Abstract: A lens module is disclosed. The lens module includes a substrate assembly and an array of lens units. The substrate assembly includes a main body and a supporting layer formed on the substrate assembly. The main body has a front surface, a rear surface opposite to the front surface, and at least one lateral surface connecting the front surface to the rear surface. The supporting layer has a planar configuration and is formed on the main body. The main body is made of a first material and the supporting layer is made of a second material different from the first material.

Abstract: A memory mapping method for coupling a plurality of servers with a PCI express bus is disclosed. The method comprises: configuring an extended memory address on a management host having a memory address; mapping the extended memory address of the management host corresponding to each of the servers to memory addresses of each of the servers respectively by a plurality of non-transparent bridges of the PCI express bus; configuring an extended memory address on each of the servers; and mapping the extended memory address of each of the servers to the memory address and the extended memory address of the management host by the non-transparent bridges, the extended memory address of each of the servers corresponding to the servers and the management host.

Abstract: A wafer level optical lens structure is provided. A stress buffer layer is disposed between a light-transmissive substrate and a lens layer, so as to improve production yield of the wafer level optical lens.

Abstract: A lens sheet including a first transparent substrate, a first lens film, a second lens film, a second transparent substrate, a plurality of bonding material patterns and a plurality of buffer cavities is provided. The first lens film is disposed on the first transparent substrate, and having a plurality of first lens portions and a plurality of first carrying portions. The second lens film is disposed between the second transparent substrate and the first lens film. The bonding material patterns are disposed between the second lens film and the first carrying portions. The buffer cavities are located between the first carrying portions and the first lens portions.

Abstract: A method of manufacturing a lens sheet including following steps is provided. A first structure is provided. The first structure includes a first transparent substrate and a first lens film attached to the first transparent substrate. A second structure is provided. The second structure includes a second transparent substrate and a second lens film. The second transparent substrate has a first surface and a second surface opposite to the first surface. The second lens film is attached to the first surface. The first lens film is attached to the second lens film. A third lens film is formed on the second surface of the second substrate after the first lens film is attached to the second lens film. Moreover, a lens sheet and a wafer level lens are also provided.

Abstract: A lens module is disclosed. The lens module includes a substrate assembly and an array of lens units. The substrate assembly includes a main body and a supporting layer formed on the substrate assembly. The main body has a front surface, a rear surface opposite to the front surface, and at least one lateral surface connecting the front surface to the rear surface. The supporting layer has a planar configuration and is formed on the main body. The main body is made of a first material and the supporting layer is made of a second material different from the first material.

Abstract: A wafer level optical lens structure is provided. A stress buffer layer is disposed between a light-transmissive substrate and a lens layer, so as to improve production yield of the wafer level optical lens.

Abstract: A method of manufacturing a lens sheet including following steps is provided. A first structure is provided. The first structure includes a first transparent substrate and a first lens film attached to the first transparent substrate. A second structure is provided. The second structure includes a second transparent substrate and a second lens film. The second transparent substrate has a first surface and a second surface opposite to the first surface. The second lens film is attached to the first surface. The first lens film is attached to the second lens film. A third lens film is formed on the second surface of the second substrate after the first lens film is attached to the second lens film. Moreover, a lens sheet and a wafer level lens are also provided.

Abstract: A method, for monitoring resources of a system for performing a first task and a second task, includes calculating a first completion count of the first task; calculating a second completion count of the second task; and determining whether the resources of the system are exhausted according to the first completion count and the second completion count.

Abstract: An ultraviolet detection system comprises a global positioning device for receiving signals transmitted from global positioning satellites, and generating global positioning satellite distribution data and current position data; and a processor, coupled to the global positioning device, for generating ultraviolet intensity information according to the current position data and the global positioning satellite distribution data. The processor generates ultraviolet intensity information more accurately according to a current time data, which is transmitted from the global positioning satellite or is automatically generated from the global positioning device.

Abstract: A method for alignment treatment of a substrate for a liquid crystal display (LCD) device includes the steps of: forming an alignment film including a plurality of molecules with curable parts on a substrate; applying an electrical field on the substrate to rotate the curable parts; and curing the curable parts such that the curable parts are cured along a first direction. A manufacturing method of the LCD device is also disclosed.

Abstract: A method for fabricating openings is provided. A dielectric layer is formed on a substrate, and a first patterned mask layer is formed on the dielectric layer along a first direction. A second patterned mask layer is then formed on the dielectric layer along a second direction which intersects with the first direction. A portion of the dielectric layer is removed using the first patterned mask layer and the second patterned mask layer as a mask so as to from the openings. The dielectric layer, the first patterned mask layer and the second patterned mask layer have different etching selectivities.

Abstract: A method, for monitoring resources of a system for performing a first task and a second task, includes calculating a first completion count of the first task; calculating a second completion count of the second task; and determining whether the resources of the system are exhausted according to the first completion count and the second completion count.

Abstract: An ultraviolet detection system comprises a global positioning device for receiving signals transmitted from global positioning satellites, and generating global positioning satellite distribution data and current position data; and a processor, coupled to the global positioning device, for generating ultraviolet intensity information according to the current position data and the global positioning satellite distribution data. The processor generates ultraviolet intensity information more accurately according to a current time data, which is transmitted from the global positioning satellite or is automatically generated from the global positioning device.

Abstract: A method for alignment treatment of a substrate for a liquid crystal display (LCD) device includes the steps of: forming an alignment film including a plurality of molecules with curable parts on a substrate; applying an electrical field on the substrate to rotate the curable parts; and curing the curable parts such that the curable parts are cured along a first direction. A manufacturing method of the LCD device is also disclosed.

Abstract: An information handling system includes a chassis. A first display is coupled to the chassis. A card slot is defined by the chassis. A window is defined by the chassis immediately adjacent the card slot, and a card including a second display may be positioned in the card slot such that the second display may be viewed through the window.

Abstract: A method of resolving phase conflict in an alternating phase shift mask and the alternating phase shift mask are disclosed, which are characterized by that a transparent slit region is formed on an non-transparent region placed in a phase conflict area encountered at layout in an alternating phase shift mask and the transparent slit region and the transparent region adjacent to the non-transparent region have a phase difference, thereby a phase conflict problem is resolved.