Patents by Inventor Stefan Schubert
Stefan Schubert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190039686Abstract: Disclosed is a gearbox having a central shaft (1), which is rotatably mounted relative to a stationary frame element (2) by means of at least one central shaft bearing (3), a first sun gear (4a) arranged concentrically around the central shaft (1) and fixedly secured to the frame element (2), a power transmission means (5) that is fixed in relation to the central shaft (1), and at least one first gearbox assembly (6a) rotating relative to the frame element (2) and comprising: a support plate (7), the first section (7a) of which is non-rotatably connected to the central shaft (1) and on the second section (7b) of which a planetary gear (8) is mounted by means of a planetary gear bearing (9), wherein the planetary gear (8) meshes with the first sun gear (4a) and a crank arm (10) engages rigidly with the planetary gear (8); and a driving crank (11), on which the crank arm (10) is hingedly mounted by means of a driving crank-crank arm bearing (12) and which is supported relative to the support plate (7) by meansType: ApplicationFiled: February 10, 2017Publication date: February 7, 2019Applicant: Moves Bikes GmbHInventors: Tobias Sprote, Marcus Rochlitzer, Stefan Schubert, Frederik Wassmann, Sixtus Godehard Feindt
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Patent number: 10163603Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.Type: GrantFiled: July 19, 2017Date of Patent: December 25, 2018Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Zeidler, Stefan Schubert
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Patent number: 10147002Abstract: A method and an apparatus determine a road condition using a vehicle camera. At least one image is acquired using the camera. A first image area that includes an image of the road surface is determined in the at least one image. A classifier assigns the first image area to at least one class (among pre-established classes) that represents a specific road condition of the road surface. Information regarding this specific road condition is output.Type: GrantFiled: February 14, 2014Date of Patent: December 4, 2018Assignees: Conti Temic microelectronic GmbH, Continental Teves AG & Co. OHGInventors: Bernd Hartmann, Dieter Kroekel, Stefan Fritz, Joachim Denzler, Bjoern Froehlich, Michael Kemmler, Stefan Schubert, Eric Bach
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Patent number: 10121635Abstract: A method of operating a charged particle beam system, the method comprises extracting a particle beam from a source; performing a first accelerating of the particles of the beam; forming a plurality of particle beamlets from the beam after the performing of the first accelerating; performing a second accelerating of the particles of the beamlets; performing a first decelerating of the particles of the beamlets after the performing of the second accelerating; deflecting the beamlets in a direction oriented transverse to a direction of propagation of the particles of the beamlets after the performing of the first decelerating; performing a second decelerating of the particles of the beamlets after the deflecting of the beamlets; and allowing the particles of the beamlets to be incident on an object surface after the performing of the second decelerating.Type: GrantFiled: September 30, 2014Date of Patent: November 6, 2018Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Stefan Schubert, Thomas Kemen, Rainer Knippelmeyer
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Publication number: 20170316912Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.Type: ApplicationFiled: July 19, 2017Publication date: November 2, 2017Inventors: Dirk Zeidler, Stefan Schubert
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Publication number: 20170305403Abstract: A method for detecting a movement of a vehicle that has been shut down in a parked state, including: detecting a movement variable which describes a movement of the vehicle, integrating the movement variable, in a manner dependent on a movement direction of the vehicle, to obtain a movement travel, and, if the movement travel meets a predetermined condition, making a decision on the movement for detection.Type: ApplicationFiled: December 8, 2015Publication date: October 26, 2017Inventors: Christof MARON, Stefan SCHUBERT
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Publication number: 20170294287Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.Type: ApplicationFiled: June 26, 2017Publication date: October 12, 2017Inventors: Rainer KNIPPELMEYER, Stefan SCHUBERT
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Patent number: 9653255Abstract: The disclosure provides a scanning particle beam microscope for inspecting an object. The scanning particle beam microscope includes a particle optical system having an objective lens. The microscope further includes a detector system having a particle optical detector component configured to generate an electrostatic field in the beam path of particles emitted from the object. The detector system is configured to spatially filter the emitted particles after the emitted particles have passed through the electrostatic field and to detect a portion of the filtered emitted particles. The particle optical detector component is configured such that the spatial filtering filters the emitted particles according to a kinetic energy of the emitted particles.Type: GrantFiled: April 14, 2014Date of Patent: May 16, 2017Assignee: Carl Zeiss Microscopy GmbHInventor: Stefan Schubert
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Patent number: 9530613Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.Type: GrantFiled: February 17, 2012Date of Patent: December 27, 2016Assignees: Applied Materials Israel, Ltd., Carl Zeiss Microscopy GmbHInventors: Steven R. Rogers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah
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Publication number: 20160247663Abstract: A method of operating a charged particle beam system, the method comprises extracting a particle beam from a source; performing a first accelerating of the particles of the beam; forming a plurality of particle beamlets from the beam after the performing of the first accelerating; performing a second accelerating of the particles of the beamlets; performing a first decelerating of the particles of the beamlets after the performing of the second accelerating; deflecting the beamlets in a direction oriented transverse to a direction of propagation of the particles of the beamlets after the performing of the first decelerating; performing a second decelerating of the particles of the beamlets after the deflecting of the beamlets; and allowing the particles of the beamlets to be incident on an object surface after the performing of the second decelerating.Type: ApplicationFiled: September 30, 2014Publication date: August 25, 2016Applicants: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Stefan SCHUBERT, Thomas KEMEN, Rainer KNIPPELMEYER
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Publication number: 20160240344Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture pType: ApplicationFiled: April 25, 2016Publication date: August 18, 2016Inventors: Thomas KEMEN, Rainer KNIPPELMEYER, Stefan SCHUBERT
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Publication number: 20160181054Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.Type: ApplicationFiled: February 29, 2016Publication date: June 23, 2016Inventors: Rainer KNIPPELMEYER, Stefan SCHUBERT
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Patent number: 9324537Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture pType: GrantFiled: June 19, 2014Date of Patent: April 26, 2016Assignees: APPLIED MATERIALS ISRAEL, LTD., CARL ZEISS MICROSCOPY GMBHInventors: Thomas Kemen, Rainer Knippelmeyer, Stefan Schubert
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Patent number: 9263233Abstract: A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.Type: GrantFiled: September 28, 2014Date of Patent: February 16, 2016Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL, LTD.Inventors: Dirk Zeidler, Rainer Knippelmeyer, Thomas Kemen, Mario Muetzel, Stefan Schubert, Nissim Elmaliah, Steven Rogers
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Publication number: 20150371095Abstract: This invention relates to a method and apparatus for determining a road condition using a vehicle camera (6), and it includes the following steps: at least one image (I) is taken using the vehicle camera (S10); a first image area (R1) is determined that includes an image of the road surface (1) (S16); said first image area (R1) is fed to a classifier, wherein the classifier assigns at least one class to said first image area that represents a specific road condition (S18); and information is output with respect to this at least one road condition (S20).Type: ApplicationFiled: February 14, 2014Publication date: December 24, 2015Inventors: Bernd HARTMANN, Dieter KROEKEL, Stefan FRITZ, Joachim DENZLER, Bjoern FROEHLICH, Michael KEMMLER, Stefan SCHUBERT, Eric BACH
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Publication number: 20150287568Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.Type: ApplicationFiled: February 17, 2012Publication date: October 8, 2015Inventors: Steven R. Rodgers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah
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Patent number: 9099282Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one non-astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.Type: GrantFiled: March 27, 2014Date of Patent: August 4, 2015Assignee: APPLIED MATERIALS ISRAEL, LTD.Inventors: Steven R. Rogers, Rainer K. Knippelmeyer, Thomas Kemen, Stefan Schubert, Nissim Elmaliah
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Publication number: 20150090879Abstract: A charged particle multi-beam inspection system comprises a beam generator directing a plurality of primary charged particle beams onto an object to produce an array of beam spots; an array of a first number of detection elements generating detection signals upon incidence of electrons; imaging optics imaging the array of beam spots onto the array of detection elements; wherein the beam generator includes a multi-aperture plate having an array of a second number of apertures greater than the first number; wherein the beam generator includes a selector having plural different states, wherein, in each of the plural different states, the apertures of a different group of apertures are each traversed by one primary charged particle beam, wherein a number of the apertures of the different group of apertures is equal to the first number.Type: ApplicationFiled: September 28, 2014Publication date: April 2, 2015Inventors: Dirk Zeidler, Rainer Knippelmeyer, Thomas Kemen, Mario Muetzel, Stefan Schubert, Nissim Elmaliah, Steven Rogers
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Publication number: 20150008331Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture pType: ApplicationFiled: June 19, 2014Publication date: January 8, 2015Inventors: Thomas KEMEN, Rainer KNIPPELMEYER, Stefan SCHUBERT
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Publication number: 20140306110Abstract: The disclosure provides a scanning particle beam microscope for inspecting an object. The scanning particle beam microscope includes a particle optical system having an objective lens. The microscope further includes a detector system having a particle optical detector component configured to generate an electrostatic field in the beam path of particles emitted from the object. The detector system is configured to spatially filter the emitted particles after the emitted particles have passed through the electrostatic field and to detect a portion of the filtered emitted particles. The particle optical detector component is configured such that the spatial filtering filters the emitted particles according to a kinetic energy of the emitted particles.Type: ApplicationFiled: April 14, 2014Publication date: October 16, 2014Inventor: Stefan Schubert