Abstract: A transparent heat-insulating film is provided, wherein the transparent heat-insulating film includes a base layer including a first surface and a second surface, a hard-coat layer, a silver nanowire layer, and a protective layer including an inner surface and an outer surface. The hard-coat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer. A temperature of the second surface of the base layer is T1 (° C.), a temperature of the outer surface of the protective layer is T2 (° C.), and a temperature difference between T1 and T2 (T1?T2) is ?T. When T1=50-100° C. and the base layer and the protective layer reach thermal equilibrium, ?T=0.15T1?0.35T1.

Abstract: A transparent heat-insulating film is provided, wherein the transparent heat-insulating film includes a base layer including a first surface and a second surface, a hard-coat layer, a silver nanowire layer, and a protective layer including an inner surface and an outer surface. The hard-coat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer. A temperature of the second surface of the base layer is T1 (° C.), a temperature of the outer surface of the protective layer is T2 (° C.), and a temperature difference between T1 and T2 (T1?T2) is ?T. When T1=50-100° C. and the base layer and the protective layer reach thermal equilibrium, ?T=0.15T1?0.35T1.

Abstract: An on-cell touch display and a preparing method thereof are provided. The on-cell touch display includes a display panel and a touch sensor disposed on the display panel. The touch sensor includes a first conductive thin film, which is formed on the display panel; an insulating layer, which is formed on the first conductive thin film; a second conductive thin film, which is formed on the insulating layer; and a protective film, which is formed on the second conductive thin film; wherein the non-uniformity value of the first conductive thin film and the second conductive thin film is less than 15% respectively.

Abstract: A stacking structure includes a substrate, a silver nanowire layer provided on a top of the substrate, and a metal layer provided on a top of the silver nanowire layer. The silver nanowire layer includes a plurality of silver nanowires and an indium tin oxide (ITO) covered on the plurality of silver nanowires. The silver nanowire layer has an overall thickness that is 2.35 to 24 times as thick as a thickness of the ITO. A touch sensor including the above described stacking structure is also disclosed.

Abstract: A photosensitive electrically conductive structure includes: a substrate; a releasing photosensitizing resin layer disposed on the substrate; a nano silver layer disposed on the releasing photosensitizing resin layer; and a photosensitive electrically conductive layer disposed on an edge of the nano silver layer. A visible region is defined in the photosensitive electrically conductive structure where the nano silver layer is not covered by the photosensitive electrically conductive layer and a peripheral wiring region is defined in the photosensitive electrically conductive structure where the nano silver layer is covered by the photosensitive electrically conductive layer. The releasing photosensitizing resin layer has an average molecular weight (Mn) greater than 3,000 but less than 100,000, and the releasing photosensitizing resin layer, the nano silver layer, and the photosensitive electrically conductive layer are patterned.

Abstract: A stacking structure includes a substrate, a silver nanowire layer provided on a top of the substrate, and a metal layer provided on a top of the silver nanowire layer. The silver nanowire layer includes a plurality of silver nanowires and an indium tin oxide (ITO) covered on the plurality of silver nanowires. The silver nanowire layer has an overall thickness that is 2.35 to 24 times as thick as a thickness of the ITO. A touch sensor including the above described stacking structure is also disclosed.

Abstract: A stacking structure includes a substrate, a silver nanowire layer disposed on a top of the substrate, and a metal layer disposed on a top of the silver nanowire layer. The silver nanowire layer includes a plurality of silver nanowires and a protective coating covering the silver nanowires. The silver nanowire layer has a thickness ranging from 40 nm to 120 nm. A touch sensor including the above-described stacking structure is also disclosed.

Abstract: A stack structure includes: a substrate, a copper layer disposed on the substrate, a migration-proof layer disposed on the copper layer, and a silver-nanowire layer disposed on the migration-proof layer, wherein the migration-proof layer is made of materials between copper and silver in galvanic series. A touch sensor includes the stack structure.

Abstract: A transparent conductive film and a touch panel comprising the same are disclosed. The transparent conductive film comprises a substrate and a conductive mesh film disposed on the substrate. The conductive mesh film comprises a plurality of cross-bonded silver nanowires, and a rate of change of resistance of the conductive mesh film is smaller than 1% after bending the transparent conductive film over 250,000 times.

Abstract: A stack structure includes: a substrate, a copper layer disposed on the substrate, a migration-proof layer disposed on the copper layer, and a silver-nanowire layer disposed on the migration-proof layer, wherein the migration-proof layer is made of materials between copper and silver in galvanic series. A touch sensor includes the stack structure.

Abstract: A transparent conductive film and method for making transparent conductive film and touch panel are disclosed. The transparent conductive film includes a substrate and a conductive mesh film. The substrate has a first surface. The conductive mesh film is formed on the first surface of substrate, and the conductive mesh film includes a plurality of silver nanowires. The conductive mesh film includes a plurality of meshes, and the meshes comprise a plurality of traces and a plurality of blank areas. The sheet resistance of the conductive mesh film is 5 ?/sq to 30 ?/sq, the width of each of the traces is 1 ?m to 10 ?m, and a transparency of the conductive mesh film to visible light is greater than 85%.

Abstract: A photosensitive electrically conductive structure includes: a substrate; a releasing photosensitizing resin layer disposed on the substrate; a nano silver layer disposed on the releasing photosensitizing resin layer; and a photosensitive electrically conductive layer disposed on an edge of the nano silver layer. A visible region is defined in the photosensitive electrically conductive structure where the nano silver layer is not covered by the photosensitive electrically conductive layer and a peripheral wiring region is defined in the photosensitive electrically conductive structure where the nano silver layer is covered by the photosensitive electrically conductive layer. The releasing photosensitizing resin layer has an average molecular weight (Mn) greater than 3,000 but less than 100,000, and the releasing photosensitizing resin layer, the nano silver layer, and the photosensitive electrically conductive layer are patterned.

Abstract: The touch panel includes the substrate, the first touch sensing electrode, the second touch sensing electrode, and the insulating layer. A first peripheral wire and a second peripheral wire are located at a peripheral area of the substrate. A first touch sensing electrode layer includes a first portion of a patterned first metal nanowire layer. The peripheral area includes a co-etched conductive layer and a second portion of the patterned first metal nanowire layer. The conductive layer and the second portion of the patterned first metal nanowire layer have a co-etched surface. The second touch sensing electrode is formed above the insulating layer and is connected with the second peripheral wire. The insulating layer may be made of a low dielectric constant material.

Abstract: A touch panel includes a substrate, first and second touch sensing electrodes, and first and second traces. The substrate includes a display area and a peripheral area. The first and second touch sensing electrodes are formed on the display area, and the first and second traces are formed on the peripheral area. The first touch sensing electrode is formed by a first portion of a metal nanowire layer, which is patterned. The peripheral trace includes a conductive layer and a second portion of the metal nanowire layer, both of which are patterned in a co-etch step. The conductive layer and the second portion of the metal nanowire layer have a coplanar etched surface. The second touch sensing electrode is formed on an insulating layer and connects with the second trace.

Abstract: The present disclosure discloses an etching solution, a touch panel, and a manufacturing method thereof. The manufacturing method of the touch panel includes the following operations. A substrate is provided, in which the substrate has a visual area and a peripheral area. A metal layer and a metal nanowire layer are disposed, in which a first portion of the metal nanowire layer is disposed in the visual area, and a second portion of the metal nanowire layer and the metal layer are disposed in the peripheral area. A patterning step is performed. The patterning step includes simultaneously forming multiple peripheral wires and the second portion of the metal nanowire layer by using the etching solution for etching the metal layer and the metal nanowire layer.

Abstract: An electrode structure and a touch panel including the electrode structure are provided. The electrode structure includes a membrane layer and a metallic nanowires layer having metallic nanowires. A first portion of the metallic nanowires layer is covered by the membrane layer, and a second portion of the metallic nanowires layer is exposed out of the membrane layer. The membrane layer is made of a copolymer formed by mixing two or more materials having different functional groups.

Abstract: The touch panel includes the substrate, the first touch sensing electrode, the second touch sensing electrode, and the insulating layer. A first peripheral wire and a second peripheral wire are located at a peripheral area of the substrate. A first touch sensing electrode layer includes a first portion of a patterned first metal nanowire layer. The peripheral area includes a co-etched conductive layer and a second portion of the patterned first metal nanowire layer. The conductive layer and the second portion of the patterned first metal nanowire layer have a co-etched surface. The second touch sensing electrode is formed above the insulating layer and is connected with the second peripheral wire. The insulating layer may be made of a low dielectric constant material.

Abstract: A patterning process for forming a double-sided electrode structure includes: providing a substrate having two opposite surfaces, wherein a first photo-sensitive layer and a second photo-sensitive layer are respectively formed on the opposite surfaces; forming a first metal nanowire layer on the first photo-sensitive layer and a second metal nanowire layer on the second photo-sensitive layer; and performing a double-sided lithography process. The lithography process includes: performing an exposure process to define a removing area and a remaining area on both of the first and the second photo-sensitive layers; and removing the first and second photo-sensitive layers and the first and second metal nanowire layers in the defined removing areas by a developer solution, thereby patterning the first and second metal nanowire layers.

Abstract: A touch panel includes a substrate, first and second touch sensing electrodes, and first and second traces. The substrate includes a display area and a peripheral area. The first and second touch sensing electrodes are formed on the display area, and the first and second traces are formed on the peripheral area. The first touch sensing electrode is formed by a first portion of a metal nanowire layer, which is patterned. The peripheral trace includes a conductive layer and a second portion of the metal nanowire layer, both of which are patterned in a co-etch step. The conductive layer and the second portion of the metal nanowire layer have a coplanar etched surface. The second touch sensing electrode is formed on an insulating layer and connects with the second trace.

Abstract: An electrode structure and a touch panel including the electrode structure are provided. The electrode structure includes a membrane layer and a metallic nanowires layer having metallic nanowires. A first portion of the metallic nanowires layer is covered by the membrane layer, and a second portion of the metallic nanowires layer is exposed out of the membrane layer. The membrane layer is made of a copolymer formed by mixing two or more materials having different functional groups.