Patents by Inventor Steve Kramer

Steve Kramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12054065
    Abstract: A method for load management of a charging station, in which the charging station is formed by at least two charging points, each with a charging control and a power electronics module assigned to the respective charging point, a charge management server and a transformer connected to an electricity supply network. The network provides a transformer power, in which the load management carried out by the load management server controls an allocation of the transformer power among the respective charging points, in which a respective charging operation of a particular electric vehicle at a particular charging point is controlled via the respective charging control connected to the load management. Charging power controlled by the load management is provided by the respective power electronics module assigned to the respective charging point. The load management has a dynamic and a static execution mode.
    Type: Grant
    Filed: December 1, 2020
    Date of Patent: August 6, 2024
    Assignee: Dr. Ing. h.c. F. Porsche Aktiengesellschaft
    Inventors: Christian Metzger, Eric Vogel, Steve Zander, Julian Kramer, Lukas Lindel, Moritz Assig
  • Patent number: 10028784
    Abstract: This invention relates to medical methods, instruments and systems for creating a controlled lesion using temperature to control the growth of the lesion. The treatment can be used in any tissue area and is particularly useful in or around a vertebral body. The features relating to the methods and devices described herein can be applied in any region of soft or hard tissue including bone or hard tissue.
    Type: Grant
    Filed: August 6, 2014
    Date of Patent: July 24, 2018
    Assignee: DFINE, INC.
    Inventors: Steve Kramer, Kirti P. Kamdar, Andrew Kohm, Robert Poser, Aaron Germain
  • Patent number: 9552858
    Abstract: A magnetic memory cell including a piezoelectric material, and methods of operating the memory cell are provided. The memory cell includes a stack, and the piezoelectric material may be formed as a layer in the stack or adjacent the layers of the cell stack. The piezoelectric material may be used to induce a transient stress during programming of the memory cell to reduce the critical switching current of the memory cell.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: January 24, 2017
    Assignee: Micron Technology. Inc.
    Inventors: Jun Liu, Steve Kramer, Gurtej Sandhu
  • Publication number: 20160078912
    Abstract: A magnetic memory cell including a piezoelectric material, and methods of operating the memory cell are provided. The memory cell includes a stack, and the piezoelectric material may be formed as a layer in the stack or adjacent the layers of the cell stack. The piezoelectric material may be used to induce a transient stress during programming of the memory cell to reduce the critical switching current of the memory cell.
    Type: Application
    Filed: November 20, 2015
    Publication date: March 17, 2016
    Inventors: Jun Liu, Steve Kramer, Gurtej Sandhu
  • Patent number: 9218863
    Abstract: A magnetic memory cell including a piezoelectric material, and methods of operating the memory cell are provided. The memory cell includes a stack, and the piezoelectric material may be formed as a layer in the stack or adjacent the layers of the cell stack. The piezoelectric material may be used to induce a transient stress during programming of the memory cell to reduce the critical switching current of the memory cell.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: December 22, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Jun Liu, Steve Kramer, Gurtej Sandhu
  • Publication number: 20140350542
    Abstract: This invention relates to medical methods, instruments and systems for creating a controlled lesion using temperature to control the growth of the lesion. The treatment can be used in any tissue area and is particularly useful in or around a vertebral body. The features relating to the methods and devices described herein can be applied in any region of soft or hard tissue including bone or hard tissue.
    Type: Application
    Filed: August 6, 2014
    Publication date: November 27, 2014
    Applicant: DFINE, INC.
    Inventors: Steve KRAMER, Kirti P. KAMDAR, Andrew KOHM, Robert POSER, Aaron GERMAIN
  • Patent number: 8864760
    Abstract: This invention relates to medical methods, instruments and systems for creating a controlled lesion using temperature to control the growth of the lesion. The treatment can be used in any tissue area and is particularly useful in or around a vertebral body. The features relating to the methods and devices described herein can be applied in any region of soft or hard tissue including bone or hard tissue.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: October 21, 2014
    Assignee: Dfine, Inc.
    Inventors: Steve Kramer, Kirti P. Kamdar, Andrew Kohm, Robert Poser, Aaron Germain
  • Publication number: 20140299997
    Abstract: Methods are disclosed, including for increasing the density of isolated features in an integrated circuit. Also disclosed are associated structures. In some embodiments, contacts are formed on pitch with other structures, such as conductive interconnects that may be formed by pitch multiplication. To form the contacts, in some embodiments, a pattern corresponding to some of the contacts is formed in a selectively definable material such as photoresist. Features in the selectively definable material are trimmed, and spacer material is blanket deposited over the features and the deposited material is then etched to leave spacers on sides of the features. The selectively definable material is removed, leaving a mask defined by the spacer material. The pattern defined by the spacer material may be transferred to a substrate, to form on pitch contacts. In some embodiments, the on pitch contacts may be used to electrically contact conductive interconnects in the substrate.
    Type: Application
    Filed: June 23, 2014
    Publication date: October 9, 2014
    Inventors: Gurtej Sandhu, Mark Kiehlbauch, Steve Kramer, John Smythe
  • Patent number: 8845812
    Abstract: Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: September 30, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Nishant Sinha, Steve Kramer, Gurtej Sandhu
  • Patent number: 8772166
    Abstract: Methods are disclosed, including for increasing the density of isolated features in an integrated circuit. Also disclosed are associated structures. In some embodiments, contacts are formed on pitch with other structures, such as conductive interconnects that may be formed by pitch multiplication. To form the contacts, in some embodiments, a pattern corresponding to some of the contacts is formed in a selectively definable material such as photoresist. Features in the selectively definable material are trimmed, and spacer material is blanket deposited over the features and the deposited material is then etched to leave spacers on sides of the features. The selectively definable material is removed, leaving a mask defined by the spacer material. The pattern defined by the spacer material may be transferred to a substrate, to form on pitch contacts. In some embodiments, the on pitch contacts may be used to electrically contact conductive interconnects in the substrate.
    Type: Grant
    Filed: June 19, 2012
    Date of Patent: July 8, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej Sandhu, Mark Kiehlbauch, Steve Kramer, John Smythe
  • Patent number: 8591507
    Abstract: This invention relates to medical methods, instruments and systems for creating a controlled lesion using temperature to control the growth of the lesion. The treatment can be used in any tissue area and is particularly useful in or around a vertebral body. The features relating to the methods and devices described herein can be applied in any region of soft or hard tissue including bone or hard tissue.
    Type: Grant
    Filed: January 31, 2013
    Date of Patent: November 26, 2013
    Assignee: Dfine, Inc.
    Inventors: Steve Kramer, Kirti P. Kamdar, Andrew Kohm, Robert Poser, Aaron Germain
  • Patent number: 8592940
    Abstract: A mask having features formed by self-organizing material, such as diblock copolymers, is formed on a partially fabricated integrated circuit. A copolymer template, or seed layer, is formed on the surface of the partially fabricated integrated circuit. To form the seed layer, diblock copolymers, composed of two immiscible blocks, are deposited in the space between copolymer alignment guides. The copolymers self-organize, with the guides guiding the self-organization and with each block aggregating with other blocks of the same type, thereby forming the seed layer. Supplemental diblock copolymers are deposited over the seed layer. The copolymers in the seed layer guide self-organization of the supplemental copolymers, thereby vertically extending the pattern formed by the copolymers in the seed layer. Block species are subsequently selectively removed to form a pattern of voids defined by the remaining block species, which form a mask that can be used to pattern an underlying substrate.
    Type: Grant
    Filed: January 16, 2012
    Date of Patent: November 26, 2013
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej S. Sandhu, Steve Kramer
  • Publication number: 20130261615
    Abstract: This invention relates to medical methods, instruments and systems for creating a controlled lesion using temperature to control the growth of the lesion. The treatment can be used in any tissue area and is particularly useful in or around a vertebral body. The features relating to the methods and devices described herein can be applied in any region of soft or hard tissue including bone or hard tissue.
    Type: Application
    Filed: March 11, 2013
    Publication date: October 3, 2013
    Applicant: DFINE, INC.
    Inventors: Steve KRAMER, Kirti P. KAMDAR, Andrew KOHM, Robert POSER, Aaron GERMAIN
  • Publication number: 20130261621
    Abstract: This invention relates to medical methods, instruments and systems for creating a controlled lesion using temperature to control the growth of the lesion. The treatment can be used in any tissue area and is particularly useful in or around a vertebral body. The features relating to the methods and devices described herein can be applied in any region of soft or hard tissue including bone or hard tissue.
    Type: Application
    Filed: January 31, 2013
    Publication date: October 3, 2013
    Applicant: DFINE, INC.
    Inventors: Steve KRAMER, Kirti P. KAMDAR, Andrew KOHM, Robert POSER, Aaron GERMAIN
  • Patent number: 8310861
    Abstract: A magnetic memory cell including a piezoelectric material, and methods of operating the memory cell are provided. The memory cell includes a stack, and the piezoelectric material may be formed as a layer in the stack or adjacent the layers of the cell stack. The piezoelectric material may be used to induce a transient stress during programming of the memory cell to reduce the critical switching current of the memory cell.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: November 13, 2012
    Assignee: Micron Technology, Inc.
    Inventors: Jun Liu, Steve Kramer, Gurtej Sandhu
  • Publication number: 20120258599
    Abstract: Methods are disclosed, including for increasing the density of isolated features in an integrated circuit. Also disclosed are associated structures. In some embodiments, contacts are formed on pitch with other structures, such as conductive interconnects that may be formed by pitch multiplication. To form the contacts, in some embodiments, a pattern corresponding to some of the contacts is formed in a selectively definable material such as photoresist. Features in the selectively definable material are trimmed, and spacer material is blanket deposited over the features and the deposited material is then etched to leave spacers on sides of the features. The selectively definable material is removed, leaving a mask defined by the spacer material. The pattern defined by the spacer material may be transferred to a substrate, to form on pitch contacts. In some embodiments, the on pitch contacts may be used to electrically contact conductive interconnects in the substrate.
    Type: Application
    Filed: June 19, 2012
    Publication date: October 11, 2012
    Applicant: Micron Technology, Inc.
    Inventors: Gurtej Sandhu, Mark Kiehlbauch, Steve Kramer, John Smythe
  • Patent number: 8211803
    Abstract: Methods are disclosed, such as those involving increasing the density of isolated features in an integrated circuit. Also disclosed are structures associated with the methods. In one or more embodiments, contacts are formed on pitch with other structures, such as conductive interconnects. The interconnects may be formed by pitch multiplication. To form the contacts, in some embodiments, a pattern corresponding to some of the contacts is formed in a selectively definable material such as photoresist. The features in the selectively definable material are trimmed to desired dimensions. Spacer material is blanket deposited over the features in the selectively definable material and the deposited material is then etched to leave spacers on sides of the features. The selectively definable material is removed to leave a mask defined by the spacer material. The pattern defined by the spacer material may be transferred to a substrate, to form on pitch contacts.
    Type: Grant
    Filed: May 17, 2010
    Date of Patent: July 3, 2012
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej Sandhu, Mark Kiehlbauch, Steve Kramer, John Smythe
  • Publication number: 20120119321
    Abstract: A mask having features formed by self-organizing material, such as diblock copolymers, is formed on a partially fabricated integrated circuit. A copolymer template, or seed layer, is formed on the surface of the partially fabricated integrated circuit. To form the seed layer, diblock copolymers, composed of two immiscible blocks, are deposited in the space between copolymer alignment guides. The copolymers self-organize, with the guides guiding the self-organization and with each block aggregating with other blocks of the same type, thereby forming the seed layer. Supplemental diblock copolymers are deposited over the seed layer. The copolymers in the seed layer guide self-organization of the supplemental copolymers, thereby vertically extending the pattern formed by the copolymers in the seed layer. Block species are subsequently selectively removed to form a pattern of voids defined by the remaining block species, which form a mask that can be used to pattern an underlying substrate.
    Type: Application
    Filed: January 16, 2012
    Publication date: May 17, 2012
    Applicant: Micron Technology, Inc.
    Inventors: Gurtej S. Sandhu, Steve Kramer
  • Patent number: 8114573
    Abstract: A mask having features formed by self-organizing material, such as diblock copolymers, is formed on a partially fabricated integrated circuit. Initially, a copolymer template, or seed layer, is formed on the surface of the partially fabricated integrated circuit. To form the seed layer, diblock copolymers, composed of two immiscible blocks, are deposited in the space between copolymer alignment guides. The copolymers are made to self-organize, with the guides guiding the self-organization and with each block aggregating with other blocks of the same type, thereby forming the seed layer. Next, additional, supplemental diblock copolymers are deposited over the seed layer. The copolymers in the seed layer guide self-organization of the supplemental copolymers, thereby vertically extending the pattern formed by the copolymers in the seed layer.
    Type: Grant
    Filed: April 9, 2010
    Date of Patent: February 14, 2012
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej S. Sandhu, Steve Kramer
  • Patent number: 8058044
    Abstract: In some embodiments, the present invention pertains to a method for conjugating a first compound to a second compound wherein the conjugation involves an electrophilic moiety. The method comprises reacting the first compound with the second compound to form a conjugate. The improvement in embodiments of the present invention comprises adding a nucleophilic reagent to the conjugate wherein the nucleophilic reagent forms a neutral product upon reaction with unreacted electrophilic moieties of the conjugate. In some embodiments, the nucleophilic reagent is substantially non-reactive with disulfide bonds in the event that the conjugate comprises disulfide bonds. The conjugate formed is doubly deactivated because the other moiety for linking to the electrophilic moiety is also deactivated.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: November 15, 2011
    Assignee: Siemens Healthcare Diagnostics, Inc.
    Inventors: Alan R. Craig, Steve Kramer, Ashok Koul