Patents by Inventor Shu Jin
Shu Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11947269Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: GrantFiled: October 8, 2021Date of Patent: April 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Publication number: 20240092037Abstract: A method, comprising: with a cutting graph corresponding to a two-dimensional (2-D) representation of a polyhedral mesh that is representative of the 3-D target object, forming i sheets in conformity with the cutting graph, i being from 1 to n, an i-th 2-D sheet having an i-th set of cuts formed therein, an (i+1)-th 2-D sheet having a (i+1)-th set of cuts formed therein, the (i+1)-th set of cuts optionally differing from the i-th set of cuts. A 3-D composite object having a surface, the 3-D composite object comprising: i stacked and consolidated sheets, i being from 1 to n, an i-th sheet having an i-th set of cuts formed therein, an (i+1)-th sheet having a (i+1)-th set of cuts formed therein, the (i+1)-th set of cuts optionally differing from the i-th set of cuts.Type: ApplicationFiled: February 23, 2023Publication date: March 21, 2024Inventors: Shu Yang, Lishuai Jin, Daniel J O'Brien, Michael Yeager
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Publication number: 20240072612Abstract: An oil cooling system for an electric machine that includes a housing and a stator accommodated in the housing, the stator having a first end part and a second end part in an axial direction of the electric machine. The oil cooling system includes an oil inlet, for receiving external cooling oil; a first annular oil application pipe, located at the first end part and in fluid communication with the oil inlet; and a second annular oil application pipe, located at the second end part and in fluid communication with the oil inlet. An axial oil application part is located between the first end part and the second end part and formed by a housing inner wall and a stator outer wall. The axial oil application part receives cooling oil from at least one of the first annular oil application pipe and the second annular oil application pipe.Type: ApplicationFiled: August 25, 2023Publication date: February 29, 2024Applicant: Valeo eAutomotive Germany GmbHInventors: Shu ZHANG, Wenhui WANG, Yejin JIN, Wanchao ZHAO, Yawei SUN
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Publication number: 20230404845Abstract: A foam stick includes a tube body, a core, and two covers. The tube body has an accommodating groove with two open ends. The core is disposed in the accommodating groove of the tube body. The two covers are disposed at both ends of the tube body to close the accommodating groove. The foam stick is composed of the tube body, the core and the covers, so the material utilization rate is high. Through the combination of the tube body, the core and the covers, the foam stick has different characteristics and can be used as rollers or floats.Type: ApplicationFiled: June 17, 2022Publication date: December 21, 2023Inventors: TIEN-SZU HSU, SHU-JIN CHEN, YI-PING CHUNG, JIA-RUI XU, GENG-LIN LIU, CHUNG-LUN CHAN
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Publication number: 20230405405Abstract: A balance pad includes a base. A plurality of first pillars and a peripheral wall are uprightly disposed on the base. The peripheral wall surrounds the first pillars so that the first pillars are located within the peripheral wall. Thereby, the first pillars reduce the stability of the balance pad to increase the difficulty of doing balance exercise. The peripheral wall surrounds the first pillars, so that the first pillars can abut against the peripheral wall to avoid excessive inclination of the first pillars to cause injury to a user.Type: ApplicationFiled: June 17, 2022Publication date: December 21, 2023Inventors: TIEN-SZU HSU, SHU-JIN CHEN, YI-PING CHUNG, JIA-RUI XU, GENG-LIN LIU, CHUNG-LUN CHAN
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Patent number: 11710668Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: GrantFiled: October 16, 2020Date of Patent: July 25, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer, Maria Isabel De La Fuente Valentin, Koen Van Witteveen, Martijn Maria Zaal, Shu-jin Wang
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Publication number: 20220066330Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: ApplicationFiled: October 8, 2021Publication date: March 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Anagnostis TSIATMAS, Paul Christiaan Hinnen, Elliott Gerard Mc Namara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Patent number: 11143972Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: GrantFiled: November 2, 2018Date of Patent: October 12, 2021Assignee: ASML Netherlands B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Patent number: 10983445Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.Type: GrantFiled: February 6, 2019Date of Patent: April 20, 2021Assignee: ASML Netherlands B.V.Inventors: Nitesh Pandey, Zili Zhou, Gerbrand Van Der Zouw, Arie Jeffrey Den Boef, Markus Gerardus Martinus Maria Van Kraaij, Armand Eugene Albert Koolen, Hugo Augustinus Joseph Cramer, Paul Christiaan Hinnen, Martinus Hubertus Maria Van Weert, Anagnostis Tsiatmas, Shu-jin Wang, Bastiaan Onne Fagginger Auer, Alok Verma
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Publication number: 20210035871Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: ApplicationFiled: October 16, 2020Publication date: February 4, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard Mc NAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER, Maria Isabel DE LA FUENTE VALENTIN, Koen VAN WITTEVEEN, Martijn Maria ZAAL, Shu-jin WANG
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Patent number: 10811323Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: GrantFiled: February 28, 2017Date of Patent: October 20, 2020Assignee: ASML Netherlands B.V.Inventors: Adriaan Johan Van Leest, Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard McNamara, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer, Maria Isabel De La Fuente Valentin, Koen Van Witteveen, Martijn Maria Zaal, Shu-jin Wang
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Publication number: 20190250094Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.Type: ApplicationFiled: February 6, 2019Publication date: August 15, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Nitesh PANDEY, Zili ZHOU, Gerbrand VAN DER ZOUW, Arie Jeffrey DEN BOEF, Markus Gerardus Martinus Maria VAN KRAAIJ, Armand Eugene Albert KOOLEN, Hugo Augustinus Joseph CRAMER, Paul Christiaan HINNEN, Martinus Hubertus Maria VAN WEERT, Anagnostis TSIATMAS, Shu-jin WANG, Bastiaan Onne FAGGINGER AUER, Alok VERMA
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Publication number: 20190155173Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.Type: ApplicationFiled: November 2, 2018Publication date: May 23, 2019Applicant: ASML Netherlands B.V.Inventors: Anagnostis Tsiatmas, Paul Christiaan Hinnen, Elliott Gerard Mc Namara, Thomas Theeuwes, Maria Isabel De La Fuente Valentin, Mir Homayoun Shahrjerdy, Arie Jeffrey Den Boef, Shu-jin Wang
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Patent number: 9939735Abstract: A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals.Type: GrantFiled: February 10, 2017Date of Patent: April 10, 2018Assignee: ASML Netherlands B.V.Inventors: Paul Christiaan Hinnen, Shu-jin Wang, Christian Marinus Leewis, Kuo-Feng Pao
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Publication number: 20170255112Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.Type: ApplicationFiled: February 28, 2017Publication date: September 7, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Adriaan Johan VAN LEEST, Anagnostis TSIATMAS, Paul Christiaan HINNEN, Elliott Gerard McNAMARA, Alok VERMA, Thomas THEEUWES, Hugo Augustinus Joseph CRAMER, Maria Isabel DE LA FUENTE VALENTIN, Koen VAN WITTEVEEN, Martijn Maria ZAAL, Shu-jin WANG
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Publication number: 20170153554Abstract: A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals.Type: ApplicationFiled: February 10, 2017Publication date: June 1, 2017Applicant: ASML Netherlands B.V.Inventors: Paul Christiaan HINNEN, Shu-jin WANG, Christian Marinus LEEWIS, Kuo-Feng PAO
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Patent number: 9594299Abstract: A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals.Type: GrantFiled: June 3, 2013Date of Patent: March 14, 2017Assignee: ASML Netherlands B.V.Inventors: Paul Christiaan Hinnen, Shu-jin Wang, Christian Marinus Leewis, Kuo-Feng Pao
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Publication number: 20150338749Abstract: A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals.Type: ApplicationFiled: June 3, 2013Publication date: November 26, 2015Applicant: ASML Netherlands B.V.Inventors: Paul Christiaan HINNEN, Shu-jin WANG, Christian Marinus LEEWIS, Kuo-Feng PAO
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Patent number: 8138364Abstract: Transparent conducting oxide thin films having a reduced indium content and/or an increased tin content are provided. In addition, processes for producing the same, precursors for producing the same, and transparent electroconductive substrate for display panels and organic electroluminescence devices, both including the transparent conducting oxide thin films, are provided.Type: GrantFiled: March 22, 2007Date of Patent: March 20, 2012Assignee: Northwestern UniversityInventors: Tobin J. Marks, Jun Ni, Anchuan Wang, Yu Yang, Andrew Metz, Shu Jin, Lian Wang
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Publication number: 20080024055Abstract: Transparent conducting oxide thin films having a reduced indium content and/or an increased tin content are provided. In addition, processes for producing the same, precursors for producing the same, and transparent electroconductive substrate for display panels and organic electroluminescence devices, both including the transparent conducting oxide thin films, are provided.Type: ApplicationFiled: March 22, 2007Publication date: January 31, 2008Inventors: Tobin Marks, Jun Ni, Anchuan Wang, Yu Yang, Andrew Metz, Shu Jin, Lian Wang