Patents by Inventor Stefan Xalter
Stefan Xalter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20150168853Abstract: A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement of the floor in order to restrict a movement of the second component relative to the first component.Type: ApplicationFiled: December 22, 2014Publication date: June 18, 2015Inventors: Mathias Schumacher, Burkhard Corves, Jens Kugler, Markus Knuefermann, Bernhard Geuppert, Stefan Xalter, Bernhard Gellrich
-
Patent number: 9019475Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 17, 2014Date of Patent: April 28, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 9013684Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: July 24, 2012Date of Patent: April 21, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 9001309Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: GrantFiled: April 17, 2014Date of Patent: April 7, 2015Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Publication number: 20140233006Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 17, 2014Publication date: August 21, 2014Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Damian Fiolka, Andras G. Major, Johannes Wangler, Michael Layh
-
Publication number: 20140226141Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: April 17, 2014Publication date: August 14, 2014Applicant: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 8659745Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: GrantFiled: June 19, 2013Date of Patent: February 25, 2014Assignee: Carl Zeiss SMT GmbHInventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
-
Publication number: 20140021324Abstract: A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement (Z) of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement (Z) of the floor in order to restrict a movement of the second component relative to the first component.Type: ApplicationFiled: July 3, 2013Publication date: January 23, 2014Inventors: Mathias Schumacher, Burkhard Corves, Jens Kugler, Markus Knuefermann, Bernhard Geuppert, Stefan Xalter, Bernhard Gellrich
-
Patent number: 8570676Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: March 11, 2011Date of Patent: October 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Publication number: 20130278911Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: ApplicationFiled: June 19, 2013Publication date: October 24, 2013Inventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
-
Patent number: 8542346Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: GrantFiled: March 24, 2009Date of Patent: September 24, 2013Assignee: Carl Zeiss SMT GmbHInventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
-
Publication number: 20120327385Abstract: Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.Type: ApplicationFiled: August 21, 2012Publication date: December 27, 2012Applicant: CARL ZEISS SMT GMBHInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
-
Patent number: 8339577Abstract: An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.Type: GrantFiled: July 21, 2009Date of Patent: December 25, 2012Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Publication number: 20120293784Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.Type: ApplicationFiled: July 24, 2012Publication date: November 22, 2012Applicant: CARL ZEISS SMT GMBHInventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
-
Patent number: 8269947Abstract: An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component.Type: GrantFiled: February 17, 2009Date of Patent: September 18, 2012Assignee: Carl Zeiss SMT GmbHInventors: Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter, Damian Fiolka
-
Publication number: 20120188523Abstract: An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.Type: ApplicationFiled: February 27, 2012Publication date: July 26, 2012Applicant: CARL ZEISS SMT GMBHInventors: Viktor Kulitsky, Bernhard Gellrich, Stefan Xalter, Yim-Bun Patrick Kwan, Peter Deufel, Andreas Wurmbrand
-
Publication number: 20120075611Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: November 30, 2011Publication date: March 29, 2012Applicant: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
-
Patent number: 8089707Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: February 4, 2010Date of Patent: January 3, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
-
Patent number: 8018664Abstract: A housing structure has a frame structure 1 on which there are arranged via connecting elements 7 several optical elements 5 which are held in mounts 6 or structural modules 6?. The optical elements 5 are detachably connected to the frame structure 1 with their mounts 6 or structural modules 6? and connecting elements 7 in such a way that in the installed state they are integrated as bearing units in the frame structure 1.Type: GrantFiled: April 20, 2004Date of Patent: September 13, 2011Assignee: Carl Zeiss SMT GmbHInventors: Stefan Xalter, Peter Deufel, Yim Bun Patrick Kwan, Bernard Stommen, Herman Soemers, Franz Van Deuren, Paul Peter Anne Brom
-
Publication number: 20110216428Abstract: A housing structure has a frame structure 1 on which there are arranged via connecting elements 7 several optical elements 5 which are held in mounts 6 or structural modules 6?. The optical elements 5 are detachably connected to the frame structure 1 with their mounts 6 or structural modules 6? and connecting elements 7 in such a way that in the installed state they are integrated as bearing units in the frame structure 1.Type: ApplicationFiled: May 16, 2011Publication date: September 8, 2011Applicant: CARL ZEISS SMT GMBHInventors: Stefan Xalter, Peter Deufel, Yim Bun Patrick Kwan, Bernard Stommen, Herman Soemers, Franz Van Deuren, Paul Peter Anne Brom