Patents by Inventor Shrawan Singhal
Shrawan Singhal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10336062Abstract: Systems and methods for precision inkjet printing are disclosed. A method determining an actuation parameter associated with a pressure waveform. Based on the pressure waveform, the method also includes actuating a print head to eject a droplet from a nozzle and acquiring an image of the droplet. The method further includes processing the acquired image to estimate a volume of the droplet and based on the estimated volume of the droplet and a target volume, adjusting the actuation parameter.Type: GrantFiled: March 13, 2017Date of Patent: July 2, 2019Assignee: Board of Regents, The University of Texas SystemInventors: S. V. Sreenivasan, Brent Snyder, Miaomiao Yang, Shrawan Singhal, Ovadia Abed
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Publication number: 20190139456Abstract: A portable system to enable broad access to micro- and nano-scale technologies. The portable system includes a fabrication module configured to enable creation of a small tech device or structure or to enable demonstration of a small tech process. The portable system further includes a metrology module configured to allow measuring, testing or characterizing a property of the small tech device, structure or process. Furthermore, the portable system includes a quality control module configured to validate results from the metrology module against a set of expected results measured independently.Type: ApplicationFiled: March 21, 2017Publication date: May 9, 2019Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Ovadia Abed, Lawrence Dunn, Aseem Sayal, Benjamin Eynon
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Patent number: 10026609Abstract: A method for template fabrication of ultra-precise nanoscale shapes. Structures with a smooth shape (e.g., circular cross-section pillars) are formed on a substrate using electron beam lithography. The structures are subject to an atomic layer deposition of a dielectric interleaved with a deposition of a conductive film leading to nanoscale sharp shapes with features that exceed electron beam resolution capability of sub-10 nm resolution. A resist imprint of the nanoscale sharp shapes is performed using J-FIL. The nanoscale sharp shapes are etched into underlying functional films on the substrate forming a nansohaped template with nanoscale sharp shapes that include sharp corners and/or ultra-small gaps. In this manner, sharp shapes can be retained at the nanoscale level. Furthermore, in this manner, imprint based shape control for novel shapes beyond elementary nanoscale structures, such as dots and lines, can occur at the nanoscale level.Type: GrantFiled: October 23, 2015Date of Patent: July 17, 2018Assignee: Board of Regents, The University of Texas SystemInventors: Sidlgata V. Sreenivasan, Anshuman Cherala, Meghali Chopra, Roger Bonnecaze, Ovadia Abed, Bailey Yin, Akhila Mallavarapu, Shrawan Singhal, Brian Gawlik
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Patent number: 9987653Abstract: A method for depositing thin films using a nominally curved substrate. Drops of a pre-cursor liquid organic material are dispensed at a plurality of locations on a nominally curved substrate by one or more inkjets. A superstrate is brought down on the dispensed drops to close the gap between the superstrate and the substrate thereby allowing the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate is enabled to occur after a duration of time. The contiguous film is then cured to solidify it into a solid. The solid is separated from the superstrate thereby leaving a polymer film on the substrate. In this manner, such a technique for film deposition has the film thickness range, resolution and variation required to be applicable for a broad spectrum of applications.Type: GrantFiled: October 14, 2016Date of Patent: June 5, 2018Assignee: Board of Regents, The University of Texas SystemInventors: Sidlgata V. Sreenivasan, Shrawan Singhal
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Publication number: 20170333940Abstract: A method and alignment system for minimizing errors in the deposition of films of tailored thickness. A first position on a stage is identified for optimal placement of a downward looking microscope (DLM) and an upward looking microscope (ULM) when alignment marks on the DLM and ULM are aligned, where the DLM is attached to a bridge and the ULM is attached to the stage. A second position on the stage is identified when the ULM on the stage is aligned with the alignment marks on a metrology tool. A surface of a chucked substrate affixed to the stage is then measured. A map between a substrate coordinate system and a metrology coordinate system may then be obtained using the measured surface of the chucked substrate with the first and second positions.Type: ApplicationFiled: May 19, 2017Publication date: November 23, 2017Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
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Publication number: 20170259560Abstract: Systems and methods for precision inkjet printing are disclosed. A method determining an actuation parameter associated with a pressure waveform. Based on the pressure waveform, the method also includes actuating a print head to eject a droplet from a nozzle and acquiring an image of the droplet. The method further includes processing the acquired image to estimate a volume of the droplet and based on the estimated volume of the droplet and a target volume, adjusting the acquisition parameter.Type: ApplicationFiled: March 13, 2017Publication date: September 14, 2017Inventors: S.V. Sreenivasan, Brent Snyder, Miaomiao Yang, Shrawan Singhal, Ovadia Abed
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Patent number: 9718096Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate is held in a roll-to-roll configuration such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.Type: GrantFiled: July 12, 2016Date of Patent: August 1, 2017Assignee: Board of Regents, The University of Texas SystemInventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Ovadia Abed, Lawrence Dunn
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Publication number: 20170106399Abstract: A method for depositing thin films using a nominally curved substrate. Drops of a pre-cursor liquid organic material are dispensed at a plurality of locations on a nominally curved substrate by one or more inkjets. A superstrate is brought down on the dispensed drops to close the gap between the superstrate and the substrate thereby allowing the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate is enabled to occur after a duration of time. The contiguous film is then cured to solidify it into a solid. The solid is separated from the superstrate thereby leaving a polymer film on the substrate. In this manner, such a technique for film deposition has the film thickness range, resolution and variation required to be applicable for a broad spectrum of applications.Type: ApplicationFiled: October 14, 2016Publication date: April 20, 2017Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
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Publication number: 20160318066Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate is held in a roll-to-roll configuration such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.Type: ApplicationFiled: July 12, 2016Publication date: November 3, 2016Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Ovadia Abed, Lawrence Dunn
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Patent number: 9415418Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate that has been bowed due to a backside pressure is brought down such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.Type: GrantFiled: August 18, 2014Date of Patent: August 16, 2016Assignee: Board of Regents, The University of Texas SystemInventors: Sidlgata V. Sreenivasan, Shrawan Singhal
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Publication number: 20160118249Abstract: A method for template fabrication of ultra-precise nanoscale shapes. Structures with a smooth shape (e.g., circular cross-section pillars) are formed on a substrate using electron beam lithography. The structures are subject to an atomic layer deposition of a dielectric interleaved with a deposition of a conductive film leading to nanoscale sharp shapes with features that exceed electron beam resolution capability of sub-10 nm resolution. A resist imprint of the nanoscale sharp shapes is performed using J-FIL. The nanoscale sharp shapes are etched into underlying functional films on the substrate forming a nansohaped template with nanoscale sharp shapes that include sharp corners and/or ultra-small gaps. In this manner, sharp shapes can be retained at the nanoscale level. Furthermore, in this manner, imprint based shape control for novel shapes beyond elementary nanoscale structures, such as dots and lines, can occur at the nanoscale level.Type: ApplicationFiled: October 23, 2015Publication date: April 28, 2016Inventors: Sidlgata V. Sreenivasan, Anshuman Cherala, Meghali Chopra, Roger Bonnecaze, Ovadia Abed, Bailey Yin, Akhila Mallavarapu, Shrawan Singhal, Brian Gawlik
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Publication number: 20150048050Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate that has been bowed due to a backside pressure is brought down such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.Type: ApplicationFiled: August 18, 2014Publication date: February 19, 2015Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
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Patent number: 8187515Abstract: Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.Type: GrantFiled: March 31, 2009Date of Patent: May 29, 2012Assignees: Molecular Imprints, Inc., Board of Regents, The University of TexasInventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung Jin Choi, Ian Matthew McMackin
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Patent number: 7815824Abstract: Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.Type: GrantFiled: February 25, 2009Date of Patent: October 19, 2010Assignees: Molecular Imprints, Inc., Board of Regents, The University of TexasInventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung-Jin Choi
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Publication number: 20090243153Abstract: Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.Type: ApplicationFiled: March 31, 2009Publication date: October 1, 2009Applicants: MOLECULAR IMPRINTS, INC., BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMInventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung Jin Choi, Ian Matthew McMackin
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Publication number: 20090214761Abstract: Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.Type: ApplicationFiled: February 25, 2009Publication date: August 27, 2009Applicants: MOLECULAR IMPRINTS, INC., BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMInventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung-Jin Choi
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Publication number: 20090133751Abstract: Solar cells having at least one electron acceptor layer and at least one electron donor layer forming a patterned p-n junction are described. Electron acceptor layer may be formed by patterning formable N-type material between a template and an electrode layer, and solidifying the formable N-type material.Type: ApplicationFiled: November 26, 2008Publication date: May 28, 2009Applicants: MOLECULAR IMPRINTS, INC., BOARD OF REGENTS, THE UNIVERSITY OF TEXASInventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Christopher Mark Melliar-Smith, Frank Y. Xu, Byung-Jin Choi