Patents by Inventor Stephen R. Porter

Stephen R. Porter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040158690
    Abstract: A balanced sense amplifier control for open digit line architecture memory devices. Firing of the sense amplifiers on each side of a section of a memory device is controlled by a two stage NAND gate logic circuit that utilizes a tree routing scheme. By gating the global signal with a section signal through the two stage NAND gate logic circuit, the sense amplifiers on each side of a section can be fired simultaneously.
    Type: Application
    Filed: February 11, 2004
    Publication date: August 12, 2004
    Inventors: Scot M. Graham, Scott J. Derner, Stephen R. Porter
  • Patent number: 6740957
    Abstract: The antifuse device comprises an insulating layer positioned in the trench, a conductive member positioned above the insulating layer, at least a portion of the conductive member being positioned within the trench, the conductive member adapted to have at least one programming voltage applied thereto, and at least one doped active region formed in the substrate adjacent the trench. The antifuse further comprises at least one conductive contact coupled to the conductive member, and at least one conductive contact coupled to the doped active region.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: May 25, 2004
    Assignee: Micron Technology, Inc.
    Inventor: Stephen R. Porter
  • Patent number: 6723618
    Abstract: Field isolation structures and methods of forming field isolation structures are described. In one implementation, the method includes etching a trench within a monocrystalline silicon substrate. The trench has sidewalls and a base, with the base comprising monocrystalline silicon. A dielectric material is formed on the sidewalls of the trench. Epitaxial monocrystalline silicon is grown from the base of the trench and over at least a portion of the dielectric material. An insulating layer is formed over the epitaxial monocrystalline silicon. According to one implementation, the invention includes a field isolation structure formed within a monocrystalline silicon comprising substrate. The field isolation structure includes a trench having sidewalls. A dielectric material is received on the sidewalls within the trench. Monocrystalline silicon is received within the trench between the dielectric material of the sidewalls. An insulating layer is received over the monocrystalline silicon within the trench.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: April 20, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Russell Meyer, Jeffrey W. Honeycutt, Stephen R. Porter
  • Patent number: 6717873
    Abstract: A balanced sense amplifier control for open digit line architecture memory devices. Firing of the sense amplifiers on each side of a section of a memory device is controlled by a two stage NAND gate logic circuit that utilizes a tree routing scheme. By gating the global signal with a section signal through the two stage NAND gate logic circuit, the sense amplifiers on each side of a section can be fired simultaneously.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: April 6, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Scot M. Graham, Scott J. Derner, Stephen R. Porter
  • Publication number: 20040041233
    Abstract: The antifuse device comprises an insulating layer positioned in the trench, a conductive member positioned above the insulating layer, at least a portion of the conductive member being positioned within the trench, the conductive member adapted to have at least one programming voltage applied thereto, and at least one doped active region formed in the substrate adjacent the trench. The antifuse further comprises at least one conductive contact coupled to the conductive member, and at least one conductive contact coupled to the doped active region.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 4, 2004
    Inventor: Stephen R. Porter
  • Publication number: 20040042318
    Abstract: Method and apparatus are disclosed for regulating an antifuse programming current by lightly doping an electrically connected region so that the resistance of the region responds in a non-linear manner to changes in voltage. In this way a variable resistor or a variably resistive transistor may be created which vary their resistance in response to an applied voltage and which may thereby limit a programming current while not limiting a lesser, reading current to a serially connected antifuse.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 4, 2004
    Inventors: Stephen R. Porter, Scott J. Derner
  • Publication number: 20040042309
    Abstract: A memory device includes isolation devices located between memory cells. A plurality of isolation lines connects the isolation devices to a positive voltage during normal operations but still keeps the isolation devices in the off state to provide isolation between the memory cells. A current control circuit is placed between the isolation lines and a power node for reducing a current flowing between the isolation lines and the power node in case a deflect occurs at any one of isolation devices.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 4, 2004
    Inventors: Luan C. Tran, Stephen R. Porter, Scot M. Graham, Steven E. Howell
  • Publication number: 20040016986
    Abstract: Field isolation structures and methods of forming field isolation structures are described. In one implementation, the method includes etching a trench within a monocrystalline silicon substrate. The trench has sidewalls and a base, with the base comprising monocrystalline silicon. A dielectric material is formed on the sidewalls of the trench. Epitaxial monocrystalline silicon is grown from the base of the trench and over at least a portion of the dielectric material. An insulating layer is formed over the epitaxial monocrystalline silicon. According to one implementation, the invention includes a field isolation structure formed within a monocrystalline silicon comprising substrate. The field isolation structure includes a trench having sidewalls. A dielectric material is received on the sidewalls within the trench. Monocrystalline silicon is received within the trench between the dielectric material of the sidewalls. An insulating layer is received over the monocrystalline silicon within the trench.
    Type: Application
    Filed: July 26, 2002
    Publication date: January 29, 2004
    Inventors: Russell Meyer, Jeffrey W. Honeycutt, Stephen R. Porter
  • Patent number: 6628144
    Abstract: A circuit is provided to isolate a contact pad from a logic circuit of a die once the contact pad is no longer needed. This circuit can take many forms including a CMOS multiplexer controlled by a fuse or anti-fuse, an NMOS or PMOS pass gate controlled by a fuse or anti-fuse, or even a fusible link which is severed to effect isolation. Additionally, a circuit is provided that switchably isolates one of two contact pads from a logic circuit.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: September 30, 2003
    Assignee: Micron Technology, Inc.
    Inventors: Daniel R. Loughmiller, Stephen R. Porter
  • Publication number: 20030173622
    Abstract: An electrostatic discharge protection device is formed in a substrate and contains a drain area of a first dopant concentration abutting an extended drain area having a dopant concentration lower than the first dopant concentration. Similarly, a highly doped source area abuts a lower doped source extension area. The source and drain are laterally bounded by oxide regions and covered by an insulation layer. The areas of lower doping prevent charge crowding during an electrostatic discharge event by resistively forcing current though the nearly planer bottom surface of the drain, rather than the curved drain extension. In addition, a highly doped buried layer can abut an area of a graded doping level. By adjusting the doping levels of the graded areas and the buried layers, the substrate breakdown voltage is pre-selected.
    Type: Application
    Filed: January 16, 2003
    Publication date: September 18, 2003
    Inventors: Stephen R. Porter, Manny K. Ma, Stephen Casper, Kevin Duesman
  • Patent number: 6593218
    Abstract: An electrostatic discharge protection device is formed in a substrate and contains a drain area of a first dopant concentration abutting an extended drain area having a dopant concentration lower than the first dopant concentration. Similarly, a highly doped source area abuts a lower doped source extension area. The source and drain are laterally bounded by oxide regions and covered by an insulation layer. The areas of lower doping prevent charge crowding during an electrostatic discharge event by resistively forcing current though the nearly planer bottom surface of the drain, rather than the curved drain extension. In addition, a highly doped buried layer can abut an area of a graded doping level. By adjusting the doping levels of the graded areas and the buried layers, the substrate breakdown voltage is pre-selected.
    Type: Grant
    Filed: August 9, 2001
    Date of Patent: July 15, 2003
    Assignee: Micron Technology, Inc.
    Inventors: Stephen R. Porter, Manny K. Ma, Stephen Casper, Kevin Duesman
  • Patent number: 6576960
    Abstract: An electrostatic discharge protection device is formed in a substrate and contains a drain area of a first dopant concentration abutting an extended drain area having a dopant concentration lower than the first dopant concentration. Similarly, a highly doped source area abuts a lower doped source extension area. The source and drain are laterally bounded by oxide regions and covered by an insulation layer. The areas of lower doping prevent charge crowding during an electrostatic discharge event by resistively forcing current though the nearly planer bottom surface of the drain, rather than the curved drain extension. In addition, a highly doped buried layer can abut an area of a graded doping level. By adjusting the doping levels of the graded areas and the buried layers, the substrate breakdown voltage is pre-selected.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: June 10, 2003
    Assignee: Micron Technology, Inc.
    Inventors: Stephen R. Porter, Manny K. Ma, Stephen Casper, Kevin Duesman
  • Publication number: 20030081476
    Abstract: A balanced sense amplifier control for open digit line architecture memory devices. Firing of the sense amplifiers on each side of a section of a memory device is controlled by a two stage NAND gate logic circuit that utilizes a tree routing scheme. By gating the global signal with a section signal through the two stage NAND gate logic circuit, the sense amplifiers on each side of a section can be fired simultaneously.
    Type: Application
    Filed: December 12, 2002
    Publication date: May 1, 2003
    Inventors: Scot M. Graham, Scott J. Derner, Stephen R. Porter
  • Patent number: 6515925
    Abstract: A balanced sense amplifier control for open digit line architecture memory devices. Firing of the sense amplifiers on each side of a section of a memory device is controlled by a two stage NAND gate logic circuit that utilizes a tree routing scheme. By gating the global signal with a section signal through the two stage NAND gate logic circuit, the sense amplifiers on each side of a section can be fired simultaneously.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: February 4, 2003
    Assignee: Micron Technology, Inc.
    Inventors: Scot M. Graham, Scott J. Derner, Stephen R. Porter
  • Publication number: 20020131311
    Abstract: A balanced sense amplifier control for open digit line architecture memory devices. Firing of the sense amplifiers on each side of a section of a memory device is controlled by a two stage NAND gate logic circuit that utilizes a tree routing scheme. By gating the global signal with a section signal through the two stage NAND gate logic circuit, the sense amplifiers on each side of a section can be fired simultaneously.
    Type: Application
    Filed: March 15, 2001
    Publication date: September 19, 2002
    Inventors: Scot M. Graham, Scott J. Derner, Stephen R. Porter
  • Patent number: 6445610
    Abstract: A variable voltage is provided to gates of isolation transistors in DRAM devices between digit lines containing many storage cells and a sense amplifier. The gate of the isolation transistor is provided a voltage pumped higher than the supply voltage during read time to ensure that a small differential voltage on the digit lines is correctly read. A lower voltage is provided at sense time such that the isolation gate provides a higher resistance during sense time. During restore time, the isolation gate voltage is again raised above the operating voltage to minimize the effects of isolation transistor threshold voltage, Vt. In further embodiments, the higher voltage is only provided during restore time and the read and sense voltages are varied between the higher and lower voltage.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: September 3, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Stephen R. Porter, George B. Raad, Stephen L. Casper
  • Patent number: 6438049
    Abstract: A method and circuit for rapidly equilibrating paired digit lines of a memory array of a dynamic random access memory device is described. The equilibrate circuit includes a bias-circuit coupled to sense amplifier circuitry for adjusting the equilibrate voltage during testing. A method is described for testing memory cell margin by adjusting the equilibrate voltage until an error is detected. The bias circuit is described as a pull-up transistor coupled to a common mode of a cross-coupled n-sense amplifier.
    Type: Grant
    Filed: February 24, 1999
    Date of Patent: August 20, 2002
    Assignee: Micron Technology, Inc.
    Inventor: Stephen R. Porter
  • Publication number: 20020109529
    Abstract: A circuit is provided to isolate a contact pad from a logic circuit of a die once the contact pad is no longer needed. This circuit can take many forms including a CMOS multiplexer controlled by a fuse or anti-fuse, an NMOS or PMOS pass gate controlled by a fuse or anti-fuse, or even a fusible link which is severed to effect isolation. Additionally, a circuit is provided that switchably isolates one of two contact pads from a logic circuit.
    Type: Application
    Filed: March 28, 2002
    Publication date: August 15, 2002
    Inventors: Daniel R. Loughmiller, Stephen R. Porter
  • Publication number: 20020094627
    Abstract: An electrostatic discharge protection device is formed in a substrate and contains a drain area of a first dopant concentration abutting an extended drain area having a dopant concentration lower than the first dopant concentration. Similarly, a highly doped source area abuts a lower doped source extension area. The source and drain are laterally bounded by oxide regions and covered by an insulation layer. The areas of lower doping prevent charge crowding during an electrostatic discharge event by resistively forcing current though the nearly planer bottom surface of the drain, rather than the curved drain extension. In addition, a highly doped buried layer can abut an area of a graded doping level. By adjusting the doping levels of the graded areas and the buried layers, the substrate breakdown voltage is pre-selected.
    Type: Application
    Filed: March 11, 2002
    Publication date: July 18, 2002
    Inventors: Stephen R. Porter, Manny K. Ma, Stephen Casper, Kevin Duesman
  • Patent number: 6396300
    Abstract: A circuit is provided to isolate a contact pad from a logic circuit of a die once the contact pad is no longer needed. This circuit can take many forms including a CMOS multiplexer controlled by a fuse or anti-fuse, an NMOS or PMOS pass gate controlled by a fuse or anti-fuse, or even a fusible link which is severed to effect isolation. Additionally, a circuit is provided that switchably isolates one of two contact pads from a logic circuit.
    Type: Grant
    Filed: December 17, 1999
    Date of Patent: May 28, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Daniel R. Loughmiller, Stephen R. Porter