Abstract: Provided are an alignment key, a method for fabricating the alignment key, and a method for fabricating a thin film transistor substrate using the alignment key. The method for fabricating the alignment key includes forming a first metal layer on a base substrate, forming a first alignment key and a first mark portion of a second alignment key by selectively patterning the first metal layer, forming a dielectric on the first metal layer, forming a second metal layer on the dielectric, and forming a second mark portion of the second alignment key on the dielectric by selectively patterning the second metal layer.

Abstract: An LCD and an LCD repairing method are provided. The LCD repairing method includes forming a hole on a first or second substrate at a position corresponding to a defective pixel and forming a pigment in the hole. The LCD includes a first substrate on which a pixel electrode and a TFT are formed in a pixel region formed in a matrix pattern, a second substrate on which a color filter layer and a black matrix are formed, the second substrate facing the first substrate, a hole formed on an outer surface of the first or second substrate to repair a defective pixel, and a repair pattern formed in the hole.

Abstract: A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad is formed on a substrate. An insulating film including a plurality of contact holes and a semiconductor pattern is formed on the first mask pattern group.

Abstract: A liquid crystal display has a pad structure. The pad structure includes at least one pad formed on a substrate, an insulating film formed on the pad, and at least one conductive layer connected to the pad through contact holes defined through the insulating film. The insulating film covers side surfaces of the pad and a portion of the substrate adjacent to the side surfaces of the pad.

Abstract: A method of fabricating a printing plate includes: preparing a substrate; forming a metal layer on an entire surface of the substrate; forming a resist pattern on the metal layer, the resist pattern having a fine pattern exposing a portion of the metal layer; wet etching the exposed metal layer, and removing the resist pattern to form a metal layer pattern exposing a portion of the substrate; wet etching the exposed substrate, and removing the metal layer pattern to form a recessed pattern; and forming a compensation layer on an entire surface of the substrate where the recessed pattern is formed.

Abstract: A method for manufacturing a liquid crystal display includes simultaneously forming a gate electrode and a gate bus line on a transparent dielectric substrate, simultaneously forming a channel layer, an ohmic contact layer, and source/drain electrodes by forming a gate insulation film, an amorphous silicon film, a doped amorphous silicon film, and a metal film on the transparent dielectric substrate on which the gate electrode and the gate bus line are formed and etching the metal film, the amorphous silicon film, and the doped amorphous silicon film, and forming a pixel electrode by forming a protective film and a transparent metal film on the transparent dielectric substrate upon which the source/drain electrodes are formed and finely etching the transparent metal film through a lift-off process using a stripper solution.

Abstract: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad ter

Abstract: An array substrate for a liquid crystal display device includes a gate line and a first storage electrode on a substrate, a data line crossing the gate line to define a first pixel region, a thin film transistor connected to the gate line and the data line, a second storage electrode over the first storage electrode, a first pixel electrode in the first pixel region, the first pixel electrode connected to the thin film transistor and the second storage electrode, the second storage electrode including a first portion over the first storage electrode and a second portion in a second pixel region adjacent to the first pixel region, and a repair pattern for the first pixel region between the second storage electrode and a second pixel electrode in the second pixel region.

Abstract: A TFT array substrate is fabricated in a reduced number of processes. The TFT array substrate includes gate and data pads with enlarged contact areas to facilitate contact with an inspecting pin of an inspection device. An LCD incorporating the TFT array substrate is inspected by contacting the inspecting pin to the gate and data pads. The TFT array substrate includes first, second, and third conductive pattern groups. The first conductive pattern group includes a gate electrode, a gate line, and a lower gate pad electrode. The second conductive pattern group includes source and drain electrodes, a data line, and a lower data pad electrode. The third conductive pattern group includes a pixel electrode, and upper gate and data pad electrodes. A semiconductor pattern is along and beneath the second conductive pattern group. Gate insulating and protective film patterns are at areas not occupied by the third conductive pattern group.

Abstract: A liquid crystal display device and a fabricating method thereof for simplifying a process are disclosed. In the method of fabricating the liquid crystal display device, a first conductive pattern group including a gate line and a gate electrode, a common line and a common electrode, a pixel electrode and a pad is formed on a substrate. An insulating film including a plurality of contact holes and a semiconductor pattern is formed on the first mask pattern group. And a second conductive pattern group including a data line, a source electrode and a drain electrode is formed on an insulating film provided with the semiconductor pattern, and exposes an active layer of the semiconductor pattern.

Abstract: A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.

Abstract: A liquid crystal display has a pad structure. The pad structure includes at least one pad formed on a substrate, an insulating film formed on the pad, and at least one conductive layer connected to the pad through contact holes defined through the insulating film. The insulating film covers side surfaces of the pad and a portion of the substrate adjacent to the side surfaces of the pad.

Abstract: This invention relates to a method of forming fine pattern that is adaptive for forming a fine pattern without limit of an exposure resolution, a liquid crystal display device and a fabricating method. The method of forming fine pattern comprises forming a photo-resist pattern on a transparent conductive layer. The photo-resist pattern having a minimum line width corresponding to an exposure resolution of an exposure device. The method further comprises over-etching the transparent conductive layer by an etching process using the photo-resist pattern as a mask to form an electrode pattern having a line width narrower than the exposure resolution of the exposure device.

Abstract: Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract: A liquid crystal display device, and a fabricating method thereof, that is capable of providing uniform liquid cell gaps. A main seal defines a liquid crystal injection area. A first step coverage-compensating layer is provided between a substrate on which the main seal has been coated and the main seal. A plurality of dummy seals is arranged external to the main seal. A second step coverage-compensating layer having the same thickness as the first step coverage-compensating layer is provided between the substrate on which the dummy seals are arranged and the dummy seals. Accordingly, a main seal and dummy seals having the same thickness produce uniform liquid crystal cell gaps. The liquid crystal display device is beneficially made by a fabrication process employing four or five masks.

Abstract: A method of manufacturing a precise printing plate, and a method of manufacturing an LCD device using the same are disclosed, the method of manufacturing the precise printing plate comprising forming a mask layer of a predetermined pattern on a substrate; etching the substrate with an etchant including an anionic surfactant by using the mask layer of the predetermined pattern, to thereby form a trench; and removing the mask layer.

Abstract: A method for repairing a short defect according to the present invention includes forming a first conductive pattern on a substrate, forming a photo-resist pattern on the first conductive pattern using a rear exposure for the first conductive pattern being shorted by a residue pattern, and removing the residue pattern exposed through the photo-resist pattern.

Abstract: The present invention relates to an apparatus and method for repairing a liquid crystal display panel, which is capable of improving a yield thereof by darkening a bright point to minimize a defect ratio thereof. An apparatus for repairing a liquid crystal display panel according to the present invention includes: a liquid crystal display panel including a repair film formed on any one of a first substrate and a second substrate, which are facing to each other with a liquid crystal layer therebetween; and a laser irradiating device to irradiate a laser to the repair film to darken a specific area of the repair film, which is corresponded to an area where a bright point appears in the liquid crystal display panel.

Abstract: A thin film transistor array substrate for a liquid crystal display panel includes a gate line formed on a substrate. A data line crosses the gate line, thus defining a pixel region. A gate insulating film is positioned between the data line and the gate line. A thin film transistor is formed at a crossing of the gate line and the data line. A passivation film pattern exposes a portion of a drain electrode of the thin film transistor. At least one protrusion is provided to divide the pixel region into a plurality of regions, each of the regions having a different liquid crystal alignment from the other regions. A pixel electrode is connected to the thin film transistor to cover the pixel region excluding the passivation film pattern and the at least one protrusion.

Abstract: A LCD device and its fabrication method as discussed. According to an embodiment, the LCD device includes a plurality of gate lines and data lines arranged on a substrate to define a plurality of unit pixels; thin film transistors (TFTs) each formed at an intersecting region of the gate lines and the data lines; a plurality of gate pad portions and data pad portions formed at end portions of the gate lines and the data lines, respectively, at least one of the gate and data pad portions being made up of at least two pad unit portions, each pad unit portion having at least one contact hole such that the contact holes of one of the plurality of gate or data pad portions are arranged in a zigzag or an oblique line format; and pixel electrodes formed at the unit pixels.