Patents by Inventor Stefan Xalter

Stefan Xalter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150168853
    Abstract: A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement of the floor in order to restrict a movement of the second component relative to the first component.
    Type: Application
    Filed: December 22, 2014
    Publication date: June 18, 2015
    Inventors: Mathias Schumacher, Burkhard Corves, Jens Kugler, Markus Knuefermann, Bernhard Geuppert, Stefan Xalter, Bernhard Gellrich
  • Patent number: 9019475
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: April 28, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 9013684
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: July 24, 2012
    Date of Patent: April 21, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 9001309
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: April 7, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Publication number: 20140233006
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 21, 2014
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Damian Fiolka, Andras G. Major, Johannes Wangler, Michael Layh
  • Publication number: 20140226141
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 8659745
    Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
    Type: Grant
    Filed: June 19, 2013
    Date of Patent: February 25, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
  • Publication number: 20140021324
    Abstract: A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement (Z) of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement (Z) of the floor in order to restrict a movement of the second component relative to the first component.
    Type: Application
    Filed: July 3, 2013
    Publication date: January 23, 2014
    Inventors: Mathias Schumacher, Burkhard Corves, Jens Kugler, Markus Knuefermann, Bernhard Geuppert, Stefan Xalter, Bernhard Gellrich
  • Patent number: 8570676
    Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
    Type: Grant
    Filed: March 11, 2011
    Date of Patent: October 29, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
  • Publication number: 20130278911
    Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
    Type: Application
    Filed: June 19, 2013
    Publication date: October 24, 2013
    Inventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
  • Patent number: 8542346
    Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: September 24, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
  • Publication number: 20120327385
    Abstract: Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.
    Type: Application
    Filed: August 21, 2012
    Publication date: December 27, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
  • Patent number: 8339577
    Abstract: An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: December 25, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Publication number: 20120293784
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: July 24, 2012
    Publication date: November 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 8269947
    Abstract: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: September 18, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
  • Publication number: 20120188523
    Abstract: An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.
    Type: Application
    Filed: February 27, 2012
    Publication date: July 26, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Viktor Kulitsky, Bernhard Gellrich, Stefan Xalter, Yim-Bun Patrick Kwan, Peter Deufel, Andreas Wurmbrand
  • Publication number: 20120075611
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Application
    Filed: November 30, 2011
    Publication date: March 29, 2012
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
  • Patent number: 8089707
    Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: January 3, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
  • Patent number: 8018664
    Abstract: A housing structure has a frame structure 1 on which there are arranged via connecting elements 7 several optical elements 5 which are held in mounts 6 or structural modules 6?. The optical elements 5 are detachably connected to the frame structure 1 with their mounts 6 or structural modules 6? and connecting elements 7 in such a way that in the installed state they are integrated as bearing units in the frame structure 1.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: September 13, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Peter Deufel, Yim Bun Patrick Kwan, Bernard Stommen, Herman Soemers, Franz Van Deuren, Paul Peter Anne Brom
  • Publication number: 20110216428
    Abstract: A housing structure has a frame structure 1 on which there are arranged via connecting elements 7 several optical elements 5 which are held in mounts 6 or structural modules 6?. The optical elements 5 are detachably connected to the frame structure 1 with their mounts 6 or structural modules 6? and connecting elements 7 in such a way that in the installed state they are integrated as bearing units in the frame structure 1.
    Type: Application
    Filed: May 16, 2011
    Publication date: September 8, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Stefan Xalter, Peter Deufel, Yim Bun Patrick Kwan, Bernard Stommen, Herman Soemers, Franz Van Deuren, Paul Peter Anne Brom