Patents by Inventor Simon Mathieu
Simon Mathieu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10788763Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: November 17, 2016Date of Patent: September 29, 2020Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Publication number: 20200285154Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: May 21, 2020Publication date: September 10, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: 10747126Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: June 11, 2019Date of Patent: August 18, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Patent number: 10705426Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: April 5, 2017Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20200142325Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: ApplicationFiled: January 6, 2020Publication date: May 7, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Ten Kate, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Robbert Jan Voogd, Giovanni Francisco Nino, Marinus Jan Remie, Johannes Henricus Wilhelmus Jacobs, Thibault Simon Mathieu Laurent, Johan Gertrudis Cornelis Kunnen
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Publication number: 20200124993Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: ApplicationFiled: December 20, 2019Publication date: April 23, 2020Applicant: AS ML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Johannes Henricus Wilhelmus JACOBS, Coen Cornelis Wilhelmus VERSPAGET, Ronald VAN DER HAM, Ivo Adam Johannes THOMAS, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Pieter Lein Joseph GUNTER, Marinus Jan REMIE, Sander Catharina Reinier DERKS
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Patent number: 10591828Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: February 8, 2019Date of Patent: March 17, 2020Assignee: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Patent number: 10551752Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.Type: GrantFiled: March 11, 2011Date of Patent: February 4, 2020Assignee: ASML Netherlands B.V.Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
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Patent number: 10520837Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.Type: GrantFiled: February 16, 2018Date of Patent: December 31, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
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Patent number: 10508896Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.Type: GrantFiled: November 23, 2016Date of Patent: December 17, 2019Assignee: ASML Netherlands B.V.Inventors: Stoyan Nihtianov, Ruud Hendrikus Martinus Johannes Bloks, Johannes Paul Marie De La Rosette, Thibault Simon Mathieu Laurent, Kofi Afolabi Anthony Makinwa, Patricius Jacobus Neefs, Johannes Petrus Martinus Bernardus Vermeulen
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Patent number: 10495985Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.Type: GrantFiled: October 9, 2018Date of Patent: December 3, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Jan Steven Christiaan Westerlaken, Frank Johannes Jacobus Van Boxtel, Maria del Carmen Mercado Carmona, Thibault Simon Mathieu Laurent
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Patent number: 10481502Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: March 12, 2018Date of Patent: November 19, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Publication number: 20190294056Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: ApplicationFiled: June 11, 2019Publication date: September 26, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis KUNNEN, Martijn HOUBEN, Thibault Simon Mathieu LAURENT, Hendrikus Johannes Marinus VAN ABEELEN, Armand Rosa Jozef DASSEN, Sander Catharina Reinier DERKS
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Patent number: 10324382Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.Type: GrantFiled: April 20, 2018Date of Patent: June 18, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
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Publication number: 20190171113Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: ApplicationFiled: February 8, 2019Publication date: June 6, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria KUSTERS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Takeshi KANEKO, Robbert Jan VOOGD, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Johan Gertrudis Cornelis KUNNEN, Ramin BADIE
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Publication number: 20190163066Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: April 5, 2017Publication date: May 30, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: 10203611Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: November 20, 2017Date of Patent: February 12, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Publication number: 20190041761Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.Type: ApplicationFiled: October 9, 2018Publication date: February 7, 2019Applicant: ASML Netherlands B.V.Inventors: Günes NAKIBOGLU, Jan Steven Christiaan WESTERLAKEN, Frank Johannes Jacobus VAN BOXTEL, Maria del Carmen MERCADO CARMONA, Thibault Simon Mathieu LAURENT
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Patent number: 10191377Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.Type: GrantFiled: April 7, 2017Date of Patent: January 29, 2019Assignee: ASML Netherlands, B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen
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Publication number: 20180340767Abstract: A measurement substrate for measuring a condition pertaining in an apparatus for processing production substrates during operation thereof, the measurement substrate including: a body having dimensions compatible with the apparatus; a plurality of sensor modules embedded in the body, each sensor module having: a sensor configured generate an analog measurement signal, an analog to digital converter to generate digital measurement information from the analog measurement signal, and a module controller configured to output the digital measurement information; and a central control module configured to receive the digital measurement information from each of the module controllers and to communicate the digital measurement information to an external device.Type: ApplicationFiled: November 23, 2016Publication date: November 29, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Stoyan NIHTIANOV, Ruud Hendrikus Martinus Johannes BLOKS, Johannes Paul Marie DE LA ROSETTE, Thibault Simon Mathieu LAURENT, Kofi Afoiabi MAKINWA, Jacobus NEEFS, Johannes Petrus Martinus Bernardus VERMEULEN