Patents by Inventor Siew Tay

Siew Tay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6943378
    Abstract: An opto-coupler including an optical transmitter and an optical receiver. The opto-coupler includes at least three layers of materials between the optical transmitter and the optical receiver that attach and optically couple the optical transmitter and the optical receiver to define a stack. A method of manufacturing the opto-coupler is also disclosed. The method includes disposing an insulating layer on a first die and disposing an isolation layer on the insulating layer. The method further includes disposing a securing layer on the isolation layer and disposing a second die on the securing layer.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: September 13, 2005
    Assignee: Agilent Technologies, Inc.
    Inventors: Theng Hui Kek, Gary Thiam Siew Tay, Ka Hin Kwok
  • Publication number: 20040256720
    Abstract: An apparatus and system, as well as fabrication methods therefor, may include a substrate coupled to a first material and a second material. The first and second materials may comprise adjacent metals, and may have different coefficients of thermal expansion sufficient to reduce the amount of substrate warp that can occur due to heating and cooling.
    Type: Application
    Filed: June 10, 2003
    Publication date: December 23, 2004
    Applicant: Intel Corporation
    Inventors: Eng Hooi Yap, Cheng Siew Tay, Pek Chew Tan
  • Publication number: 20040113285
    Abstract: A method and apparatus is provided that pertains to resisting crack initiation and propagation in electrical interconnections between components and substrates in ball grid array microelectronic packages. A hybrid of dielectric defined and non-dielectric defined electrical interconnects reduces the potential for electrical interconnection failure without having to control the dielectric defined interconnect ratio of substrates. In addition selective orientation of the dielectric defined edge portion of the electrical interconnect away from the point where cracks initiate resists crack propagation and component failure.
    Type: Application
    Filed: December 17, 2002
    Publication date: June 17, 2004
    Inventors: Cheng Siew Tay, Swee Kian Cheng, Eng Huat Goh