Patents by Inventor Shuhei Yamada

Shuhei Yamada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7319158
    Abstract: A process for producing a high-purity hafnium amide includes the steps of (a) adding a compound which contains a carbonyl group or sulfonyl group and is represented by the formula of A(OyXOnRf)m (e.g., CF3SO3H, Hf(CF3SO3)4, (CF3SO2)2O, CF3CO2H, CH3SO3H, C6H5SO3H, and (CH3SO2)2O), to a crude hafnium amide which is represented by the formula of Hf[N(R1)(R2)]4, where each of R1 and R2 independently represents a methyl group or ethyl group, and which contains a zirconium component as an impurity; and (b) subjecting a product of the step (a) to a distillation under reduced pressure, thereby removing the zirconium component from the crude hafnium amide.
    Type: Grant
    Filed: February 13, 2007
    Date of Patent: January 15, 2008
    Assignee: Central Glass Company, Limited
    Inventors: Atsushi Ryokawa, Shuhei Yamada
  • Patent number: 7307444
    Abstract: The present invention provides a technique enabling the amount of time required to evaluate the light fastness of a liquid crystal panel to be shortened. A method of testing the light fastness of a liquid crystal panel comprising a pair of substrates and a liquid crystal layer interposed between the substrates comprises the steps of: irradiating a test subject area of the liquid crystal panel with a laser beam, with at least one of the wavelength, the irradiation energy, and the irradiation duration of the laser beam set as a variable parameter; irradiating the liquid crystal panel with an observation beam and detecting the condition of the observation beam after passing through the liquid crystal panel; and evaluating the light fastness of the liquid crystal panel on the basis of a difference in the condition of the observation beam corresponding to the setting of the variable parameter of the laser beam.
    Type: Grant
    Filed: July 26, 2005
    Date of Patent: December 11, 2007
    Assignee: Seiko Epson Corporation
    Inventors: Kazushige Umetsu, Shuhei Yamada
  • Publication number: 20070197809
    Abstract: A process for producing a high-purity hafnium amide includes the steps of (a) adding a compound which contains a carbonyl group or sulfonyl group and is represented by the formula of A(OyXOnRf)m (e.g., CF3SO3H, Hf(CF3SO3)4, (CF3SO2)2O, CF3CO2H, CH3SO3H, C6H5SO3H, and (CH3SO2)2O), to a crude hafnium amide which is represented by the formula of Hf[N(R1)(R2)]4, where each of R1 and R2 independently represents a methyl group or ethyl group, and which contains a zirconium component as an impurity; and (b) subjecting a product of the step (a) to a distillation under reduced pressure, thereby removing the zirconium component from the crude hafnium amide.
    Type: Application
    Filed: February 13, 2007
    Publication date: August 23, 2007
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Atsushi Ryokawa, Shuhei Yamada
  • Publication number: 20070181851
    Abstract: The polishing composition contains polyoxyethylene sorbitan mono-fatty acid ester, silicon dioxide, water soluble cellulose, an alkaline compound, and water. The content of polyoxyethylene sorbitan mono-fatty acid ester in the polishing composition is less than 0.0025% by mass. The polishing composition is appropriate for final polishing of silicon wafers.
    Type: Application
    Filed: February 2, 2007
    Publication date: August 9, 2007
    Inventor: Shuhei Yamada
  • Publication number: 20070109236
    Abstract: A liquid crystal device includes a pair of substrates, a liquid crystal disposed between the pair of substrates, and a seal member disposed around the liquid crystal, wherein a liquid crystal storage portion is disposed in the inner circumference of the seal member by forming a concave portion on the substrate.
    Type: Application
    Filed: September 12, 2006
    Publication date: May 17, 2007
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Shuhei YAMADA, Shohei YOSHIDA, Takeshi SETO
  • Patent number: 7204865
    Abstract: The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO—(EO)a—(PO)b—(EO)c—H, wherein EO represents an oxyethylene group, PO represents an oxypropylene group, each of a and c represents the polymerization degree of ethylene oxide, b represents the polymerization degree of propylene oxide, and each of a, b, and c is an integer of 1 or greater; silicon dioxide; a basic compound; at least either one of hydroxyethyl cellulose and polyvinyl alcohol; and water.
    Type: Grant
    Filed: September 3, 2004
    Date of Patent: April 17, 2007
    Assignee: Fujimi Incorporated
    Inventor: Shuhei Yamada
  • Patent number: 7108400
    Abstract: A light source unit is provided that is adapted for efficient cooling and for illumination of high luminance, and a projector including the same. A light source unit including a solid-state light source and a lens further includes a first fluid flowing in the vicinity of the solid-state light source thereby absorbing heat generated from the solid-state light source, and a second fluid flowing in the vicinity of the first fluid thereby absorbing the heat contained in the first fluid.
    Type: Grant
    Filed: September 8, 2004
    Date of Patent: September 19, 2006
    Assignee: Seiko Epson Corporation
    Inventors: Shuhei Yamada, Takeshi Seto
  • Publication number: 20060169990
    Abstract: The invention relates to a Group III nitride-based compound semiconductor light-emitting device having a well layer, a first layer formed on one surface of the well layer, a second layer formed on the other surface of the well layer, a first region provided in the vicinity of the interface between the first layer and the well layer, and a second region provided in the vicinity of the interface between the second layer and the well layer, wherein the first and second regions are formed such that the lattice constants of the first and second layers approach the lattice constant of the well layer.
    Type: Application
    Filed: January 27, 2006
    Publication date: August 3, 2006
    Applicant: Toyoda Gosei Co., Ltd.
    Inventors: Tetsuya Taki, Mitsuhisa Narukawa, Masato Aoki, Koji Okuno, Yusuke Toyoda, Kazuki Nishijima, Shuhei Yamada
  • Publication number: 20060055931
    Abstract: The present invention provides a technique enabling the amount of time required to evaluate the light fastness of a liquid crystal panel to be shortened. A method of testing the light fastness of a liquid crystal panel comprising a pair of substrates and a liquid crystal layer interposed between the substrates comprises the steps of: irradiating a test subject area of the liquid crystal panel with a laser beam, with at least one of the wavelength, the irradiation energy, and the irradiation duration of the laser beam set as a variable parameter; irradiating the liquid crystal panel with an observation beam and detecting the condition of the observation beam after passing through the liquid crystal panel; and evaluating the light fastness of the liquid crystal panel on the basis of a difference in the condition of the observation beam corresponding to the setting of the variable parameter of the laser beam.
    Type: Application
    Filed: July 26, 2005
    Publication date: March 16, 2006
    Inventors: Kazushige Umetsu, Shuhei Yamada
  • Publication number: 20050163275
    Abstract: For a stream input from a signal input section to a synchronization word analysis section, a synchronization word is searched by the synchronization word analysis section and it is confirmed whether or not the analyzed synchronization word matches a pattern of a decodable synchronization word. When a synchronization word is detected, the synchronization word is selectively output to a header analysis section corresponding to the type of the detected synchronization word by decoding system switching section. Then, using analyzed header information, a frame is decoded by the decoding section and output from a signal output section. After the frame is output, the process returns to the synchronization word analysis section and the same processing is performed to each of all frames in the stream.
    Type: Application
    Filed: December 23, 2004
    Publication date: July 28, 2005
    Inventors: Shuhei Yamada, Hideyuki Kakuno
  • Publication number: 20050094397
    Abstract: A light source unit is provided that is adapted for efficient cooling and for illumination of high luminance, and a projector including the same. A light source unit including a solid-state light source and a lens further includes a first fluid flowing in the vicinity of the solid-state light source thereby absorbing heat generated from the solid-state light source, and a second fluid flowing in the vicinity of the first fluid thereby absorbing the heat contained in the first fluid.
    Type: Application
    Filed: September 8, 2004
    Publication date: May 5, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Shuhei Yamada, Takeshi Seto
  • Publication number: 20050054203
    Abstract: The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO-(EO)a—(PO)b-(EO)c—H, wherein EO represents an oxyethylene group, PO represents an oxypropylene group, each of a and c represents the polymerization degree of ethylene oxide, b represents the polymerization degree of propylene oxide, and each of a, b, and c is an integer of 1 or greater; silicon dioxide; a basic compound; at least either one of hydroxyethyl cellulose and polyvinyl alcohol; and water.
    Type: Application
    Filed: September 3, 2004
    Publication date: March 10, 2005
    Inventor: Shuhei Yamada
  • Publication number: 20050046801
    Abstract: Exemplary embodiments of the invention provide a light source device to cool a solid-state light source at a high efficiency even in a case where a large quantity of heat has developed from the solid-state light source including a minute heat generation region. A light source device includes a solid-state light source, micro heat pipes which are provided on the light-emission rear surface side of the solid-state light source, and liquid cooling portions which are provided at parts of the micro heat pipes.
    Type: Application
    Filed: August 30, 2004
    Publication date: March 3, 2005
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Shuhei Yamada
  • Publication number: 20050031839
    Abstract: A multilayer structure including a laminate of a surface layer of an olefin thermoplastic elastomer (A) and an inner layer of an olefin thermoplastic elastomer (B), wherein: the olefin thermoplastic elastomer (A) contains polyolefin, and soft components (A) made of rubber and process oil (A); the olefin thermoplastic elastomer (B) contains polyolefin, and soft components (B) made of rubber and process oil (B); Ma and Mb satisfy the relation Ma?Mb in which Ma is the molecular weight of the process oil (A), and Mb is the molecular weight of the process oil (B); and Ca and Cb satisfy the relation Ca<Cb in which Ca is the amount (wt %) of the soft components (A), and Cb is the amount (wt %) of the soft components (B)
    Type: Application
    Filed: July 13, 2004
    Publication date: February 10, 2005
    Inventors: Haruyasu Mizutani, Yasuhiro Yamaguchi, Shuhei Yamada
  • Patent number: 6844905
    Abstract: The invention provides an alignment film that is provided with a high alignment control force to a target molecule and less likely to cause problems to an element during the formation of the alignment film. An alignment film has a configuration in which, on a first alignment layer, a second alignment film layer that is uniform in the in-plane anisotropy more than the first alignment film thereof and aligned along surface alignment of the first alignment film. The first alignment film layer can be formed of, for instance, a polyimide film whose rubbing density is 200 or less, and the second alignment film layer can be formed by use of an ion deposition method with an acryl monomers as a deposition material. A liquid crystal device provided with the alignment film like this becomes higher in the alignment control force to a liquid crystal.
    Type: Grant
    Filed: November 29, 2002
    Date of Patent: January 18, 2005
    Assignee: Seiko Epson Corporation
    Inventors: Shuhei Yamada, Yutaka Tsuchiya
  • Publication number: 20040213902
    Abstract: The invention provides a fuel cell manufacturing apparatus having improved productivity and a fuel cell manufacturing method that uses the fuel cell manufacturing apparatus. The invention provides on a first substrate that is transferred by use of a belt conveyer that is driven by a driver based on a signal from a controller, by use of discharge devices, a first gas flow path for supplying a first reaction gas is formed. Subsequently, on the first substrate that is transferred by the belt conveyer, by use of discharge devices, a first current collecting layer and a first reaction layer are formed, respectively. In the next place, on the first substrate, by use of a discharge device, an electrolyte film is formed. Similarly, by use of discharge devices, a second reaction layer and a second current collecting layer are formed, respectively.
    Type: Application
    Filed: February 20, 2004
    Publication date: October 28, 2004
    Applicant: Seiko Epson Corporation
    Inventors: Yoshiharu Ajiki, Shuhei Yamada, Hirotsuna Miura, Mitsuru Kuribayashi
  • Publication number: 20040209152
    Abstract: The invention provides a fuel cell having a gas flow path formed therein provided with a space through which a reactive gas flows and a process for the production thereof. More particularly, in ejection devices, a first gas flow path is formed in a first substrate which has been conveyed by a belt conveyor driven by a driving device according to signal from a controlling device. Subsequently, the first substrate which has been conveyed by the belt conveyor is processed in an ejection device to form a first collector layer thereon and processed in an ejection device to form a first gas diffusion layer thereon. Subsequently, the first substrate which has been conveyed by the belt conveyor is processed in an ejection device to form a first reactive layer thereon and processed in an ejection device to form an electrolyte membrane thereon.
    Type: Application
    Filed: February 19, 2004
    Publication date: October 21, 2004
    Applicant: Seiko Epson Corporation
    Inventors: Shuhei Yamada, Hirotsuna Miura, Yasunori Yamazaki, Yoshiharu Ajiki
  • Publication number: 20040127047
    Abstract: A polishing composition of the present invention, which is used in precision polishing the surface of a wafer for semiconductor devices, remarkably reduces haze that occurs on the surface of the wafer. The polishing composition includes silicon dioxide, an alkaline compound, a water-soluble polymer, and water. The silicon dioxide is colloidal silica or fumed silica. The average primary particle diameter DSA of the colloidal silica is from 5 to 30 nm, and the average secondary particle diameter DN4 of the colloidal silica is from 5 to 120 nm. The average primary particle diameter DSA of the fumed silica is from 5 to 30 nm, and the average secondary particle diameter DN4 of the fumed silica is from 5 to 200 nm.
    Type: Application
    Filed: September 29, 2003
    Publication date: July 1, 2004
    Inventors: Shuhei Yamada, Akihiro Kawase
  • Publication number: 20040080685
    Abstract: [Problem] To provide an alignment film that is provided with a high alignment control force to a target molecule and less likely to cause problems to an element during the formation of the alignment film.
    Type: Application
    Filed: November 29, 2002
    Publication date: April 29, 2004
    Applicant: Seiko Epson Corporation
    Inventors: Shuhei Yamada, Yutaka Tsuchiya
  • Patent number: 6046791
    Abstract: A polymer dispersed liquid crystal electro-optical device comprising a liquid crystal polymer complex layer having a liquid crystal and a polymer, wherein said liquid crystal and said polymer are aligned in the same direction when no electric field is applied, and an electrode structure formed on each side of said liquid crystal polymer complex layer for applying an electric field to said liquid crystal polymer complex layer to align said liquid crystal along the electric field so as to render said liquid crystal polymer complex layer in a light-scattering state.
    Type: Grant
    Filed: July 9, 1997
    Date of Patent: April 4, 2000
    Assignee: Seiko Epson Corporation
    Inventors: Hidekazu Kobayashi, Shuhei Yamada