Patents by Inventor Simon Mathieu
Simon Mathieu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11846879Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 7, 2022Date of Patent: December 19, 2023Assignee: ASML NETHERLAND B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Publication number: 20230280663Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: May 12, 2023Publication date: September 7, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20230273533Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: ApplicationFiled: April 13, 2023Publication date: August 31, 2023Applicant: ASML NETHERLANDS B.V.Inventors: NICOLAAS TEN KATE, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Publication number: 20230151037Abstract: This disclosure is directed, at least in part, to GPR40 agonists useful for the treatment of conditions or disorders involving the gut-brain axis. In some embodiments, the GPR40 agonists are gut-restricted compounds. In some embodiments, the GPR40 agonists are full agonists or partial agonists. In some embodiments, the condition or disorder is a metabolic disorder, such as diabetes, obesity, nonalcoholic steatohepatitis (NASH), or a nutritional disorder such as short bowel syndrome.Type: ApplicationFiled: February 28, 2021Publication date: May 18, 2023Inventors: Iyassu SEBHAT, Shuwen HE, Simon MATHIEU
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Patent number: 11650511Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: August 14, 2020Date of Patent: May 16, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Patent number: 11630399Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: GrantFiled: March 18, 2022Date of Patent: April 18, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Publication number: 20230113609Abstract: This disclosure is directed, at least in part, to SSTR5 antagonists useful for the treatment of conditions or disorders involving the gut-brain axis. In some embodiments, the SSTR5 antagonists are gut-restricted compounds. In some embodiments, the condition or disorder is a metabolic disorder, such as diabetes, obesity, nonalcoholic steatohepatitis (NASH), or a nutritional disorder such as short bowel syndrome.Type: ApplicationFiled: December 2, 2020Publication date: April 13, 2023Inventors: Iyassu SEBHAT, Shuwen HE, Christopher MOYES, Simon MATHIEU, Michael LUZUNG
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Publication number: 20230054421Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: November 7, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanus GERRITZEN
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Patent number: 11500296Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 5, 2021Date of Patent: November 15, 2022Assignee: ASML Netherlands B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Patent number: 11385547Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: May 21, 2020Date of Patent: July 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20220206400Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: ApplicationFiled: March 18, 2022Publication date: June 30, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas TEN KATE, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Robbert Jan VOOGD, Giovanni Francisco NINO, Marinus Jan REMIE, Johannes Henricus Wilhelmus JACOBS, Thibault Simon Mathieu LAURENT, Johan Gertrudis Cornelis KUNNEN
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Patent number: 11300890Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: December 20, 2019Date of Patent: April 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Patent number: 11281115Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: GrantFiled: January 6, 2020Date of Patent: March 22, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Publication number: 20220057722Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: November 5, 2021Publication date: February 24, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanus GERRITZEN
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Patent number: 11175594Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: May 3, 2018Date of Patent: November 16, 2021Assignee: ASML Netherlands B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Publication number: 20210132510Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: May 3, 2018Publication date: May 6, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanns GERRITZEN
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Publication number: 20200371447Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: August 14, 2020Publication date: November 26, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: RE48668Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.Type: GrantFiled: September 21, 2017Date of Patent: August 3, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Johan Gertrudis Cornelis Kunnen, Sander Catharina Reinier Derks
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Patent number: RE49142Abstract: A lithographic apparatus comprising includes an object table which carries an object. The lithographic apparatus may further comprise at least one include a sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the a deformation of the an object due to a varying loads load during operation of the lithographic apparatus, for example a varying loads load induced by a two-phase flow in a channel formed within of the object table. Additionally, or alternatively, the The lithographic apparatus comprises may include a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation.Type: GrantFiled: October 2, 2019Date of Patent: July 19, 2022Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Christianus Wilhelmus Johannes Berendsen, Rogier Hendrikus Magdalena Cortie, Jim Vincent Overkamp, Patricius Jacobus Neefs, Putra Saputra, Ruud Hendrikus Martinus Johannes Bloks, Michael Johannes Hendrika Wilhelmina Renders, Johan Gertrudis Cornelis Kunnen, Thibault Simon Mathieu Laurent
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Patent number: RE49297Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.Type: GrantFiled: October 18, 2019Date of Patent: November 15, 2022Assignee: ASML Netherlands B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen