Abstract: A method of forming fine pattern includes providing a film, forming a photo-resist pattern on the film, ashing the photo-resist pattern and patterning the film by using the ashed photo-resist pattern as a mask.

Abstract: A thin film transistor substrate structure of a horizontal electric field type LCD comprises a plurality of signal lines including a gate, a data, and a common lines disposed on a substrate; the data line intersecting with the gate and common lines, a gate insulating film disposed between the data line and the gate and common lines, a pixel area being defined by the intersection of the data and gate lines; a thin film transistor disposed at the intersection of the data line and gate line; a common and a pixel electrodes both having a portion extended into the pixel area; a protective film disposed over the substrate and the thin film transistor; and at least one pad structure including an upper pad electrode contacting a lower pad electrode within a first contact hole wherein the upper pad electrode is absent from the upper surface of the protective film.

Abstract: An LCD device having an improved aperture ratio is disclosed. The LCD device includes first and second substrate facing each other; gate and data lines formed on the first substrate, wherein the gate and data lines are formed substantially perpendicularly with respect to each other to define a pixel region; common and pixel electrodes formed in the pixel region, wherein the common and pixel electrodes are arranged in an alternating pattern with an empty space therebetween, wherein a horizontal electric field is generated between the common and pixel electrodes; and a liquid crystal layer formed between the first and second substrates.

Abstract: A thin film transistor substrate structure for using a horizontal electric field includes a substrate; a gate line and a common line formed parallel with each other from a first conductive layer on the substrate; a gate insulating film formed on the substrate, the gate line and the first common line; a data line formed from a second conductive layer on the gate insulating film, the data line crossing the gate line and the common line to define a pixel area; a thin film transistor connected to the gate line and the data line; a protective film covering the data line and the thin film transistor; a common electrode formed connected to the common line from a third conductive layer, the common electrode being disposed within a first hole through the protective film and the gate insulating film; and a pixel electrode connected to the thin film transistor and formed from a third conductive layer, the pixel electrode being disposed within a second hole through the protective film and the gate insulating film at the

Abstract: A method and an apparatus of fabricating a liquid crystal display device adapted to improve a lift-off efficiency are disclosed. The liquid crystal display device is also disclosed. The method includes forming a first thin film on a substrate; forming a photo-resist pattern on the first thin film; etching the first thin film using the photo-resist pattern as a mask; forming a second thin film on the substrate having the photo-resist pattern; forming a plurality of stripper infiltration paths; and removing the photo-resist pattern and the second thin film using a stripper within the stripper infiltration paths. The device includes two substrates facing each other; a liquid crystal layer; data lines and gate lines that cross each other to define pixel regions; thin film transistors; pixel electrodes connected to the thin film transistors; and an inorganic layer in each pixel region, wherein the inorganic layer includes a plurality of cracks.

Abstract: A method of manufacturing an in-plane switching mode liquid crystal display device includes forming an insulation layer on a substrate, patterning a resist layer on the insulation layer, etching the insulation layer to form an insulation layer pattern having tapered edges, forming electrode layers on exposed surfaces of the substrate, the tapered edges, and the resist layer, etching the electrode layers formed on the exposed surfaces and on the resist layer, and removing the resist layer to form the common electrode and the pixel electrode with slopes and that are arranged parallel to each other on the tapered edges of the insulation layer. The common electrode and the pixel electrode each have a width less than 1 ?m, which increases aperture ratio and transmittance.

Abstract: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad ter

Abstract: An LCD device and a method for manufacturing the same are disclosed. The LCD device comprises first and second substrates facing each other, a liquid crystal layer formed between the first and second substrates, a pixel region defined on the first and the second substrates, at least one micro hole formed from a rear surface of any one of the first and second substrates in the pixel region, the rear surface being an opposite surface of the substrate with respect to the liquid crystal layer, and a non-transparent material at least partially filled in the micro hole.

Abstract: A method and an apparatus of fabricating a liquid crystal display device adapted to improve a lift-off efficiency are disclosed. The liquid crystal display device is also disclosed. The method includes forming a first thin film on a substrate; forming a photo-resist pattern on the first thin film; etching the first thin film using the photo-resist pattern as a mask; forming a second thin film on the substrate having the photo-resist pattern; forming a plurality of stripper infiltration paths; and removing the photo-resist pattern and the second thin film using a stripper within the stripper infiltration paths. The device includes two substrates facing each other; a liquid crystal layer; data lines and gate lines that cross each other to define pixel regions; thin film transistors; pixel electrodes connected to the thin film transistors; and an inorganic layer in each pixel region, wherein the inorganic layer includes a plurality of cracks.

Abstract: A method for fabricating a liquid crystal display panel is provided. A thin film transistor array substrate and a color filter array substrate are formed. The thin film transistor array substrate includes a screen region having gate lines, data lines, thin film transistors, and pixel electrodes; a pad region having gate pads, an overetch prevention pattern formed overlapped with a gate insulating film in an outer portion of each gate pad, and data pads; data pad protection electrodes each on a respective data pad, and a protection film on an entire surface of the screen region and the pad region. The thin film transistor array substrate and the color filter array substrate are bonded together so that the pad region remains uncovered. Also, a portion of the protection film and the overetch prevention pattern of the pad region are etched to partially expose the gate pads and the data pad protection electrodes, and to form gate holes in the gate insulating film over corresponding gate pads.

Abstract: A fringe field switching type thin film transistor substrate includes a double layered structure gate line; a data line crossing the gate line, wherein a gate insulating film is formed therebetween; a thin film transistor having a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode opposing the source electrode; a double layered structure common line parallel to the gate line; a common electrode plate integrated with the transparent conductive layer of the common line and formed in a pixel area defined by the crossing of the gate line and the data line; a pixel electrode slit covering the drain electrode of the thin film transistor and overlapping the common electrode plate, wherein the gate insulating film is formed therebetween in the pixel area; and a data protection pattern covering the data line and the source electrode.

Abstract: An apparatus and method for rubbing an alignment layer of an LCD device is disclosed. The alignment layer is rubbed over an entire surface of a substrate at uniform pressure and dust or particle is not adsorbed into the alignment layer during rubbing process. The apparatus for rubbing an alignment layer of an LCD device includes a rubbing means to rub the alignment layer while the rubbing means is rotated along one direction to contact a surface of the alignment layer formed on a substrate, and a liquid jet to jet liquid when the alignment layer is rubbed by the rubbing means.

Abstract: A liquid crystal display (LCD) panel is fabricated with a reduced number of mask processes and includes a thin film transistor (TFT) array substrate and a color filter array substrate. The TFT array substrate includes gate and data lines insulatively crossing each other to define a pixel area, a TFT provided at the crossing of the gate and data lines, a passivation film protecting the TFT, a pixel electrode partially overlapped by the TFT, a gate pad connected to the gate line, and a data pad connected to the data line. The gate line, the gate and data pads, and the pixel electrode include a transparent conductive material. A gate metal material is on the transparent conductive material where the TFT partially overlaps the pixel electrode. The passivation film over the gate and data pads is removed to expose the transparent conductive material included within the gate and data pads.

Abstract: A method of manufacturing an IPS switching mode liquid crystal display device includes forming a first insulation layer on a substrate, forming an electrode layer on the substrate containing the first insulation layer, forming a second insulation layer on the electrode layer, etching the second insulation layer such that the second insulation layer remains on sides of the first insulation layer, and etching the electrode layer using the remaining second insulation layer as a mask to form a plurality of electrodes. The plurality of electrodes are formed to have widths of about 0.1 ?m to 2 ?m, thus aperture ratio and transmittance are increased.

Abstract: A thin film transistor (TFT) substrate is fabricated in three mask processes. In a first mask process, a gate line and a gate electrode are formed. In a second mask process, a data line, a source electrode, a drain electrode, a semiconductor layer, and a first upper storage electrode overlapping the gate line are formed from a gate insulating film, undoped and doped amorphous silicon layers, and a data metal layer. In a third mask process, a pixel hole is formed through protective and gate insulating films within and outside a pixel area, the first upper storage electrode is partially removed, a pixel electrode contacts a side of the drain electrode within the pixel hole at the pixel area, and a second upper storage electrode contacts a side of the first upper storage electrode in the pixel hole outside the pixel area.

Abstract: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad ter

Abstract: Provided are an alignment key, a method for fabricating the alignment key, and a method for fabricating a thin film transistor substrate using the alignment key. The method for fabricating the alignment key includes forming a first metal layer on a base substrate, forming a first alignment key and a first mark portion of a second alignment key by selectively patterning the first metal layer, forming a dielectric on the first metal layer, forming a second metal layer on the dielectric, and forming a second mark portion of the second alignment key on the dielectric by selectively patterning the second metal layer.

Abstract: A liquid crystal display (LCD) panel is fabricated in a simplified process. The LCD panel includes a thin film transistor (TFT) array substrate with a gate and data lines crossing each other to define a pixel area, a TFT at the crossings of the gate and data lines, a protective film, and a pixel electrode connected to the TFT and formed within a pixel opening that is arranged at the pixel area and formed through the protective film and a gate insulating film. A color filter array substrate is joined to the TFT array substrate. A pattern spacer is between the TFT and color filter array substrate and overlaps at least one of the gate line, the data line, and the thin film transistor. A rib is formed from the same layer as the pattern spacer and overlaps the pixel electrode. Liquid crystal material is provided within the LCD panel.

Abstract: A thin film transistor substrate structure for using a horizontal electric field includes a substrate; a gate line and a first common line formed on the substrate parallel to each other from a first conductive layer; a gate insulating film formed on the substrate, the gate line, and the first common line; a data line formed from a second conductive layer on the gate insulating film crossing the gate line and the common line with the gate insulating film therebetween to define a pixel area; a thin film transistor connected to the gate line and the data line; a protective film covering the data line and the thin film transistor; a common electrode formed from a third conductive layer connected to the common line through a hole passing through the protective film and the gate insulating film; and a pixel electrode formed from the second conductive layer connected to the thin film transistor to define a horizontal electric field between the pixel electrode and the common electrode.

Abstract: A thin film transistor substrate structure of the present invention comprises a gate and a common lines formed from a first conductive layer; a data line formed from a second conductive layer and intersecting the gate and common lines, the data line insulated from the gate and common lines by a gate insulating film, a pixel area being defined by the intersection of the data and gate lines; a thin film transistor at the intersection; an extended portion of a common electrode in the pixel area; a pixel electrode formed from a third conductive layer connected to the thin film transistor and having an extended portion in the pixel area, a horizontal electric field formed by the pixel and common electrodes; and a plurality of pixel holes are defined, wherein the pixel electrode is disposed within at least one pixel hole and connected to a drain electrode.