Patents by Inventor Shrawan Singhal

Shrawan Singhal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10336062
    Abstract: Systems and methods for precision inkjet printing are disclosed. A method determining an actuation parameter associated with a pressure waveform. Based on the pressure waveform, the method also includes actuating a print head to eject a droplet from a nozzle and acquiring an image of the droplet. The method further includes processing the acquired image to estimate a volume of the droplet and based on the estimated volume of the droplet and a target volume, adjusting the actuation parameter.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: July 2, 2019
    Assignee: Board of Regents, The University of Texas System
    Inventors: S. V. Sreenivasan, Brent Snyder, Miaomiao Yang, Shrawan Singhal, Ovadia Abed
  • Publication number: 20190139456
    Abstract: A portable system to enable broad access to micro- and nano-scale technologies. The portable system includes a fabrication module configured to enable creation of a small tech device or structure or to enable demonstration of a small tech process. The portable system further includes a metrology module configured to allow measuring, testing or characterizing a property of the small tech device, structure or process. Furthermore, the portable system includes a quality control module configured to validate results from the metrology module against a set of expected results measured independently.
    Type: Application
    Filed: March 21, 2017
    Publication date: May 9, 2019
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Ovadia Abed, Lawrence Dunn, Aseem Sayal, Benjamin Eynon
  • Patent number: 10026609
    Abstract: A method for template fabrication of ultra-precise nanoscale shapes. Structures with a smooth shape (e.g., circular cross-section pillars) are formed on a substrate using electron beam lithography. The structures are subject to an atomic layer deposition of a dielectric interleaved with a deposition of a conductive film leading to nanoscale sharp shapes with features that exceed electron beam resolution capability of sub-10 nm resolution. A resist imprint of the nanoscale sharp shapes is performed using J-FIL. The nanoscale sharp shapes are etched into underlying functional films on the substrate forming a nansohaped template with nanoscale sharp shapes that include sharp corners and/or ultra-small gaps. In this manner, sharp shapes can be retained at the nanoscale level. Furthermore, in this manner, imprint based shape control for novel shapes beyond elementary nanoscale structures, such as dots and lines, can occur at the nanoscale level.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: July 17, 2018
    Assignee: Board of Regents, The University of Texas System
    Inventors: Sidlgata V. Sreenivasan, Anshuman Cherala, Meghali Chopra, Roger Bonnecaze, Ovadia Abed, Bailey Yin, Akhila Mallavarapu, Shrawan Singhal, Brian Gawlik
  • Patent number: 9987653
    Abstract: A method for depositing thin films using a nominally curved substrate. Drops of a pre-cursor liquid organic material are dispensed at a plurality of locations on a nominally curved substrate by one or more inkjets. A superstrate is brought down on the dispensed drops to close the gap between the superstrate and the substrate thereby allowing the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate is enabled to occur after a duration of time. The contiguous film is then cured to solidify it into a solid. The solid is separated from the superstrate thereby leaving a polymer film on the substrate. In this manner, such a technique for film deposition has the film thickness range, resolution and variation required to be applicable for a broad spectrum of applications.
    Type: Grant
    Filed: October 14, 2016
    Date of Patent: June 5, 2018
    Assignee: Board of Regents, The University of Texas System
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
  • Publication number: 20170333940
    Abstract: A method and alignment system for minimizing errors in the deposition of films of tailored thickness. A first position on a stage is identified for optimal placement of a downward looking microscope (DLM) and an upward looking microscope (ULM) when alignment marks on the DLM and ULM are aligned, where the DLM is attached to a bridge and the ULM is attached to the stage. A second position on the stage is identified when the ULM on the stage is aligned with the alignment marks on a metrology tool. A surface of a chucked substrate affixed to the stage is then measured. A map between a substrate coordinate system and a metrology coordinate system may then be obtained using the measured surface of the chucked substrate with the first and second positions.
    Type: Application
    Filed: May 19, 2017
    Publication date: November 23, 2017
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
  • Publication number: 20170259560
    Abstract: Systems and methods for precision inkjet printing are disclosed. A method determining an actuation parameter associated with a pressure waveform. Based on the pressure waveform, the method also includes actuating a print head to eject a droplet from a nozzle and acquiring an image of the droplet. The method further includes processing the acquired image to estimate a volume of the droplet and based on the estimated volume of the droplet and a target volume, adjusting the acquisition parameter.
    Type: Application
    Filed: March 13, 2017
    Publication date: September 14, 2017
    Inventors: S.V. Sreenivasan, Brent Snyder, Miaomiao Yang, Shrawan Singhal, Ovadia Abed
  • Patent number: 9718096
    Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate is held in a roll-to-roll configuration such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: August 1, 2017
    Assignee: Board of Regents, The University of Texas System
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Ovadia Abed, Lawrence Dunn
  • Publication number: 20170106399
    Abstract: A method for depositing thin films using a nominally curved substrate. Drops of a pre-cursor liquid organic material are dispensed at a plurality of locations on a nominally curved substrate by one or more inkjets. A superstrate is brought down on the dispensed drops to close the gap between the superstrate and the substrate thereby allowing the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate is enabled to occur after a duration of time. The contiguous film is then cured to solidify it into a solid. The solid is separated from the superstrate thereby leaving a polymer film on the substrate. In this manner, such a technique for film deposition has the film thickness range, resolution and variation required to be applicable for a broad spectrum of applications.
    Type: Application
    Filed: October 14, 2016
    Publication date: April 20, 2017
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
  • Publication number: 20160318066
    Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate is held in a roll-to-roll configuration such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.
    Type: Application
    Filed: July 12, 2016
    Publication date: November 3, 2016
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Ovadia Abed, Lawrence Dunn
  • Patent number: 9415418
    Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate that has been bowed due to a backside pressure is brought down such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.
    Type: Grant
    Filed: August 18, 2014
    Date of Patent: August 16, 2016
    Assignee: Board of Regents, The University of Texas System
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
  • Publication number: 20160118249
    Abstract: A method for template fabrication of ultra-precise nanoscale shapes. Structures with a smooth shape (e.g., circular cross-section pillars) are formed on a substrate using electron beam lithography. The structures are subject to an atomic layer deposition of a dielectric interleaved with a deposition of a conductive film leading to nanoscale sharp shapes with features that exceed electron beam resolution capability of sub-10 nm resolution. A resist imprint of the nanoscale sharp shapes is performed using J-FIL. The nanoscale sharp shapes are etched into underlying functional films on the substrate forming a nansohaped template with nanoscale sharp shapes that include sharp corners and/or ultra-small gaps. In this manner, sharp shapes can be retained at the nanoscale level. Furthermore, in this manner, imprint based shape control for novel shapes beyond elementary nanoscale structures, such as dots and lines, can occur at the nanoscale level.
    Type: Application
    Filed: October 23, 2015
    Publication date: April 28, 2016
    Inventors: Sidlgata V. Sreenivasan, Anshuman Cherala, Meghali Chopra, Roger Bonnecaze, Ovadia Abed, Bailey Yin, Akhila Mallavarapu, Shrawan Singhal, Brian Gawlik
  • Publication number: 20150048050
    Abstract: An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate that has been bowed due to a backside pressure is brought down such that a first contact of the drops is made by a front side of the superstrate thereby initiating a liquid front that spreads outward merging with the drops to form a contiguous film captured between the substrate and the superstrate. A non-equilibrium transient state of the superstrate, the contiguous film and the substrate then occurs after a duration of time. The contiguous film is then cured to crosslink it into a polymer. The superstrate is then separated from the polymer thereby leaving a polymer film on the substrate. In such a manner, non-uniform films can be formed without significant material wastage in an inexpensive manner.
    Type: Application
    Filed: August 18, 2014
    Publication date: February 19, 2015
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal
  • Patent number: 8187515
    Abstract: Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
    Type: Grant
    Filed: March 31, 2009
    Date of Patent: May 29, 2012
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung Jin Choi, Ian Matthew McMackin
  • Patent number: 7815824
    Abstract: Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
    Type: Grant
    Filed: February 25, 2009
    Date of Patent: October 19, 2010
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung-Jin Choi
  • Publication number: 20090243153
    Abstract: Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
    Type: Application
    Filed: March 31, 2009
    Publication date: October 1, 2009
    Applicants: MOLECULAR IMPRINTS, INC., BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung Jin Choi, Ian Matthew McMackin
  • Publication number: 20090214761
    Abstract: Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.
    Type: Application
    Filed: February 25, 2009
    Publication date: August 27, 2009
    Applicants: MOLECULAR IMPRINTS, INC., BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Byung-Jin Choi
  • Publication number: 20090133751
    Abstract: Solar cells having at least one electron acceptor layer and at least one electron donor layer forming a patterned p-n junction are described. Electron acceptor layer may be formed by patterning formable N-type material between a template and an electrode layer, and solidifying the formable N-type material.
    Type: Application
    Filed: November 26, 2008
    Publication date: May 28, 2009
    Applicants: MOLECULAR IMPRINTS, INC., BOARD OF REGENTS, THE UNIVERSITY OF TEXAS
    Inventors: Sidlgata V. Sreenivasan, Shrawan Singhal, Christopher Mark Melliar-Smith, Frank Y. Xu, Byung-Jin Choi