Patents by Inventor Siang Tan

Siang Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020102398
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminum. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, while retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Application
    Filed: March 25, 2002
    Publication date: August 1, 2002
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6413387
    Abstract: A cathode arc source generates positive ions from a non-graphite target. The cathode arc source includes (a) a cathode station to receive the target; (b) a first magnet to generate a first magnetic field at the target; and (c) a second magnet to generate a second magnetic field at the target. The second magnetic field has a direction opposite to that of the first magnetic field so that the resultant magnetic field has a point of zero field strength above the target. In an embodiment, the first magnet is located below the target and includes a coil with a diameter greater than the diameter of the target. The second magnet is located above the target.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: July 2, 2002
    Assignee: Filplas Vacuum Technology PTE Ltd.
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Patent number: 6387443
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: May 14, 2002
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6338779
    Abstract: A cathode arc source apparatus for depositing a coating on a substrate is provided with a monitor for monitoring the cathode arc source. The monitor is useful for monitoring position of an arc spot on the target, plasma emission by the source, or current through or potential difference at a secondary anode. A controller can take actions such as shutting down the source, varying the power or restriking the arc in response to output from the monitor.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: January 15, 2002
    Assignee: Filplas Vacuum Technology PTE Ltd
    Inventors: Xu Shi, Xiao Zhe Jin, Hong Siang Tan
  • Patent number: 6319369
    Abstract: A coating of positive ions is applied to a substrate by generating an arc at a cathode, directing a beam of ions emitted from the cathode to the substrate via a filter path to remove macroparticles, igniting the arc by moving an arc ignition from a retracted position to an ignition position in which cathode contact is made, and storing the position in which arc ignition occurred.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: November 20, 2001
    Assignee: Filplas Vacuum Technology PTE, Ltd.
    Inventors: David Ian Flynn, Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6262539
    Abstract: Apparatus for feeding a target into a chamber of a cathode arc source comprises support structure (22, 23, 24) attached to or integral with the cathode arc source (10), a cathode station (16, 17, 18) for receiving a target (18) in electrical connection with an arc power supply, wherein the cathode station is mounted for movement (21, 37) on the support structure relative to the chamber so as to feed the target into the chamber. The apparatus can also have a target cutter in the chamber for removing an upper portion of the target. A graphite target for feeding into the source is a composite of at least inner and outer sections, the inner section comprising graphite powder and having a density in the range 1.7-2.0 g/cm3 and the outer section comprising graphite powder and having a density that is at least 0.1 g/cm3 less than that of the inner section.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: July 17, 2001
    Assignee: Filplas Vacuum Technology PTE Ltd
    Inventors: Xu Shi, Beng Kang Tay, Hong Siang Tan
  • Publication number: 20010002002
    Abstract: Deposition apparatus incorporating either a single or multiple filtered cathodic arc (FCA) source for depositing coatings such as tetrahedral amorphous carbon (TAC); metal oxides; compounds and alloys of such materials onto various types of substrates, such as metals semiconductors, plastics ceramics and glasses. Substrates are moved through the plasma beam(s) of the FCA source(s) and beam scanning increases deposition area. Macroparticles are filtered by a double bend filter duct.
    Type: Application
    Filed: November 21, 1997
    Publication date: May 31, 2001
    Applicant: FILPLAS VACUUM TECHNOLOGY PTE, LTD.
    Inventors: DAVID IAN FLYNN, MICHAEL FULTON, XU SHI, HONG SIANG TAN, BENG KANG TAY
  • Patent number: 6143142
    Abstract: The invention describes composite coatings, in particular comprising carbon and another metallic element such as silicon or aluminium. These coatings have improved properties compared with pure tetrahedral amorphous carbon coatings, in that they have reduced stress levels and can be deposited at higher thicknesses, whilst retaining acceptable hardness and other useful mechanical properties. Also described are methods of making composite coatings, materials for making the coatings and substrates coated therewith. Specifically, a method of applying a coating to a substrate using a cathode arc source, comprises generating an arc between a cathode target and an anode of the source and depositing positive target ions on the substrate to form the coating, wherein the coating is a composite of at least first and second elements and the target comprises said at least first and second elements.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: November 7, 2000
    Assignee: Nanyang Technological University
    Inventors: Xu Shi, Hong Siang Tan, Beng Kang Tay
  • Patent number: 6031239
    Abstract: The plasma beam from a cathodic arc is filtered by baffles, a double bend toroidal plasma duct and a biased, corrugated liner within the duct, giving coatings virtually free of contaminating macroparticles. Reactive gas is ionised in the plasma ball and automatic arc ignition is provided.
    Type: Grant
    Filed: November 21, 1997
    Date of Patent: February 29, 2000
    Assignee: Filpas Vacuum Technology Pte Ltd.
    Inventors: Xu Shi, David Ian Flynn, Beng Kang Tay, Hong Siang Tan