Abstract: A holder for a device having a handle includes a body having an open first end, a second end opposite the first end, and at least one sidewall extending from the first end to the second end and defining a handle-receiving cavity configured to receive the handle of the device; and a first opening formed in the at least one sidewall of the body and configured to receive a portion of the handle to retain the handle in the holder and resist removal of the handle from the holder.

Abstract: The invention relates to an underwater drilling device and to a method for procuring drill cores of a bed of a body of water, wherein an underwater drilling device with a base frame is lowered in a body of water and placed on a bed of a body of water. A drill string consisting of at least one tubular drill string element is drilled out into the bed of the body of water in a first drilling step with a drill drive, with a drill core being formed in a receptacle in the tubular drill string element and being received in a core barrel in the drill string element. According to the invention, the drill core is enclosed in pressure-tight manner in a receiving container on the basic cradle under water.

Abstract: The optical device comprises a group of Fabry-Perot resonators, formed by a stack of a first and second partial reflection layer and an intermediate layer between the first and second partial reflection layer. The intermediate layer comprises a dielectric material and a group of arrays of posts embedded in the dielectric material at different positions along the intermediate layer. Each array in the group contains posts of a different non-circular shape and/or orientation in cross-section with a plane parallel to the reflection layers. As a result, Fabry-Perot resonators are formed in areas that contain different arrays, each having first and second resonance peaks at mutually different resonance frequencies for different polarization components. Light intensity sensors may be provided located below the different areas. From the intensities measured by the sensors, the intensities of different polarization components of the light can be computed over a range of wavelengths.

Abstract: A fast steering optical mirror for laser beam deflection, moved by at least one rotational axis, including: a plate containing a plurality of carbon fiber layers laid up in a resin, wherein the plate includes a front face, at least a portion of the front face being polished and coated for laser light reflection; and wherein a surface normal of the front face is aligned orthogonal to the at least one rotational axis. A method of manufacturing fast steering optical mirror including: forming a plate having a front face and a back face by laying up a plurality of carbon fiber layers in a resin; aligning the plate so that a surface normal of the plate is orthogonal to at least one rotational axis of the mirror; and polishing and coating at least a portion of the front face for light reflection.

Abstract: A positioning system, including: a first plate; a second plate coupled to the first plate and pivotable about an axis; a pair of voice coil actuators configured to rotate the second plate about this axis; and a processor configured to drive currents to the pair of voice coil actuators; wherein the pair of voice coil actuators comprises a first and second magnet structures mounted on the first plate at equal and opposite distance from the axis, and a first and second coils mounted on the second plate and positioned such that the respective first and second magnet structures move in and out of the first and second coils when the second plate rotates about the axis; wherein each of the first and second magnet structures substantially conforms to an arc having a center at the axis and a radius equal to the distance of the magnet structure from the axis.

Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.

Abstract: A powertrain system includes a clutch pedal module, a gear selector module, a powertrain control module, a motor, and a transmission. The clutch pedal is selectively disposed in one of a first clutch position and a second clutch position. The gear shift lever is selectively disposed in one of a plurality of forward gear positions and a reverse gear position. The powertrain control module operates a control logic sequence to convert the input signals to a plurality of transmission output signals. The transmission is an automatic transmission operating in a manual mode having gear selection controlled by the driver.

Abstract: A powertrain system includes a clutch pedal module, a gear selector module, a powertrain control module, a motor, and a transmission. The clutch pedal is selectively disposed in one of a first clutch position and a second clutch position. The gear shift lever is selectively disposed in one of a plurality of forward gear positions and a reverse gear position. The powertrain control module operates a control logic sequence to convert the input signals to a plurality of transmission output signals. The transmission is an automatic transmission operating in a manual mode having gear selection controlled by the driver.

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

Abstract: This document describes a method of determining an overlay error during manufacturing of a multilayer semiconductor device. Manufacturing of the semiconductor device comprises forming a stack of material layers comprising depositing of at least two subsequent patterned layers of semiconductor material, the patterned layers comprising a first patterned layer having a first marker element and a second patterned layer having a second marker element. The determining of the overlay error comprises determining relative positions of the first and second marker element in relation to each other, such as to determine the overlay error between the first patterned layer and the second patterned layer. In addition an imaging step is performed on at least one of said first and second patterned layer, for determining relative positions of the respective first or second marker element and a pattern feature of a device pattern comprised by said respective first and second patterned layer.

Abstract: A mounting arrangement for coupling to a device having a pair of sockets includes a mount having a base, a ball, and a neck coupling the ball to the base; two device engagement units, each of the device engagement units having a receiving platform and a leg extending from the receiving platform, each of the legs of the two device engagement units having a male socket engagement element to engage one of the sockets of the device; and two fasteners to fasten the mount to the two device engagement units. The mounting arrangement is configured for the base to be received by, and fastened to, both of the receiving platforms of the two device engagement units and for the base to form a wedge pushing the male socket engagement elements into engagement with the sockets of the device to non-rotatably secure the mounting arrangement to the device.

Abstract: The invention relates to a ground processing tool and a method for creating a borehole in the ground, wherein ground material is removed by the ground processing tool and blended with a fluid in the created borehole to form a suspension, which is suctioned away via at least one opening in the at least one mixing blade and via the conducting channel in the central shaft.

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

Abstract: A mounting arrangement for coupling to a device having a pair of sockets includes a mount having a base, a ball, and a neck coupling the ball to the base; two device engagement units, each of the device engagement units having a receiving platform and a leg extending from the receiving platform, each of the legs of the two device engagement units having a male socket engagement element to engage one of the sockets of the device; and two fasteners to fasten the mount to the two device engagement units. The mounting arrangement is configured for the base to be received by, and fastened to, both of the receiving platforms of the two device engagement units and for the base to form a wedge pushing the male socket engagement elements into engagement with the sockets of the device to non-rotatably secure the mounting arrangement to the device.

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.