Patents by Inventor Stefan Ochs

Stefan Ochs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040112088
    Abstract: An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.
    Type: Application
    Filed: December 9, 2003
    Publication date: June 17, 2004
    Inventors: Tetsuji Ueda, Akira Fujinoki, Hiroyuki Nishimura, Martin Trommer, Stefan Ochs
  • Publication number: 20030115904
    Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction.
    Type: Application
    Filed: December 5, 2002
    Publication date: June 26, 2003
    Inventors: Bodo Kuhn, Bruno Uebbing, Martin Trommer, Stefan Ochs, Gero Fischer, Ulla Holst
  • Publication number: 20030115905
    Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction.
    Type: Application
    Filed: December 5, 2002
    Publication date: June 26, 2003
    Inventors: Bodo Kuhn, Bruno Uebbing, Martin Trommer, Stefan Ochs, Stephan Thomas, Steffen Kaiser, Jan Vydra
  • Publication number: 20020122902
    Abstract: An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.
    Type: Application
    Filed: November 28, 2001
    Publication date: September 5, 2002
    Inventors: Tetsuji Ueda, Akira Fujinoki, Hiroyuki Nishimura, Martin Trommer, Stefan Ochs