Patents by Inventor Shohei Kataoka

Shohei Kataoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7829609
    Abstract: A composition comprising an organic crystal having a minor axis length of from 3 to 100 nm and a major axis length of from 10 to 2,000 nm and a matrix material, wherein the organic crystal satisfies that (1) a surfactant is adsorbed on the organic crystal, (2) an inorganic ion is adsorbed on the organic crystal, (3) silicon oxide, titanium oxide, aluminum oxide, zirconium oxide, barium oxide or hydroxyapatite is bonded with the organic crystal, or (4) the organic crystal is modified with a group represented by the following formula (1): wherein L1 represents —O—, —S—, —CO— or others, n is 0 to 4, and R1 represents an organic group.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: November 9, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Tetsufumi Takamoto, Takahiro Ishizuka, Shohei Kataoka
  • Publication number: 20100248149
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.
    Type: Application
    Filed: March 23, 2010
    Publication date: September 30, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka Tsuchimura, Hidenori Takahashi, Takayuki Ito, Takeshi Inasaki, Shohei Kataoka
  • Publication number: 20100248143
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less, (A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation, (B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and (C) a repeating unit containing a carbon-carbon unsaturated bond.
    Type: Application
    Filed: March 29, 2010
    Publication date: September 30, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Takayuki ITO, Hidenori TAKAHASHI, Tomotaka TSUCHIMURA, Shohei KATAOKA, Takeshi INASAKI
  • Publication number: 20090029169
    Abstract: A composition comprising an organic crystal having a minor axis length of from 3 to 100 nm and a major axis length of from 10 to 2,000 nm and a matrix material, wherein the organic crystal satisfies that (1) a surfactant is adsorbed on the organic crystal, (2) an inorganic ion is adsorbed on the organic crystal, (3) silicon oxide, titanium oxide, aluminum oxide, zirconium oxide, barium oxide or hydroxyapatite is bonded with the organic crystal, or (4) the organic crystal is modified with a group represented by the following formula (1): wherein L1 represents —O—, —S—, —CO— or others, n is 0 to 4, and R1 represents an organic group.
    Type: Application
    Filed: July 25, 2008
    Publication date: January 29, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Tetsufumi Takamoto, Takahiro Ishizuka, Shohei Kataoka