Abstract: A throttle body assembly includes a housing defining a throttle bore with a throttle plate in the bore and mounted on a shaft. An electric motor has a pinion gear. A gear assembly includes an intermediate gear and a sector gear and transfers rotational drive from the electric motor to the throttle plate. Biasing structure biases the sector gear and thus the shaft to cause the throttle plate to close the throttle bore defining a closed position thereof. When the motor is energized, rotation of the pinion gear causes rotation of the gear assembly, against the bias on the sector gear, thereby causing rotation of the shaft to move the throttle plate from the closed position to an open position. A positon sensor assembly determines a position of the plate.

Abstract: A throttle body assembly includes a housing defining a throttle bore with a throttle plate in the bore and mounted on a shaft. An electric motor has a pinion gear. A gear assembly transfers rotational drive from the electric motor to the throttle plate. Biasing structure biases the gear assembly and thus the shaft to cause the throttle plate to close the throttle bore defining a closed position thereof. When the motor is energized, rotation of the gear assembly, against the bias biasing structure, thereby causing rotation of the shaft to move the throttle plate from the closed position to an open position. A position sensor assembly determines a position of the plate.

Abstract: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).

Abstract: A lighting device for vehicles having an optical fiber including a flat segment with two opposing flat sides, a light decoupling area, and a light coupling area. The light decoupling area in which light relayed by the flat sides is output in the primary direction of emission. The light coupling area couples the light into the optical fiber, and is arranged on a free end of a light coupling element which is perpendicular to the flat segment and projects from the same. A deflection structure is arranged between the light coupling element and the flat segment for the purpose of deflecting the light toward the flat segment. A rigid circuit board runs parallel to the flat segment. The circuit board is configured with a number of light sources which are each functionally assigned to the light coupling elements.

Abstract: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) includes a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.

Abstract: A next processing pin is applied as a follow-on pin to a stone, wherein the stone is held by a preceding pin and fixed to the stone by way of a first adhesive bonding location. The preceding pin is separated from the stone. The follow-on pin is fixed to the stone by way of a second adhesive bonding location spaced from the first adhesive bonding location. The follow-on pin frontally receives a fluid adhesive at a spacing from the stone and the spacing between the adhesive-coated front end and the stone is reduced until the adhesive front end contacts the stone. The adhesive is hardened at the contact location as the second adhesive bonding location and heat is transferred by way of the preceding pin to the first adhesive bonding location A force component is exerted on the preceding pin to release the pin from the stone and to hold the stone with the next pin.

Abstract: The invention relates to an inorganic binder system comprising a) calcium silicate cement, b) calcium aluminate cement, c) at least one trifunctional polyalkylene glycol and d) optionally calcium sulphate. Additionally disclosed is the use of at least one polyalkylene glycol as an accelerator for an inorganic binder system comprising a) calcium silicate cement, b) calcium aluminate cement and d) optionally calcium sulphate.

Abstract: A signal processor for processing a receiving signal having a first usable frequency band and a second usable frequency band includes a first mixer for mixing the receiving signal with a first local oscillator signal, wherein a frequency of the first local oscillator signal is asymmetrical between the first usable frequency band and the second usable frequency band. The first mixer is implemented to obtain an in-phase signal and a quadrature signal, having a first signal portion representing a mixed image of the first usable frequency band, and having a second signal portion representing a mixed image of the second usable frequency band. The signal processor comprises a second mixer) for mixing the in-phase signal and the quadrature signal by using the second local oscillator signal.

Abstract: A receiver for receiving a first usable frequency band and a second usable frequency band includes a band-pass filter device for filtering one or several receiving signals, a mixer device for converting the combination signal or the first band-pass filter signal and the second band-pass filter signal with a local oscillator signal, for obtaining a first intermediate frequency signal and a second intermediate frequency signal, and an intermediate frequency filter device for filtering the first intermediate frequency signal and the second intermediate frequency signal. Further, the receiver includes an analog/digital converter device for analog/digital converting the first filtered intermediate frequency signal and the second filtered intermediate frequency signal by using a single sampling frequency for obtaining a first digitized intermediate frequency signal and a second digitized intermediate frequency signal.

Abstract: The invention relates to an inorganic binder system comprising a) calcium silicate cement, b) calcium aluminate cement, c) at least one trifunctional polyalkylene glycol and d) optionally calcium sulphate. Additionally disclosed is the use of at least one polyalkylene glycol as an accelerator for an inorganic binder system comprising a) calcium silicate cement, b) calcium aluminate cement and d) optionally calcium sulphate.

Abstract: An electronic device (10) has a screen (12) protecting against radiofrequency electromagnetic fields, wherein the screen is formed by an at least partially conductive cap (12). In order to avoid the formation of a defined conductive connection between the cap (12) and a reference potential, conductive two-dimensional regions (30) of the cap (12) are arranged in electrically insulated fashion at a short distance parallel to at least one two-dimensional region (42) of a conductor (22) of a reference potential. The two-dimensional regions act as a capacitor and a capacitive coupling (12) to the reference potential is produced which eliminates or attenuates radiofrequency electromagnetic interference fields, which enter the electronic device or are emitted from it.

Abstract: A method for preventing contaminating gaseous substances (18) from passing through an opening (17b) in a housing (4a) of an EUV lithography apparatus (1), wherein at least one optical element for guiding EUV radiation (6) is arranged in the housing (4a). The method involves: generating at least one gas flow (21a, 21b) which deflects the contaminating substances (18, 18?), and in particular is directed counter to the flow direction (Z) thereof, in the region of the opening (17b). The gas flow (21a, 21b) and the EUV radiation (6) are generated in pulsed fashion and the pulse rate of the gas flow (21a, 21b) is defined in a manner dependent on the pulse rate of the contaminating substances (18, 18?) released under the action of the pulsed EUV radiation (6), wherein both pulse rates are preferably equal in magnitude, and wherein, in the region of the opening (17b), the gas pulses temporally overlap the pulses of the contaminating substances (18, 18?).

Abstract: An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device (15) for processing an optical element (6a), in particular the mask, preferably in a locally resolved manner, at a processing position in the EUV lithography device. For activating at least one gas component of the gas stream (27), the processing device (15) comprises a particle generator (30) for generating a particle beam, in particular an electron beam (30a), and/or a high-frequency generator.

Abstract: A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on its inner surface which has a low recombination rate for atomic hydrogen. The supply (206) is of flared shape at its end, which faces the heating filament (210). A gentler cleaning of optical elements is achieved with such a cleaning module, or also by exciting a cleaning gas with a cold cathode or a plasma, or by filtering out charged particles via of electrical and/or magnetic fields.

Abstract: A next processing pin is applied as a follow-on pin to a stone, wherein the stone is held by a preceding pin and fixed to the stone by way of a first adhesive bonding location. The preceding pin is separated from the stone. The follow-on pin is fixed to the stone by way of a second adhesive bonding location spaced from the first adhesive bonding location. The follow-on pin frontally receives a fluid adhesive at a spacing from the stone and the spacing between the adhesive-coated front end and the stone is reduced until the adhesive front end contacts the stone. The adhesive is hardened at the contact location as the second adhesive bonding location and heat is transferred by way of the preceding pin to the first adhesive bonding location A force component is exerted on the preceding pin to release the pin from the stone and to hold the stone with the next pin.

Abstract: In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).

Abstract: A method and a system for optimizing the routing of data to be communicated in a network. In one embodiment, the system achieves an improved control for routing of data traffic in a network by minimizing link costs between nodes of the network.

Abstract: A signal processor for processing a receiving signal having a first usable frequency band and a second usable frequency band includes a first mixer for mixing the receiving signal with a first local oscillator signal, wherein a frequency of the first local oscillator signal is asymmetrical between the first usable frequency band and the second usable frequency band. The first mixer is implemented to obtain an in-phase signal and a quadrature signal, having a first signal portion representing a mixed image of the first usable frequency band, and having a second signal portion representing a mixed image of the second usable frequency band. The signal processor comprises a second mixer) for mixing the in-phase signal and the quadrature signal by using the second local oscillator signal.

Abstract: An electronic device (10) has a screen (12) protecting against radiofrequency electromagnetic fields, wherein the screen is formed by an at least partially conductive cap (12). In order to avoid the formation of a defined conductive connection between the cap (12) and a reference potential, conductive two-dimensional regions (30) of the cap (12) are arranged in electrically insulated fashion at a short distance parallel to at least one two-dimensional region (42) of a conductor (22) of a reference potential. The two-dimensional regions act as a capacitor and a capacitive coupling (12) to the reference potential is produced which eliminates or attenuates radiofrequency electromagnetic interference fields, which enter the electronic device or are emitted from it.

Abstract: Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10?4 Torr or of more than 10?3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 ?/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.