Abstract: A liquid crystal display (LCD) device and method for manufacturing the same in which a plurality of patterns are formed on one substrate reduces the manufacturing cost and simplifies the process steps by minimizing the number of masks required to form the patterns. The LCD device includes first and second substrates, a thin film transistor (TFT) formed in a predetermined region on the first substrate, a pixel electrode formed in a pixel region on the first substrate, a color filter layer formed on the pixel electrode, a black matrix pattern formed in a region other than the pixel electrode, and a liquid crystal layer formed between the first and second substrates. The method for manufacturing the LCD device having a pixel region defined by gate and data lines, includes the steps of forming a TFT on a first substrate, forming a black matrix pattern in a region other than the pixel region, forming a pixel electrode in the pixel region, and forming a color filter layer on the pixel electrode.

Abstract: An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent con

Abstract: A TFT array substrate has a PAI pattern, and the PAI pattern has an over-etched portion of the pure amorphous silicon layer. This over-etched portion prevents a short between the pixel electrode and the pure amorphous silicon layer (i.e., the active layer).

Abstract: A method of fabricating a liquid crystal display device includes the steps of forming a gate electrode on a transparent substrate; forming a gate insulating film, an active layer and an ohmic contact layer on the transparent substrate to cover the gate electrode; forming a source electrode and a drain electrode on the ohmic contact layer and patterning the drain electrode to form an L-shaped portion and a plurality of protrusions; forming a protective layer on the source and drain electrodes such that side surfaces of the protective layer, the drain electrode, the ohmic contact layer and the active layer are exposed; and forming a pixel electrode on the protective layer to electrically contact the side surface of the drain electrode.

Abstract: An electrostatic damage preventing apparatus for a thin film transistor array of a liquid crystal display includes a horizontal ground voltage line disposed at a first perimeter portion of the thin film transistor array, a vertical ground voltage line disposed at a second perimeter portion of the thin film transistor array, and a first electrostatic damage-preventing switching device group including parallel connection of at least two electrostatic damage-preventing switching devices to divide and divert an electrostatic voltage applied over the horizontal ground voltage line.

Abstract: A method for fabricating a liquid crystal display panel is provided. A thin film transistor array is formed on a lower substrate, and a color filter array is formed on an upper substrate. The thin film transistor array has gate lines, data lines, data pads, thin film transistors and pixel electrodes. After the upper substrate and lower substrates are bonded together and cut into cells, the gate pads and the data pads at ends of the gate lines and the data lines on the lower substrate of the bonded substrates are exposed.

Abstract: The present invention discloses a four-mask method of manufacturing an array substrate of a liquid crystal display device and the liquid crystal display device having the same array substrate.

Abstract: A liquid crystal display device, and a method of fabricating that device, including a substrate with a thin film transistor having gate, source, and drain electrodes. A pixel electrode electrically connects to the drain electrode, and a data line electrically connects to the source electrode. A first insulating layer, a pure amorphous silicon layer, and a doped amorphous silicon layer are sequentially layered under the data line. A data pad is formed at one end of the data line. A gate line electrically connects to the gate electrode. A gate pad electrode at one end of the gate line is formed through the first insulating layer and connects to the gate line.

Abstract: The present invention discloses an array substrate for an active-matrix LCD device and a method of fabricating the same. The array substrate reduces the number of masks used in the fabrication process so that reliability is enhanced and the cost is reduced over the conventional device and method.

Abstract: A liquid crystal display (LCD) device and method for manufacturing the same in which a plurality of patterns are formed on one substrate reduces the manufacturing cost and simplifies the process steps by minimizing the number of masks required to form the patterns. The LCD device includes first and second substrates, a thin film transistor (TFT) formed in a predetermined region on the first substrate, a pixel electrode formed in a pixel region on the first substrate, a color filter layer formed on the pixel electrode, a black matrix pattern formed in a region other than the pixel electrode, and a liquid crystal layer formed between the first and second substrates. The method for manufacturing the LCD device having a pixel region defined by gate and data lines, includes the steps of forming a TFT on a first substrate, forming a black matrix pattern in a region other than the pixel region, forming a pixel electrode in the pixel region, and forming a color filter layer on the pixel electrode.

Abstract: A liquid crystal display device and a method of fabricating the same are disclosed. The device, as disclosed, reduces the number of masks required to fabricate. Thus, cost is reduced and yield is increased. The device includes a plurality of gate lines, a plurality of data lines crossing the gate lines such that active regions are defined near the crossover points, thin film transistors are formed near the active regions, and a plurality of pixel electrodes are formed within regions defined by the adjacent gate and data lines. Also, pixel electrodes overlap gate lines and the two electrodes function as a storage capacitor.

Abstract: An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent con

Abstract: A liquid crystal display, and a method of manufacturing thereof, includes providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gae line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line and covering the source and dra

Abstract: A TFT array substrate has a PAI pattern, and the PAI pattern has an over-etched portion of the pure amorphous silicon layer. This over-etched portion prevents a short between the pixel electrode and the pure amorphous silicon layer (i.e., the active layer). The over-etched portion also enables the aperture ratio to increase.

Abstract: A liquid crystal display device includes a transparent substrate, a gate electrode disposed on the transparent substrate, a gate insulating film disposed on the transparent substrate and covering the gate electrode, an active layer disposed on the gate insulating film, an ohmic contact layer disposed on the active layer, a source electrode disposed on the ohmic contact layer and at one side of the gate electrode, a drain electrode disposed on the ohmic contact layer and at another side of the gate electrode, the drain electrode including an L-shaped portion and a plurality of protrusions, a protective layer disposed on the active layer covering upper surfaces of the source electrode and the drain electrode, and a pixel electrode disposed on the protective layer and electrically contacting a side surface of the drain electrode.

Abstract: The present invention discloses an array substrate for an active-matrix LCD device and a method of fabricating the same. The array substrate reduces the number of masks used in the fabrication process so that reliability is enhanced and the cost is reduced over the conventional device and method.

Abstract: A method of manufacturing an LCD array substrate and LCD made by that method are disclosed. A plurality of gate lines, gate electrodes and gate extension lines are formed by depositing and patterning a first metallic material using a first mask. A first insulating layer is then formed. A plurality of data lines, source electrodes, drain electrodes, and capacitor electrodes are then formed by depositing and patterning suitable materials using a second mask. A passivation layer is then formed and patterned to create first and second contact holes using a third mask. The first contact holes expose the drain electrodes, the second contact holes expose the capacitor electrodes. A plurality of pixel electrodes are then formed by depositing and patterning a transparent conductive layer using a fourth mask. The pixel electrodes contact the drain electrodes through the first contact holes and contact the capacitor electrodes through the second contact holes.

Abstract: A liquid crystal display device and a method of fabricating the same are disclosed. The device, as disclosed, reduces the number of masks required for fabrication. Thus, cost is reduced and yield is increased. The device includes a plurality of gate lines, a plurality of data lines crossing the gate lines such that active regions are defined near the crossover points, thin film transistors are formed near the active regions, and a plurality of pixel electrodes are formed within regions defined by the adjacent gate and data lines. Also, pixel electrodes overlap gate lines and the two electrodes function as a storage capacitor.

Abstract: The present invention discloses a method of manufacturing a liquid crystal display device, including: providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gate line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line an

Abstract: A liquid crystal display device, and a method of fabricating that device, including a substrate with a thin film transistor having gate, source, and drain electrodes. A pixel electrode electrically connects to the drain electrode, and a data line electrically connects to the source electrode. A first insulating layer, a pure amorphous silicon layer, and a doped amorphous silicon layer are sequentially layered under the data line. A data pad is formed at one end of the data line. A gate line electrically connects to the gate electrode. A gate pad electrode at one end of the gate line is formed through the first insulating layer and connects to the gate line.