Abstract: A preparation method of a poly-silicon thin film transistor (TFT) array substrate and an array substrate thereof are provided. The preparation method includes: forming a photoresist layer on a poly-silicon layer, and exposing and developing the photoresist layer with a gray tone mask to form patterns of a photoresist completely-reserved region, a photoresist partially-reserved regions and a photoresist completely-removed region; removing part of the poly-silicon layer located in the photoresist completely-removed region, to form patterns of active layers; ashing the photoresist so as to expose part of the active layer located in the photoresist partially-reserved regions and inject P+ions of high concentration into the part of the active layer, to form doping regions of patterns of source-drain electrodes of a P-type TFT; and stripping off remaining photoresist.

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode (8), including a first portion (b) in a non-display region and a second portion (a) in a display region; a first electrode (6) formed on the first portion (b) of the pixel electrode (8); a passivation layer (9) formed on the pixel electrode (8) and the first electrode (6), the passivation layer (9) includes a via hole (11) located over the first electrode (6); an active layer (4) and a second electrode (7) that are formed on the passivation layer (9), the active layer (4) being connected to the first electrode (6) through the via hole (11) of the passivation layer (9). With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, materials of the electrodes are less subjected to corrosion, and quality of the array substrate is enhanced.

Abstract: The present invention has disclosed a touch screen, comprising: a substrate; at least one first electrode formed on the substrate; at least one second electrode formed on the substrate, the first electrode and the second electrode having different extending directions, and there being an intersecting area between a vertical projection of the first electrode on the substrate and a vertical projection of the second electrode on the substrate; and a first protection layer formed at least at the intersecting area between the first electrode and the second electrode; wherein, the substrate is provided with a groove at the intersecting area between the first electrode and the second electrode so as to at least receive therein a portion of the first electrode located within the intersecting area. The present invention has also disclosed a display device and a method for manufacturing the touch screen.

Abstract: The present disclosure discloses a thin film transistor assembly, an array substrate and a method of manufacturing the same, and a display device including the array substrate. The array substrate includes a substrate; a plurality of thin film transistors formed on the substrate; and a plurality of light shielding layers, each of the light shielding layers being arranged between a source electrode and a drain electrode of the thin film transistor and configured to block light from the exterior from illuminating an active layer of the thin film transistor. The light shielding layer and the source electrode and the drain electrode of the thin film transistor are formed in the same layer on the substrate.

Abstract: The present disclosure discloses an array substrate, comprising a substrate, a plurality of pixel regions on the substrate, and a thin-film transistor formed in each of the pixel regions, each of the pixel regions comprising a pixel electrode region, wherein, the thin-film transistor comprises a gate layer and a source/drain layer formed laminatedly on the substrate; the array substrate further comprises a flat layer and a reflective metal layer formed in sequence on the substrate and covering at least the pixel electrode region and the thin-film transistor; the reflective metal layer is electrically connected to a drain of the thin-film transistor; and at least one of the gate layer and the source/drain layer is formed of a single metal layer. The present disclosure further provides a method for manufacturing the array substrate and a totally reflective type liquid crystal display comprising the array substrate.

Abstract: A method for manufacturing an array substrate, comprising forming a pattern of a gate electrode by one pattering process; forming a gate insulating layer on a substrate provided with the pattern of the gate electrode; forming first and second patterns thereon, in which the first pattern corresponds to a pattern of a semiconductor active layer and the second pattern corresponds to a source electrode and a drain electrode; forming a pattern layer including an opening area on the substrate provided with the second pattern, in which the opening area corresponds to a gap between the source electrode and the drain electrode, the minimum width thereof being greater than the width of the gap between the source electrode and the drain electrode, and at least forming a pattern of the source electrode and the drain electrode and a pixel electrode electrically connected with the drain electrode through the opening area.

Abstract: An array substrate and manufacturing method thereof and a display device. The display device includes a pixel electrode, including a portion in a display region and a portion in a non-display region; a first electrode formed on the non-display region of the pixel electrode; a passivation layer formed on the pixel electrode and the first electrode, which includes a via hole located over the first electrode; an active layer and a second electrode that are formed on the passivation layer, the active layer being connected to the first electrode through the via hole of the passivation layer. With the array substrate and the manufacturing method thereof, the manufacturing cost is reduced, the corrosion to an electrode material is lessened, and quality of the array substrate is enhanced.

Abstract: A touch panel, a manufacturing method thereof and a display device are provided. The touch panel includes a first touch electrode, a second touch electrode and a one-piece insulating element. The second touch electrode includes an electrode section disposed in a same layer as the first touch electrode and a connecting section under the electrode section. The electrode section includes a first electrode section and a second electrode section, which are electrically connected by the connecting section, and the connecting section is spaced apart from the first touch electrode. The insulating element includes a first insulating section between the connecting section and the first touch electrode and a second insulating section between the first electrode section and the first touch electrode and also between the second electrode section and the first touch electrode. The insulating sections can be obtained by performing a patterning process, so that the manufacturing method of the touch panel is simplified.

Abstract: The present disclosure relates to the field of liquid crystal display technology, and provides an array substrate, its manufacturing method and a display device. The array substrate includes data lines, gate lines, and a plurality of pixel units defined by the data lines and the gate lines. Each of the plurality of the pixel unit includes a thin film transistor and a pixel electrode. The drain electrode includes a source/drain metal layer and an antioxidant conductive layer, the pixel electrode electrically contacts the antioxidant conductive layer, to realize electrical connection.

Abstract: The present invention provides an array substrate and a manufacturing method thereof and a display device. The manufacturing method comprises: forming a pattern including a pixel electrode and a source of a thin film transistor on a base substrate through a single patterning process, the pixel electrode is provided in a layer under a layer in which the source is located; forming a pattern including a drain, an active layer, a gate insulation layer and a gate of the thin film transistor through a single patterning process, the active layer covers the source and the drain, and is separated from the gate through the gate insulation layer; and forming a pattern including a passivation layer, a common electrode and a gate line through a single patterning process, the common electrode is a slit electrode and separated from the active layer and the pixel electrode through the passivation layer.

Abstract: The present disclosure discloses a thin film transistor assembly, an array substrate and a method of manufacturing the same, and a display device including the array substrate. The array substrate includes a substrate; a plurality of thin film transistors formed on the substrate; and a plurality of light shielding layers, each of the light shielding layers being arranged between a source electrode and a drain electrode of the thin film transistor and configured to block light from the exterior from illuminating an active layer of the thin film transistor. The light shielding layer and the source electrode and the drain electrode of the thin film transistor are formed in the same layer on the substrate.

Abstract: An oxide thin-film transistor (TFT) array substrate, a manufacturing method thereof and a display panel are provided. In the manufacturing method, a pattern of a gate insulating layer (13), an oxide active layer (14) and an etch barrier layer (15) is formed on a substrate (10) on which a pattern of a gate line (11) and a gate electrode (12) is formed, by one patterning process.

Abstract: An embodiment of the present invention discloses a curved surface display apparatus and a method for producing the same, which can simplify the structure of the curved surface display apparatus and reduce its producing process. The method comprises: adhering frame regions of a first substrate and a second substrate to each other by using a sealing agent to form the assembled first substrate and second substrate, the first substrate and the second substrate having different coefficients of thermal expansion; heating the assembled first substrate and second substrate from a first predetermined temperature value at which the sealing agent is not curable to a second predetermined temperature value at which the sealing agent is curable; and cooling the heated first substrate and second substrate.

Abstract: A thin film transistor, an array substrate (1) and a manufacturing method thereof are provided. The thin film transistor comprises a substrate (1) and a gate electrode (2), a gate insulating layer (3), a semiconductor layer (4), a protective layer (5), an ohmic contact layer (6), a source electrode (7) and a drain electrode (8) successively stacked on the substrate (1), wherein the protective layer (5) has two via holes (11) over the semiconductor layer (4) so as to expose the underlying semiconductor layer (4), the semiconductor layer (4) exposed by the via hole (11) is covered by the ohmic contact layer (6); the source and drain electrodes (7, 8) are connected to the semiconductor layer (4) through the ohmic contact layer (6) at the via hole (11).

Abstract: A touch organic light emitting diode (OLED) display device, including: a thin film transistor formed on one side of a substrate, a touch signal feedback layer formed on the thin film transistor, a luminous substrate provided on the touch signal feedback layer, and a touch signal receiving layer formed on the other side of the substrate. An anode layer of the luminous substrate is connected to a drain electrode of the thin film transistor. As to the touch-sensitive OLED display device, a touch screen and an OLED display portion are prepared integratedly, so that the weight and thickness of the display itself are greatly reduced, and the production cost is saved. A manufacturing method of the touch-sensitive OLED display device is further disclosed.

Abstract: An oxide thin-film transistor (TFT) array substrate, a manufacturing method thereof and a display panel are provided. In the manufacturing method, a pattern of a gate insulating layer (13), an oxide active layer (14) and an etch barrier layer (15) is formed on a substrate (10) on which a pattern of a gate line (11) and a gate electrode (12 ) is formed, by one patterning process.

Abstract: Collaborative agents for simulating teamwork (CAST) are provided with a recognition-primed decision (RPD) model, thereby enhancing analysis through linking and sharing information using knowledge and experience distributed among team members. The RPD model is integrated within a CAST architecture to the extent that agents can proactively seek and fuse information to enhance the quality and timeliness of the decision-making process. The approach, which is applicable to both human assistants and virtual teammates, can approximately track human's decision-making process and effectively interact with human users. A disclosed example relates to teams of agents analyzing terrorist activities.

Abstract: Collaborative agents for simulating teamwork (CAST) are provided with a recognition-primed decision (RPD) model, thereby enhancing analysis through linking and sharing information using knowledge and experience distributed among team members. The RPD model is integrated within a CAST architecture to the extent that agents can proactively seek and fuse information to enhance the quality and timeliness of the decision-making process. The approach, which is applicable to both human assistants and virtual teammates, can approximately track human's decision-making process and effectively interact with human users. A disclosed example relates to teams of agents analyzing terrorist activities.