Patents by Inventor Stefan Koehler
Stefan Koehler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12043391Abstract: A securing device for a component that can be secured on rails of a floor structure of an aircraft interior includes at least two adapter plates. The adapter plates are decoupled from one another and configured to be secured on the rails. The adapter plates being configured to secure the component having mutually spaced securing attachments.Type: GrantFiled: November 10, 2016Date of Patent: July 23, 2024Assignee: LUFTHANSA TECHNIK AGInventors: Joern Loose, Mario Gamm, Wolfram Kuhlgatz, Stefan Koehler, Pawel Piotrowski, Magdalena Schmitz
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Patent number: 11512026Abstract: A binder composition that includes cement, optionally calcium sulfate, at least one zinc salt and at least one alkylamine, and to a dry-mortar mixture that includes said binder composition. The present invention further relates to the use of a composition composed of a zinc salt and an alkylamine for achieving high early strengths in a binder composition.Type: GrantFiled: November 13, 2018Date of Patent: November 29, 2022Assignee: Construction Research & Technology GmbHInventors: Yvonne Schaepers, Juergen Bader, Werner Stohr, Stefan Koehler
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Publication number: 20200277236Abstract: A binder composition that includes cement, optionally calcium sulfate, at least one zinc salt and at least one alkylamine, and to a dry-mortar mixture that includes said binder composition. The present invention further relates to the use of a composition composed of a zinc salt and an alkylamine for achieving high early strengths in a binder composition.Type: ApplicationFiled: November 13, 2018Publication date: September 3, 2020Inventors: Yvonne SCHAEPERS, Juergen BADER, Werner STOHR, Stefan KOEHLER
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Patent number: 10654386Abstract: A tethering assembly includes an elastomeric strap, a fleece material and a rigid structural component with a hooked end. The tethering assembly holds a trim fabric in place in relation to a vehicle component. Advantageously, the assembly minimizes free play and rattling and helps sliding and detachment in case of partial contact between the tethering assembly and the vehicle component.Type: GrantFiled: May 15, 2018Date of Patent: May 19, 2020Assignee: LEAR CORPORATIONInventors: Stefan Koehler, Axel Haby
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Patent number: 10427570Abstract: A seat assembly having a seat back that has a seat back frame and a shell. The seat back frame may extend through a shell opening such that an upper shell cross member is disposed on a back side of the seat back frame and a lower shell cross member may be disposed on a front side of the seat back frame.Type: GrantFiled: February 15, 2018Date of Patent: October 1, 2019Assignee: Lear CorporationInventors: Axel Haby, Stefan Koehler
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Publication number: 20190031067Abstract: A tethering assembly includes an elastomeric strap, a fleece material and a rigid structural component with a hooked end. The tethering assembly holds a trim fabric in place in relation to a vehicle component. Advantageously, the assembly minimizes free play and rattling and helps sliding and detachment in case of partial contact between the tethering assembly and the vehicle component.Type: ApplicationFiled: May 15, 2018Publication date: January 31, 2019Applicant: Lear CorporationInventors: Stefan KOEHLER, Axel HABY
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Publication number: 20180327097Abstract: A securing device for a component that can be secured on rails of a floor structure of an aircraft interior includes at least two adapter plates. The adapter plates are decoupled from one another and configured to be secured on the rails. The adapter plates being configured to secure the component having mutually spaced securing attachments.Type: ApplicationFiled: November 10, 2016Publication date: November 15, 2018Inventors: Joern Loose, Mario Gamm, Wolfram Kuhlgatz, Stefan Koehler, Pawel Piotrowski, Magdalena Schmitz
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Publication number: 20180319301Abstract: A seat assembly having a seat back that has a seat back frame and a shell. The seat back frame may extend through a shell opening such that an upper shell cross member is disposed on a back side of the seat back frame and a lower shell cross member may be disposed on a front side of the seat back frame.Type: ApplicationFiled: February 15, 2018Publication date: November 8, 2018Applicant: Lear CorporationInventors: Axel HABY, Stefan KOEHLER
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Patent number: 9046794Abstract: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).Type: GrantFiled: September 16, 2010Date of Patent: June 2, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Hembacher, Dieter Kraus, Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt, Stefan Koehler, Almut Czap, Stefan Wiesner, Hin Yiu Anthony Chung
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Patent number: 8885141Abstract: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) includes a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.Type: GrantFiled: April 15, 2011Date of Patent: November 11, 2014Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Singer, Yim-Bun-Patrick Kwan, Stefan-Wolfgang Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung
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Patent number: 8815039Abstract: A next processing pin is applied as a follow-on pin to a stone, wherein the stone is held by a preceding pin and fixed to the stone by way of a first adhesive bonding location. The preceding pin is separated from the stone. The follow-on pin is fixed to the stone by way of a second adhesive bonding location spaced from the first adhesive bonding location. The follow-on pin frontally receives a fluid adhesive at a spacing from the stone and the spacing between the adhesive-coated front end and the stone is reduced until the adhesive front end contacts the stone. The adhesive is hardened at the contact location as the second adhesive bonding location and heat is transferred by way of the preceding pin to the first adhesive bonding location A force component is exerted on the preceding pin to release the pin from the stone and to hold the stone with the next pin.Type: GrantFiled: December 23, 2008Date of Patent: August 26, 2014Assignee: Paul Wild OHGInventors: Markus Paul Wild, Stefan Koehler
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Patent number: 8503958Abstract: A signal processor for processing a receiving signal having a first usable frequency band and a second usable frequency band includes a first mixer for mixing the receiving signal with a first local oscillator signal, wherein a frequency of the first local oscillator signal is asymmetrical between the first usable frequency band and the second usable frequency band. The first mixer is implemented to obtain an in-phase signal and a quadrature signal, having a first signal portion representing a mixed image of the first usable frequency band, and having a second signal portion representing a mixed image of the second usable frequency band. The signal processor comprises a second mixer) for mixing the in-phase signal and the quadrature signal by using the second local oscillator signal.Type: GrantFiled: June 20, 2007Date of Patent: August 6, 2013Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.Inventors: Alfonso Carrera, Stefan Koehler, Guenter Rohmer
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Patent number: 8467753Abstract: A receiver for receiving a first usable frequency band and a second usable frequency band includes a band-pass filter device for filtering one or several receiving signals, a mixer device for converting the combination signal or the first band-pass filter signal and the second band-pass filter signal with a local oscillator signal, for obtaining a first intermediate frequency signal and a second intermediate frequency signal, and an intermediate frequency filter device for filtering the first intermediate frequency signal and the second intermediate frequency signal. Further, the receiver includes an analog/digital converter device for analog/digital converting the first filtered intermediate frequency signal and the second filtered intermediate frequency signal by using a single sampling frequency for obtaining a first digitized intermediate frequency signal and a second digitized intermediate frequency signal.Type: GrantFiled: June 25, 2007Date of Patent: June 18, 2013Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung e.V.Inventors: Alfonso Carrera, Stefan Koehler, Guenter Rohmer
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Publication number: 20120086925Abstract: A method for preventing contaminating gaseous substances (18) from passing through an opening (17b) in a housing (4a) of an EUV lithography apparatus (1), wherein at least one optical element for guiding EUV radiation (6) is arranged in the housing (4a). The method involves: generating at least one gas flow (21a, 21b) which deflects the contaminating substances (18, 18?), and in particular is directed counter to the flow direction (Z) thereof, in the region of the opening (17b). The gas flow (21a, 21b) and the EUV radiation (6) are generated in pulsed fashion and the pulse rate of the gas flow (21a, 21b) is defined in a manner dependent on the pulse rate of the contaminating substances (18, 18?) released under the action of the pulsed EUV radiation (6), wherein both pulse rates are preferably equal in magnitude, and wherein, in the region of the opening (17b), the gas pulses temporally overlap the pulses of the contaminating substances (18, 18?).Type: ApplicationFiled: October 6, 2011Publication date: April 12, 2012Applicant: CARL ZEISS SMT GMBHInventors: Dieter KRAUS, Dirk Heinrich EHM, Stefan-Wolfgang SCHMIDT, Stefan WIESNER, Almut CZAP, Stefan KOEHLER, Hin Yiu Anthony CHUNG
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Publication number: 20110279799Abstract: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) comprises a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.Type: ApplicationFiled: April 15, 2011Publication date: November 17, 2011Applicant: CARL ZEISS SMT GmbHInventors: Wolfgang Singer, Yim-Bun-Patrick Kwan, Stefan-Wolfgang Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung
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Publication number: 20110058147Abstract: A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on its inner surface which has a low recombination rate for atomic hydrogen. The supply (206) is of flared shape at its end, which faces the heating filament (210). A gentler cleaning of optical elements is achieved with such a cleaning module, or also by exciting a cleaning gas with a cold cathode or a plasma, or by filtering out charged particles via of electrical and/or magnetic fields.Type: ApplicationFiled: September 29, 2010Publication date: March 10, 2011Applicant: Carl Zeiss SMT AGInventors: Dirk Heinrich Ehm, Julian Kaller, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Almut Czap, Hin-Yiu Anthony Chung, Stefan Koehler
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Publication number: 20110048626Abstract: A next processing pin is applied as a follow-on pin to a stone, wherein the stone is held by a preceding pin and fixed to the stone by way of a first adhesive bonding location. The preceding pin is separated from the stone. The follow-on pin is fixed to the stone by way of a second adhesive bonding location spaced from the first adhesive bonding location. The follow-on pin frontally receives a fluid adhesive at a spacing from the stone and the spacing between the adhesive-coated front end and the stone is reduced until the adhesive front end contacts the stone. The adhesive is hardened at the contact location as the second adhesive bonding location and heat is transferred by way of the preceding pin to the first adhesive bonding location A force component is exerted on the preceding pin to release the pin from the stone and to hold the stone with the next pin.Type: ApplicationFiled: December 23, 2008Publication date: March 3, 2011Inventors: Markus Paul Wild, Stefan Koehler
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Publication number: 20110043774Abstract: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).Type: ApplicationFiled: September 16, 2010Publication date: February 24, 2011Applicant: Carl Zeiss SMT AGInventors: Stefan HEMBACHER, Dieter Kraus, Dirk Heinrich EHM, Stefan-Wolfgang Schmidt, Stefan Koehler, Almut Czap, Stefan Wiesner, Hin Yiu Anthony Chung
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Publication number: 20100297975Abstract: A signal processor for processing a receiving signal having a first usable frequency band and a second usable frequency band includes a first mixer for mixing the receiving signal with a first local oscillator signal, wherein a frequency of the first local oscillator signal is asymmetrical between the first usable frequency band and the second usable frequency band. The first mixer is implemented to obtain an in-phase signal and a quadrature signal, having a first signal portion representing a mixed image of the first usable frequency band, and having a second signal portion representing a mixed image of the second usable frequency band. The signal processor comprises a second mixer) for mixing the in-phase signal and the quadrature signal by using the second local oscillator signal.Type: ApplicationFiled: June 20, 2007Publication date: November 25, 2010Applicant: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.Inventors: Alfonso Carrera, Stefan Koehler, Guenter Rohmer
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Publication number: 20100071720Abstract: Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10?4 Torr or of more than 10?3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 ?/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.Type: ApplicationFiled: September 19, 2008Publication date: March 25, 2010Applicant: Carl Zeiss SMT AGInventors: Dirk Heinrich Ehm, Stefan Schmidt, Dieter Kraus, Stefan Wiesner, Stefan Koehler, Almut Czap, Hin Yiu Anthony Chung