Patents by Inventor Simon Joshua Jacobs
Simon Joshua Jacobs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8472100Abstract: A deformable element for use in microelectromechanical systems comprises a core layer and a protective layer. The protective layer is capable of deterring combinations of undesired chemical components in operational environments with the core layer of the deformable element.Type: GrantFiled: March 12, 2008Date of Patent: June 25, 2013Assignee: Texas Instruments IncorporatedInventors: Patrick Ian Oden, Larry Joseph Hornbeck, Simon Joshua Jacobs
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Patent number: 8436453Abstract: The present application is directed to a reservoir for use with a micro-electromechanical device having a first surface area to be lubricant. The reservoir comprises a solid component with a porous structure having a second surface area. The second surface area is greater than the first surface area. The reservoir also comprises a lubricant capable of reversibly reacting with either the solid component or the first surface area of the micro-electromechanical device.Type: GrantFiled: December 28, 2006Date of Patent: May 7, 2013Assignee: Texas Instruments IncorporatedInventors: Simon Joshua Jacobs, Seth A. Miller
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Patent number: 8120155Abstract: A MEMS device is packaged in a process which hydrogen (H) deuterium (D) for reduced stiction. H is exchanged with D by exposing the MEMS device with a deuterium source, such as deuterium gas or heavy water vapor, optionally with the assistance of a direct or downstream plasma.Type: GrantFiled: July 31, 2008Date of Patent: February 21, 2012Assignee: Texas Instruments IncorporatedInventors: Earl V. Atnip, Simon Joshua Jacobs
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Publication number: 20110294305Abstract: Device and method for an antireflective coating to improve image quality in an image display system. A preferred embodiment comprises a first high refractive index layer overlying a reflective surface of an integrated circuit, a first low refractive index layer overlying the first high refractive index layer, a second high refractive index layer overlying the first low refractive index layer, and a second low refractive index layer overlying the second high refractive index layer. The alternating layers of high refractive index material and low refractive index material form an optical trap, allowing light to readily pass through in one direction, but not so easily in a reverse direction. The dual alternating layer topology improves the antireflective properties of the antireflective layer and permits a wide range of adjustments for manipulating reflectivity and color point.Type: ApplicationFiled: August 9, 2011Publication date: December 1, 2011Applicant: TEXAS INSTRUMENTS INCORPORATEDInventors: Simon Joshua Jacobs, Duane Scott Dewald, Leigh A. Files, Terry A. Bartlett
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Patent number: 7994600Abstract: Device and method for an antireflective coating to improve image quality in an image display system. A preferred embodiment comprises a first high refractive index layer overlying a reflective surface of an integrated circuit, a first low refractive index layer overlying the first high refractive index layer, a second high refractive index layer overlying the first low refractive index layer, and a second low refractive index layer overlying the second high refractive index layer. The alternating layers of high refractive index material and low refractive index material form an optical trap, allowing light to readily pass through in one direction, but not so easily in a reverse direction. The dual alternating layer topology improves the antireflective properties of the antireflective layer and permits a wide range of adjustments for manipulating reflectivity and color point.Type: GrantFiled: December 21, 2005Date of Patent: August 9, 2011Assignee: Texas Instruments IncorporatedInventors: Simon Joshua Jacobs, Duane Scott Dewald, Leigh A. Files, Terry A. Bartlett
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Patent number: 7763949Abstract: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.Type: GrantFiled: April 28, 2004Date of Patent: July 27, 2010Assignee: Texas Instruments IncorporatedInventors: Walter M. Duncan, Simon Joshua Jacobs, Michael R. Douglass, Richard O. Gale
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Publication number: 20100165314Abstract: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.Type: ApplicationFiled: April 28, 2004Publication date: July 1, 2010Inventors: Walter M. Duncan, Simon Joshua Jacobs, Michael R. Douglass, Richard O. Gale
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Publication number: 20100025832Abstract: A MEMS device is packaged in a process which hydrogen (H) deuterium (D) for reduced stiction. H is exchanged with D by exposing the MEMS device with a deuterium source, such as deuterium gas or heavy water vapor, optionally with the assistance of a direct or downstream plasma.Type: ApplicationFiled: July 31, 2008Publication date: February 4, 2010Applicant: TEXAS INSTRUMENTS INCORPORATEDInventors: Earl V. Atnip, Simon Joshua Jacobs
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Patent number: 7651734Abstract: A method of fabricating a micromechanical device. Several of the micromechanical devices are fabricated 20 on a common wafer. After the devices are fabricated, the sacrificial layers are removed 22 leaving open spaces where the sacrificial layers once were. These open spaces allow for movement of the components of the micromechanical device. The devices optionally are passivated 24, which may include the application of a lubricant. After the devices have been passivated, they are tested 26 in wafer form. After testing 26, any surface treatments that are not compatible with the remainder of the processing steps are removed 28. The substrate wafer containing the completed devices receives a conformal overcoat 30. The overcoat layer is thick enough to project the micromechanical structures, but thin and light enough to prevent deforming the underlying micromechanical structures.Type: GrantFiled: September 7, 2004Date of Patent: January 26, 2010Assignee: Texas Instruments IncorporatedInventor: Simon Joshua Jacobs
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Publication number: 20090231673Abstract: A deformable element for use in microelectromechanical systems comprises a core layer and a protective layer. The protective layer is capable of deterring combinations of undesired chemical components in operational environments with the core layer of the deformable element.Type: ApplicationFiled: March 12, 2008Publication date: September 17, 2009Applicant: Texas Instruments IncorporatedInventors: Patrick Ian Oden, Larry Joseph Hornbeck, Simon Joshua Jacobs
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Publication number: 20090168136Abstract: A spatial light modulator comprises a solid-state chiral material disposed between electrodes such that the polarization direction of the polarized light incident thereto can be controlled through an electrical field established between the electrodes.Type: ApplicationFiled: December 28, 2007Publication date: July 2, 2009Applicant: Texas Instruments IncorporatedInventor: Simon Joshua Jacobs
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Patent number: 7502155Abstract: According to one embodiment of the present invention, a semiconductor device includes a first layer of dielectric material disposed upon an upper surface of a substrate of a semiconductor device and a first non-conductive layer of metal disposed upon an upper surface of the dielectric material. The first layer of dielectric material and the first non-conductive layer of metal act as an optical trap for electromagnetic radiation received by the first non-conductive layer of metal. In particular embodiments, the semiconductor device may further comprise a second layer of dielectric material disposed upon an upper surface of the first non-conductive layer of metal and a second non-conductive layer of metal disposed upon an upper surface of the second layer of dielectric material.Type: GrantFiled: March 15, 2005Date of Patent: March 10, 2009Assignee: Texas Instruments IncorporatedInventors: Paul G. Sudak, Robert L. Adams, Jason M. Neidrich, Simon Joshua Jacobs, Lisa Ann Wesneski, Linda M. Wills, William D. Carter, Judith C. Frederic
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Patent number: 7459325Abstract: Organic surfactants are employed to passivate the surfaces of MEMS devices, such as digital micromirrors. The binding of these surfactants to the surface is improved by first associating with the surface transition metal atoms or ions from Groups IVB, VB, and IVB of the periodic table.Type: GrantFiled: January 5, 2005Date of Patent: December 2, 2008Assignee: Texas Instruments IncorporatedInventors: Simon Joshua Jacobs, Seth Adrian Miller
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Publication number: 20080290325Abstract: Phosphonate surfactants are employed to passivate the surfaces of MEMS devices, such as digital micromirror devices. The surfactants are adsorbed from vapor or solution to form self-assembled monolayers at the device surface. The higher binding energy of the phosphonate end groups (as compared to carboxylate surfactants) improves the thermal stability of the resulting layer.Type: ApplicationFiled: August 3, 2008Publication date: November 27, 2008Applicant: Texas Instruments IncorporatedInventors: Simon Joshua Jacobs, Seth Adrian Miller
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Patent number: 7410820Abstract: Phosphonate surfactants are employed to passivate the surfaces of MEMS devices, such as digital micromirror devices. The surfactants are adsorbed from vapor or solution to form self-assembled monolayers at the device surface. The higher binding energy of the phosphonate end groups (as compared to carboxylate surfactants) improves the thermal stability of the resulting layer.Type: GrantFiled: January 5, 2005Date of Patent: August 12, 2008Assignee: Texas Instruments IncorporatedInventors: Simon Joshua Jacobs, Seth Adrian Miller
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Publication number: 20080160268Abstract: The present application is directed to a reservoir for use with a micro-electromechanical device having a first surface area to be lubricant. The reservoir comprises a solid component with a porous structure having a second surface area. The second surface area is greater than the first surface area. The reservoir also comprises a lubricant capable of reversibly reacting with either the solid component or the first surface area of the micro-electromechanical device.Type: ApplicationFiled: December 28, 2006Publication date: July 3, 2008Inventors: Simon Joshua Jacobs, Seth A. Miller
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Patent number: 7009745Abstract: A micromechanical device having a deflectable member which contacts a stationary member. An antireflective coating is applied to portions of the micromechanical device to limit undesired reflection from the device. A passivation or lubrication layer is applied to the device to reduce stiction between the deflectable member and the stationary member. An insulator layer is utilized between the antireflective coating and the lubrication layer to prevent photoelectric-induced breakdown of the lubrication layer.Type: GrantFiled: October 31, 2003Date of Patent: March 7, 2006Assignee: Texas Instruments IncorporatedInventors: Seth A. Miller, Simon Joshua Jacobs
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Patent number: 6843936Abstract: A desiccant compound, image projection system using the desiccant compound, and a method for utilizing the desiccant compound. The desiccant compound formed by mixing (202) a polymer binder selected from the group consisting of polysaccharides (including without limitation structural polysaccharides such as cellulose, chitin, and their functionalized derivatives), polyamines, polysulfones, and polyamides with a drying agent, typically a zeolite, at a polymer to drying agent weight ratio of 1:2.1 to 1:100, or 1:4 to 1:10. After the desiccant compound is mixed (202) it is applied (204) to a surface and cured (206), often through the application of heat and vacuum. The cured desiccant compound is conditioned (208) and the it package is sealed (210).Type: GrantFiled: October 13, 1999Date of Patent: January 18, 2005Assignee: Texas Instruments IncorporatedInventor: Simon Joshua Jacobs
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Patent number: 6787187Abstract: A method of fabricating a micromechanical device. Several of the micromechanical devices are fabricated 20 on a common wafer. After the devices are fabricated, the sacrificial layers are removed 22 leaving open spaces where the sacrificial layers once were. These open spaces allow for movement of the components of the micromechanical device. The devices optionally are passivated 24, which may include the application of a lubricant. After the devices have been passivated, they are tested 26 in wafer form. After testing 26, any surface treatments that are not compatible with the remainder of the processing steps are removed 28. The substrate wafer containing the completed devices receives a conformal overcoat 30. The overcoat layer is thick enough to project the micromechanical structures, but thin and light enough to prevent deforming the underlying micromechanical structures.Type: GrantFiled: December 31, 2001Date of Patent: September 7, 2004Assignee: Texas Instruments IncorporatedInventor: Simon Joshua Jacobs
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Publication number: 20040136044Abstract: A micromechanical device having a deflectable member which contacts a stationary member. An antireflective coating is applied to portions of the micromechanical device to limit undesired reflection from the device. A passivation or lubrication layer is applied to the device to reduce stiction between the deflectable member and the stationary member. An insulator layer is utilized between the antireflective coating and the lubrication layer to prevent photoelectric-induced breakdown of the lubrication layer.Type: ApplicationFiled: October 31, 2003Publication date: July 15, 2004Inventors: Seth A. Miller, Simon Joshua Jacobs