Patents by Inventor Shogo Matsumaru
Shogo Matsumaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10324377Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.Type: GrantFiled: June 6, 2016Date of Patent: June 18, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Taku Hirayama, Daisuke Kawana, Yoshitaka Komuro, Masatoshi Arai, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Tatsuya Fujii
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Patent number: 10101658Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Ra01 represents an aromatic hydrocarbon group optionally having a substituent).Type: GrantFiled: January 14, 2016Date of Patent: October 16, 2018Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Taku Hirayama, Daisuke Kawana, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Masahito Yahagi, Tatsuya Fujii
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Publication number: 20160363860Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.Type: ApplicationFiled: June 6, 2016Publication date: December 15, 2016Inventors: Taku HIRAYAMA, Daisuke KAWANA, Yoshitaka KOMURO, Masatoshi ARAI, Shogo MATSUMARU, Kenta SUZUKI, Takashi KAMIZONO, Tatsuya FUJII
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Publication number: 20160209745Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator (B) which generates acid upon exposure, the base component (A) including a resin component having a structural unit (a0) represented by general formula (a0-1) shown below, and the acid generator component (B) containing a compound having a cation moiety having an electron withdrawing group (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Ya represents a carbon atom; Xa represents an atomic group required to form an alicyclic hydrocarbon group with Ya; and Ra01 represents an aromatic hydrocarbon group optionally having a substituent).Type: ApplicationFiled: January 14, 2016Publication date: July 21, 2016Inventors: Taku HIRAYAMA, Daisuke KAWANA, Shogo MATSUMARU, Kenta SUZUKI, Takashi KAMIZONO, Masahito YAHAGI, Tatsuya FUJII
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Patent number: 8349543Abstract: A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a metal oxide film on the surface of each resist pattern, forming a second resist film by applying a second chemically amplified resist composition onto the support having the coated patterns formed thereon, and selectively exposing and then developing the second resist film, thereby forming a pattern composed of the plurality of coated patterns and a resist pattern formed in the second resist film onto the support.Type: GrantFiled: June 18, 2007Date of Patent: January 8, 2013Assignee: Tokyo Ohka Kogyo Co. Ltd.Inventors: Shogo Matsumaru, Ryoji Watanabe, Toshiyuki Ogata
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Patent number: 8304163Abstract: A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.Type: GrantFiled: December 29, 2010Date of Patent: November 6, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada
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Patent number: 8101013Abstract: A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.Type: GrantFiled: August 24, 2006Date of Patent: January 24, 2012Assignees: Tokyo Ohka Kogyo Co., Ltd., RikenInventors: Shogo MatsuMaru, Hideo Hada, Shingenori Fujikawa, Toyoki Kunitake
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Patent number: 8034536Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.Type: GrantFiled: May 26, 2009Date of Patent: October 11, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Shogo Matsumaru, Sho Abe
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Patent number: 7943284Abstract: A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.Type: GrantFiled: April 17, 2006Date of Patent: May 17, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada
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Patent number: 7932013Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.Type: GrantFiled: June 16, 2006Date of Patent: April 26, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Shogo Matsumaru, Toshiyuki Ogata, Kiyoshi Ishikawa, Hideo Hada, Shigenori Fujikawa, Toyoki Kunitake
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Publication number: 20110091810Abstract: A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.Type: ApplicationFiled: December 29, 2010Publication date: April 21, 2011Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Daiju SHIONO, Taku Hirayama, Toshiyuki OGATA, Shogo MATSUMARU, Hideo HADA
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Patent number: 7851127Abstract: The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.Type: GrantFiled: September 22, 2005Date of Patent: December 14, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada
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Patent number: 7829259Abstract: A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the ?-position to the hydroxyl group has at least one electron attractive group.Type: GrantFiled: February 4, 2009Date of Patent: November 9, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hideo Hada, Masaru Takeshita, Shogo Matsumaru, Hiroaki Shimizu
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Publication number: 20100028799Abstract: A resist composition for immersion exposure including a resin component (A) that exhibits changed alkali solubility under the action of acid, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) having an acid-generating group that generates acid upon irradiation.Type: ApplicationFiled: December 1, 2005Publication date: February 4, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Hiromitsu Tsuji, Shogo Matsumaru
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Publication number: 20100003622Abstract: A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a metal oxide film on the surface of each resist pattern, forming a second resist film by applying a second chemically amplified resist composition onto the support having the coated patterns formed thereon, and selectively exposing and then developing the second resist film, thereby forming a pattern composed of the plurality of coated patterns and a resist pattern formed in the second resist film onto the support.Type: ApplicationFiled: June 18, 2007Publication date: January 7, 2010Applicant: Tokyo Ohka Kogy Co., LtdInventors: Shogo Matsumaru, Ryoji Watanabe, Toshiyuki Ogata
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Publication number: 20090297980Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.Type: ApplicationFiled: May 26, 2009Publication date: December 3, 2009Inventors: Jun Iwashita, Shogo Matsumaru, Sho Abe
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Patent number: 7592123Abstract: A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the ?-position to the hydroxyl group has at least one electron attractive group.Type: GrantFiled: June 2, 2004Date of Patent: September 22, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hideo Hada, Masaru Takeshita, Shogo Matsumaru, Hiroaki Shimizu
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Publication number: 20090162784Abstract: The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1) derived from an (a-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group.Type: ApplicationFiled: September 22, 2005Publication date: June 25, 2009Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada
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Publication number: 20090142700Abstract: A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the ?-position to the hydroxyl group has at least one electron attractive group.Type: ApplicationFiled: February 4, 2009Publication date: June 4, 2009Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hideo Hada, Masaru Takeshita, Shogo Matsumaru, Hiroaki Shimizu
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Publication number: 20090134119Abstract: A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.Type: ApplicationFiled: August 24, 2006Publication date: May 28, 2009Applicants: TOKYO OHKA KOGYO CO., LTD., RIKENInventors: Shogo Matsumaru, Hideo Hada, Fujikawa Shigenori, Toyoki Kunitake