Patents by Inventor Soon Jung

Soon Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180153932
    Abstract: The present invention relates to a method for maintaining the increased intracellular p53 level, induced by a platinum-based anticancer drug, and an application thereof and, more specifically, to a method for maintaining the increased intracellular p53 level in cells by administering a platinum-based anticancer drug and siRNA to ubiquitin ligase for p53 to a subject in need thereof in combination and sequentially, and a composition for promoting cancer cell apoptosis using the same. According to the method of the present invention, the increased intracellular p53 expression level can be maintained for a long period of time in spite of the treatment with a low-concentration platinum-based anticancer drug, thereby effectively inducing the apoptosis of cancer cells and minimizing the drug side effect caused by the administration of the platinum-based anticancer drug, and thus the present invention can be favorably used in the prevention of cancer or the development of cancer medicines.
    Type: Application
    Filed: October 16, 2017
    Publication date: June 7, 2018
    Inventors: Young Kee SHIN, Young Deug KIM, Hun Soon JUNG, Deuk Ae KIM, Nirmal Rajasekaran
  • Publication number: 20180135055
    Abstract: The present invention relates to a composition for cancer cell sensitization containing as an active ingredient a substance inhibiting the expression of an oncogene of a HPV virus, and more specifically, to a composition for radiosensitization which is used for the treatment of cancer induced by HPV infection and contains as an active ingredient oligonucleotide having any one nucleic acid sequence selected from the group consisting of sequence numbers 1 to 10. The oligonucleotide of the present invention inhibits the expressions of E6 and E7 which are HPV virus oncoproteins, thereby inhibiting the proliferation of tumor cells, and enhances the sensitivity of tumor cells to radiation, thereby exhibiting an excellent effect as a sensitizer that can maximize the cell death effect.
    Type: Application
    Filed: January 30, 2018
    Publication date: May 17, 2018
    Inventors: Young Kee Shin, Young Deug Kim, Hun Soon Jung, Deuk Ae Kim, Kyung Tae Ha
  • Publication number: 20180044679
    Abstract: The present invention relates to a composition for preventing or treating diseases associated with human papillomavirus (HPV), and more specifically, cancer associated with HPV, and even more specifically, cervical cancer. The nucleotide sequence of the present invention, the sequence in which the base thereof is modified, and a specific combination thereof can be useful in a composition for effectively treating diseases associated with HPV infection by greatly inhibiting the expression of the E6/E7 gene of HPV type 16 or 18.
    Type: Application
    Filed: June 26, 2017
    Publication date: February 15, 2018
    Inventors: Young Kee SHIN, Young Deug KIM, Hun Soon JUNG, Deuk Ae KIM
  • Patent number: 9719093
    Abstract: The present invention relates to a composition for preventing or treating diseases associated with human papillomavirus (HPV), and more specifically, cancer associated with HPV, and even more specifically, cervical cancer. The nucleotide sequence of the present invention, the sequence in which the base thereof is modified, and a specific combination thereof can be useful in a composition for effectively treating diseases associated with HPV infection by greatly inhibiting the expression of the E6/E7 gene of HPV type 16 or 18.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: August 1, 2017
    Assignee: Abion Inc.
    Inventors: Young Kee Shin, Young-Deug Kim, Hun Soon Jung, Deuk Ae Kim
  • Publication number: 20170198291
    Abstract: The present invention relates to a composition for preventing or treating diseases associated with human papillomavirus (HPV), and more specifically, cancer associated with HPV, and even more specifically, cervical cancer. The nucleotide sequence of the present invention, the sequence in which the base thereof is modified, and a specific combination thereof can be useful in a composition for effectively treating diseases associated with HPV infection by greatly inhibiting the expression of the E6/E7 gene of HPV type 16 or 18.
    Type: Application
    Filed: February 23, 2017
    Publication date: July 13, 2017
    Inventors: Young Kee SHIN, Young Deug KIM, Hun Soon JUNG, Deuk Ae KIM
  • Publication number: 20150299711
    Abstract: The present invention relates to a composition for preventing or treating diseases associated with human papillomavirus (HPV), and more specifically, cancer associated with HPV, and even more specifically, cervical cancer. The nucleotide sequence of the present invention, the sequence in which the base thereof is modified, and a specific combination thereof can be useful in a composition for effectively treating diseases associated with HPV infection by greatly inhibiting the expression of the E6/E7 gene of HPV type 16 or 18.
    Type: Application
    Filed: August 1, 2013
    Publication date: October 22, 2015
    Inventors: Young Kee SHIN, Young-Deug KIM, Hun Soon JUNG, Deuk Ae KIM
  • Patent number: 8981293
    Abstract: An inspection system includes: an automated optical inspection device detecting a defect of an inspection object by using a light; a scanning electron microscope device for inspecting the defect of the inspection object by using an electron beam and including a vacuum chamber; a stage positioned below and spaced from the scanning electron microscope device and supporting the inspection object; and a transferring device connected to the scanning electron microscope chamber and the automated optical inspection and transferring the scanning electron microscope device and the automated optical inspection device to positions over the stage. Air is in a gap between the chamber and the inspection object. Accordingly, an inspection object of a large size may be inspected for analysis without damage to the inspection object.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: March 17, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Hyun Gong, Young-Gil Park, Jae-Kwon Lee, Jung-Un Kim, Do-Soon Jung, Hyun-Jung Kim, Geum-Tae Kim
  • Publication number: 20140373729
    Abstract: Electric rice cooker comprises: an upper casing unit having a valve unit discharging pressure; an inner bowl arranged beneath the upper casing unit and containing food; a heat insulating outer bowl enclosing the inner bowl and forming a first heat sustaining space between the inner and outer bowls; a lower casing unit enclosing the heat insulating outer bowl and having air supply ports; a lower heating unit, interposed between the heat insulating outer bowl and the inner bowl, for generating heat; an upper heater unit arranged inside the upper casing unit to operate with the lower heater unit; a vacuum packing unit interposed between the upper casing unit and the inner bowl to cut off air flow; a stopper groove formed along an edge of the upper casing unit facing the inner bowl; and a stopper protrusion for causing the vacuum packing unit to be caught at the stopper groove.
    Type: Application
    Filed: January 29, 2013
    Publication date: December 25, 2014
    Inventors: Cha Sik KIM, Kwang Soon JUNG, Dong Hyun KIM
  • Publication number: 20140291514
    Abstract: An inspection system includes: an automated optical inspection device detecting a defect of an inspection object by using a light; a scanning electron microscope device for inspecting the defect of the inspection object by using an electron beam and including a vacuum chamber; a stage positioned below and spaced from the scanning electron microscope device and supporting the inspection object; and a transferring device connected to the scanning electron microscope chamber and the automated optical inspection and transferring the scanning electron microscope device and the automated optical inspection device to positions over the stage. Air is in a gap between the chamber and the inspection object. Accordingly, an inspection object of a large size may be inspected for analysis without damage to the inspection object.
    Type: Application
    Filed: March 6, 2014
    Publication date: October 2, 2014
    Applicant: Samsung Display Co., Ltd.
    Inventors: Dong-Hyun GONG, Young-Gil PARK, Jae-Kwon LEE, Jung-Un KIM, Do-Soon JUNG, Hyun-Jung KIM, Geum-Tae KIM
  • Patent number: 8637363
    Abstract: Methods of manufacturing a semiconductor device are provided. The method includes forming a preliminary mask pattern on an etch target layer. The preliminary mask pattern includes wave line type patterns, and each of the wave line type patterns includes main pattern portions and connection bar pattern portions. Node separation walls are formed on sidewalls of the preliminary mask patterns. The etch target layer is etched using the node separation walls as etch masks to form through holes penetrating the etch target layer. Nodes are formed in respective ones of the through holes.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: January 28, 2014
    Assignee: SK hynix Inc.
    Inventor: Yong Soon Jung
  • Patent number: 8426116
    Abstract: An exposure mask for recess gate includes a transparent substrate and a recess gate pattern. The recess gate pattern is disposed over the transparent substrate. The recess gate pattern includes a first portion having a first line width and a second portion having a second line width smaller than the first line width. In the second portion, elements of the recess gate pattern are separated.
    Type: Grant
    Filed: July 23, 2010
    Date of Patent: April 23, 2013
    Assignee: Hynix Semiconductor Inc.
    Inventor: Yong Soon Jung
  • Patent number: 8377899
    Abstract: The present invention relates to a composition for the treatment of cervix cancer, more precisely a composition for the treatment of cervix cancer comprising the first active part containing human papilloma virus (referred as “HPV” hereinafter) specific siRNA as an active ingredient and the second active part containing an anticancer agent as an active ingredient. The composition for the treatment of cancer of the present invention has better anticancer effect than the single therapy of the HPV specific siRNA or the anticancer agent, and has an advantage of reducing side effects by using the anticancer agent at a low concentration.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: February 19, 2013
    Assignee: SNU R&DB Foundation
    Inventors: Young Kee Shin, Hun Soon Jung, Yu Kyoung Oh
  • Publication number: 20120217252
    Abstract: The present invention discloses double cookware and a method for manufacturing the same. The disclosed double cookware includes an inner vessel and an outer vessel. A protrusion is formed on a side surface of the outer vessel and includes a rivet hole. A safe connection member is connected to a handle to be coupled to the rivet hole and has a joint hole formed therein. A rivet is inserted into the joint hole via the rivet hole and forcibly secured thereto. A to space is defined between a bottom of the inner vessel and a bottom of the outer vessel when inserting the inner vessel into the outer vessel. A bimetal through-hole is formed in a bimetal sensor in order to mount the bimetal sensor, which is automatically opened/closed depending on temperature, to the protrusion. A thread hole is formed in the protrusion to be fastened by a bimetal fastening bolt. A fastening bolt presses and secures the inner vessel through a threaded portion of the safe fastening unit and a connection hole of the outer vessel.
    Type: Application
    Filed: August 1, 2011
    Publication date: August 30, 2012
    Inventor: KWANG SOON JUNG
  • Patent number: 8105913
    Abstract: Disclosed herein is a method of fabricating a capacitor of a semiconductor device that includes sequentially forming an interlayer insulating film defining a contact plug, a lower electrode oxide film, and a hard mask film over a semiconductor substrate; etching the hard mask film with a mask comprising a dummy pattern and a cell pattern to form a hard mask pattern wherein a first trench is formed in a dummy pattern region and a second trench is formed in a cell pattern region; forming a capping film that buries the first trench; and etching the lower electrode oxide film with the capping film and the hard mask pattern as a mask to form a lower electrode trench that exposes the contact plug.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: January 31, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventor: Yong Soon Jung
  • Patent number: 8020718
    Abstract: A filler tube assembly for vehicles is disclosed. The filler tube assembly includes a fuel supply tube made of aluminum for injecting a fuel into a fuel tank of the vehicle, a gas circulation tube having one end coupled to a front end of the fuel supply tube and the other end coupled to the fuel tank, so as to circulate a gas when the fuel is supplied, a tube cap made of aluminum and fixed to the front end of the fuel supply tube, and a shutter fixed to an inner portion of the front end of the fuel supply tube to prevent reverse current of the fuel supplied in the fuel tank.
    Type: Grant
    Filed: May 1, 2008
    Date of Patent: September 20, 2011
    Inventor: Ho Soon Jung
  • Patent number: 7902079
    Abstract: A method for fabricating a recess pattern in a semiconductor device includes defining an active region on a substrate, forming a first mask pattern over the active region in a line type structure, forming a second mask pattern comprising an open region over the active region, the open region exposing a portion where the active region and the first mask pattern intersect, and etching the active region of the substrate exposed by the first and second mask patterns to form recess patterns.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: March 8, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventor: Yong-Soon Jung
  • Patent number: 7862991
    Abstract: A method for fabricating a recess pattern in a semiconductor device includes forming a photoresist layer over a substrate including active regions, performing a first photo-exposure process on the photoresist layer using a photo mask including repeatedly formed line structures and spaces, performing a second photo-exposure process on the photoresist layer using a photo mask exposing the active regions, performing a developing process on regions of the photoresist layer whereon both the first and second photo-exposure processes are performed, and etching the substrate to form recess patterns using the remaining photoresist layer.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: January 4, 2011
    Assignee: Hynix Seminconductor Inc.
    Inventor: Yong-Soon Jung
  • Publication number: 20100291768
    Abstract: An exposure mask for recess gate includes a transparent substrate and a recess gate pattern. The recess gate pattern is disposed over the transparent substrate. The recess gate pattern includes a first portion having a first line width and a second portion having a second line width smaller than the first line width. In the second portion, elements of the recess gate pattern are separated.
    Type: Application
    Filed: July 23, 2010
    Publication date: November 18, 2010
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Yong Soon Jung
  • Publication number: 20100233061
    Abstract: Disclosed herein is a method of fabricating superhydrophobic silica-based powder, comprising: forming a hydrogel by adding an organosilane compound having alkaline pH and an inorganic acid to a non-ion-exchanged water glass solution, which is a precursor, to form a mixed solution and then surface-modifying and gelating the mixed solution; dipping the hydrogel into a nonpolar solvent to solvent-exchange the hydrogel and remove sodium ions (Na+) therefrom; and drying the solvent-exchanged hydrogel through a fluidized bed drying method under normal pressure or reduced pressure to fabricate aerogel powder. According to the method of fabricating a superhydrophobic silica-based powder of the present invention, the process thereof is very simple and economical. Therefore, the present invention is expected to be industrially important.
    Type: Application
    Filed: March 29, 2010
    Publication date: September 16, 2010
    Applicant: EM-Power Co., Ltd.
    Inventors: Ho Sung Park, Sharad D. Bhagat, Jong-Hyun Lim, Young-Chul Joung, Seung-Yong Jee, Jong-Chul Park, In-Soon Jung
  • Patent number: 7785483
    Abstract: An exposure mask for recess gate includes a transparent substrate and a recess gate pattern. The recess gate pattern is disposed over the transparent substrate. The recess gate pattern includes a first portion having a first line width and a second portion having a second line width smaller than the first line width. In the second portion, elements of the recess gate pattern are separated.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: August 31, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventor: Yong Soon Jung