Patents by Inventor Soo-Won Lee

Soo-Won Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170032270
    Abstract: A method of predicting personality traits using a personal life log and an apparatus for performing the same are disclosed. The method of predicting personality traits comprises collecting personal life log in a social network, generating a user behavior matrix by defining an object about user's behavior through analysis of the collected personal life log in a triple structure and extracting a user behavior parameter through the generated user behavior matrix, obtaining interaction between a user and a friend by analyzing the personal life log and obtaining a friend relation characteristic parameter by using the obtained interaction, obtaining a moving path characteristic parameter by using location information made in a feed by the user through analysis of the personal life log, and predicting personality traits by applying the user behavior parameter, the friend relation characteristic parameter and the moving path characteristic parameter to four learned personality traits models.
    Type: Application
    Filed: May 29, 2014
    Publication date: February 2, 2017
    Inventors: Soo-Won LEE, Jong-Bum BAIK
  • Patent number: 8956429
    Abstract: Disclosed are a cutting wheel composition, and a cutting wheel using the cutting wheel composition. The disclosed composition includes 50 to 85 wt % of abrasive particles, 10 to 25 wt % of binder resin, and balance filler, wherein the binder resin includes a phenolic resin as a first binder resin; and at least one of a (bis)maleimide resin and a cyanate ester resin as a second binder resin. The composition includes at least one of the (bis)maleimide resin and the cyanate ester resin, as well the phenolic resin, as the binder resin, and thereby makes it possible to fabricate a cutting wheel having improved life characteristics through the improvement of heat-resistance and scratch-resistance.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: February 17, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Doo-Hyun Lee, Baek-Nam Noh, Soo-Won Lee
  • Publication number: 20120149289
    Abstract: Disclosed are a cutting wheel composition, and a cutting wheel using the cutting wheel composition. The disclosed composition includes 50 to 85 wt % of abrasive particles, 10 to 25 wt % of binder resin, and balance filler, wherein the binder resin includes a phenolic resin as a first binder resin; and at least one of a (bis)maleimide resin and a cyanate ester resin as a second binder resin. The composition includes at least one of the (bis)maleimide resin and the cyanate ester resin, as well the phenolic resin, as the binder resin, and thereby makes it possible to fabricate a cutting wheel having improved life characteristics through the improvement of heat-resistance and scratch-resistance.
    Type: Application
    Filed: August 25, 2010
    Publication date: June 14, 2012
    Inventors: Doo-Hyun Lee, Baek-Nam Noh, Soo-Won Lee
  • Patent number: 6495055
    Abstract: An etching system and method. In the method, layers are etched on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, wherein an etching period varies according to an accumulated process number of substrates. The system includes an etching equipment including an etching processor for etching layers on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, and a loader for temporarily holding cassettes in which the substrates are stored; and a controller for controlling operations of the etching equipment. The etching equipment changes an etching period according to an accumulated process number of the substrates.
    Type: Grant
    Filed: June 22, 1999
    Date of Patent: December 17, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Taek Lim, Sung-Joon Byun, Soo-Won Lee, Jin-Soo Kim
  • Patent number: 6420440
    Abstract: The present invention relates to a method for recycling an alignment layer material. The recycled alignment layer material shows the same characteristics as an original alignment layer material. The waste solution of the alignment layer material produced during the liquid crystal display manufacturing processes is recycled by solidifying polyamic acids and soluble polyimides by putting a waste solution of the alignment layer material into an organic solution or ultra purified water in which the alignment layer material constituents of polyamic acids and soluble polyimides are insoluble, separating polyamic acids and soluble polyimides from the organic solvent or ultra purified water, and dissolving the separated solid polyamic acids and soluble polyimides into a solvent. Recycling the alignment layer material in this method can significantly reduce the manufacturing costs.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: July 16, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Bong-Woo Lee, Soo-Won Lee, Sho-Hak Nam, Jin-Ho Ju, Soo-Im Jeong, Hong-Sick Park, Sung-Chul Kang
  • Publication number: 20020088774
    Abstract: An etching system and method. In the method, layers are etched on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, wherein an etching period varies according to an accumulated process number of substrates. The system includes an etching equipment including an etching processor for etching layers on a plurality of substrates using a single amount of etchant to form a predetermined pattern on each of the layers, and a loader for temporarily holding cassettes in which the substrates are stored; and a controller for controlling operations of the etching equipment. The etching equipment changes an etching period according to an accumulated process number of the substrates.
    Type: Application
    Filed: June 22, 1999
    Publication date: July 11, 2002
    Inventors: JUNG-TAEK LIM, SUNG-JOON BYUN, SOO-WON LEE, JIN-SOO KIM