a human mammary gland cDNA expression library. This nuclear receptor coactivator binds to several nuclear receptors including those which regulate the aromatase gene which is involved in breast cancer. Compounds which affect the binding of PNRC to nuclear receptors can affect the expression of the aromatase gene as well as of other genes whose expression is under the control of nuclear receptors to which PNRC binds. PNRC is unique in that it has a molecular weight of 35 kDa, significantly smaller than most of the co-regulatory proteins reported so far, and it is proline-rich.
    Type: Grant
    Filed: April 19, 2000
    Date of Patent: December 6, 2005
    Assignee: City of Hope
    Inventors: Shiuan Chen, Dujin Zhou
  • Publication number: 20050202408
    Abstract: Assays are presented for screening for chemicals which affect the binding between proteins comprising an SH3 binding motif and nuclear receptor proteins. PNRC (Proline-rich Nuclear Receptor Co-regulatory protein) is a co-regulatory protein comprising an SH3 binding motif and was identified using bovine SF1 as the bait in a yeast two-hybrid screening of a human mammary gland cDNA expression library. This nuclear receptor coactivator binds to several nuclear receptors including those which regulate the aromatase gene which is involved in breast cancer. Compounds which affect the binding of PNRC to nuclear receptors can affect the expression of the aromatase gene as well as of other genes whose expression is under the control of nuclear receptors to which PNRC binds. PNRC is unique in that it has a molecular weight of 35 kDa, significantly smaller than most of the co-regulatory proteins reported so far, and it is proline-rich.
    Type: Application
    Filed: January 14, 2005
    Publication date: September 15, 2005
    Applicant: City of Hope
    Inventors: Shiuan Chen, Dujin Zhou
  • Publication number: 20030235758
    Abstract: A positive electrode material of a Li-ion secondary battery is disclosed. This positive electrode material has a formula of Li1+xMn2−yMyO4−zClz, wherein M can be magnesium (Mg), aluminum (Al), chromium (Cr), iron (Fe), cobalt (Co) or nickel (Ni) ions, 0≦x≦0.4, 0≦y≦0.3, and 0.01≦z≦1.0. By means of replacing some oxygen ions of this material with chlorine ions, the crystalline structure thereof can be varied and thus longer life cycle and better stability at high temperature can be achieved.
    Type: Application
    Filed: June 11, 2003
    Publication date: December 25, 2003
    Applicant: Tatung Co., Ltd.
    Inventors: She-Huang Wu, Yung-Jen Lin, Mu-Rong Yang, Wen-Jen Liu, Yi-Shiuan Chen
  • Publication number: 20030235527
    Abstract: A method for producing a positive electrode material adapted to the Li-ion secondary batteries is disclosed.
    Type: Application
    Filed: June 11, 2003
    Publication date: December 25, 2003
    Applicant: Tatung Co., Ltd.
    Inventors: She-Huang Wu, Yung-Jen Lin, Mu-Rong Yang, Wen-Jen Liu, Yi-Shiuan Chen
  • Publication number: 20030235528
    Abstract: A method for producing a positive electrode material of Li-ion secondary batteries is disclosed.
    Type: Application
    Filed: June 11, 2003
    Publication date: December 25, 2003
    Applicant: Tatung Co., Ltd.
    Inventors: She-Huang Wu, Yung-Jen Lin, Mu-Rong Yang, Wen-Jen Liu, Yi-Shiuan Chen