Abstract: A heat exchange system includes a housing, a cover, and a sealing mechanism. The housing includes an outer side, an inner side opposite the outer side, a supply channel on the inner side, an exit channel on the inner side, and a plurality of fins on the inner side. The plurality of fins define a plurality of transverse channels. Each transverse provides fluid communication between the supply channel and the exit channel. The cover covers the inner side of the housing. The sealing mechanism compresses the cover and the housing such that a seal is formed between the cover and the housing.

Abstract: A system can include a substrate chuck, an actinic radiation source for curing a photocurable composition, and an insertable object that can be moved between a retracted state and an inserted state. The object can be a thermal shield or a heating member including a heating element. When in an inserted state, the heating element can be disposed between the substrate chuck and the actinic radiation source, or the thermal shield can be disposed between a substrate and the substrate chuck. During heating, the heating member, the thermal shield, or both can help to reduce the amount of heat received by the substrate chuck, a positioning stage, or both.

Abstract: A heat exchange system includes a housing, a cover, and a sealing mechanism. The housing includes an outer side, an inner side opposite the outer side, a supply channel on the inner side, an exit channel on the inner side, and a plurality of fins on the inner side. The plurality of fins define a plurality of transverse channels. Each transverse provides fluid communication between the supply channel and the exit channel. The cover covers the inner side of the housing. The sealing mechanism compresses the cover and the housing such that a seal is formed between the cover and the housing.

Abstract: A planarization system is provided. The planarization system includes a first substrate chuck which holds the substrate during a planarization step, and a second substrate chuck which holds the substrate with a non-flat configuration during a separation step.

Abstract: An apparatus can include a chamber, a sensor, and a controller. The chamber can include a processing zone, wherein the chamber is adapted to support a workpiece along a substrate support plane. The sensor can be adapted to receive a radiation beam adapted to pass through the processing zone and generate a signal in response to receiving the radiation beam. The radiation beam can propagate along a line that is at an acute angle relative to the substrate support plane, and the sensor is outside the processing zone. The controller can be adapted to receive the signal and determine information regarding a position of the workpiece in response to receiving the signal. A method of manufacturing an electronic device can use the apparatus to ensure a workpiece is properly positioned while the workpiece is within a processing chamber.

Abstract: A system can include an array of at least one heat source adapted to heat a stack including a superstrate, a substrate, and a polymerizable composition between the superstrate and the substrate, and at least one actinic radiation source adapted to at least photocure the polymerizable composition to form a photocured planarization layer. Implementations of the system can allow more flexibility regarding heating and exposure operations and may allow a system to occupy less area. Separate stations for heating a pre-cured layer of a polymerizable composition and exposing the pre-cured layer is not required. The array of actinic radiation sources and heat sources allow greater flexibility with respect to timing for heating and exposing to actinic radiation the pre-cured layer. The system can be used in a method that forms a photocurable planarization layer from a pre-cured layer of a polymerizable composition.

Abstract: A planarization system, comprising a superstrate chuck including a holding surface configured to hold a superstrate, an inflatable membrane having an inner diameter defining an inner edge, an outer diameter defining an outer edge, and, a midpoint between the inner edge and the outer edge in a radial direction, wherein the inflatable membrane is disposed radially outward of the holding surface of the superstrate chuck, and a purge gas channel disposed radially inward of the midpoint of the inflatable membrane and radially outward of the holding surface of the superstrate chuck.

Abstract: A method of switching a first fluid supplied to a dispenser with a second fluid. The method includes stopping the first fluid from flowing into a common portion of a flow system, causing a flush fluid to flow through the common portion, stopping the flush fluid from flowing into the common portion, removing the flush fluid from the common portion, causing the second fluid to flow through the common portion, and continuously circulating the first fluid to and from a reservoir without the first liquid entering the common portion of the flow system. The continuously circulating of the first fluid begins a) after stopping the fluid liquid from flowing into the common portion of the flow system and b) prior to or during the second fluid flowing through the common portion of the flow system.

Abstract: A system can include a substrate chuck, an actinic radiation source for curing a photocurable composition, and an insertable object that can be moved between a retracted state and an inserted state. The object can be a thermal shield or a heating member including a heating element. When in an inserted state, the heating element can be disposed between the substrate chuck and the actinic radiation source, or the thermal shield can be disposed between a substrate and the substrate chuck. During heating, the heating member, the thermal shield, or both can help to reduce the amount of heat received by the substrate chuck, a positioning stage, or both.

Abstract: A superstrate for forming a planarization layer on a substrate can include a body having a first surface, a second surface opposite the first surface, and a chamfered edge between the first surface and the second surface. An opaque layer can coat the chamfered edge. In another embodiment, an opaque layer can coat the chamfered edge and a portion of the second surface. The superstrate can be used for more planarization or other processing sequences without causing extrusion defects.

Abstract: A planarizing method includes dispensing formable material onto a substrate, positioning the substrate relative to a substrate chuck by contacting the substrate with a first protrusion of an engagement mechanism, the engagement mechanism being disposed adjacent the substrate chuck, contacting a superstrate held by a superstrate chuck with the formable material, thereby forming a film of formable material between the superstrate and the substrate, curing the film of formable material to form a cured layer between the superstrate and the substrate, and initiating a separation front between the cured layer and the superstrate by contacting the superstrate with a second protrusion of the engagement mechanism.

Abstract: A method of planarizing a substrate comprises dispensing formable material onto a substrate, contacting a superstrate held by a superstrate chuck with the formable material on the substrate, thereby forming a multilayer structure including the superstrate, a film of the formable material, and the substrate, releasing the multilayer structure from the superstrate chuck, providing a space between the superstrate chuck and the multilayer structure after the releasing, positioning a light source into the provided space between the superstrate chuck and the multilayer structure, and curing the film of the multilayer structure by exposing the film to light emitted from the light source.

Abstract: A pressure sensor manifold is provided that resolves issues caused by accumulated particles and bubbles to improve print head performance. The pressure sensor manifold includes a fluid inlet, a fluid outlet, and a dome-shape cavity connecting with both the fluid inlet and the fluid outlet. The fluid inlet has a first interior cross-section, and the fluid outlet has a second interior cross-section. The dome-shape cavity has an apex. A line that is tangential to the apex passes through a plurality of points on both the first interior cross-section of the fluid inlet and the second interior cross-section of the fluid outlet.

Abstract: A heat exchange system includes a housing, a cover, and a sealing mechanism. The housing includes an outer side, an inner side opposite the outer side, a supply channel on the inner side, an exit channel on the inner side, and a plurality of fins on the inner side. The plurality of fins define a plurality of transverse channels. Each transverse provides fluid communication between the supply channel and the exit channel. The cover covers the inner side of the housing. The sealing mechanism compresses the cover and the housing such that a seal is formed between the cover and the housing.

Abstract: A planarization system, comprising a superstrate chuck including a holding surface configured to hold a superstrate, an inflatable membrane having an inner diameter defining an inner edge, an outer diameter defining an outer edge, and, a midpoint between the inner edge and the outer edge in a radial direction, wherein the inflatable membrane is disposed radially outward of the holding surface of the superstrate chuck, and a purge gas channel disposed radially inward of the midpoint of the inflatable membrane and radially outward of the holding surface of the superstrate chuck.

Abstract: A method of planarizing a substrate comprises dispensing formable material onto a substrate, contacting a superstrate held by a superstrate chuck with the formable material on the substrate, thereby forming a multilayer structure including the superstrate, a film of the formable material, and the substrate, releasing the multilayer structure from the superstrate chuck, providing a space between the superstrate chuck and the multilayer structure after the releasing, positioning a light source into the provided space between the superstrate chuck and the multilayer structure, and curing the film of the multilayer structure by exposing the film to light emitted from the light source.

Abstract: A method of switching a first fluid supplied to a dispenser with a second fluid. The method includes stopping the first fluid from flowing into a common portion of a flow system, causing a flush fluid to flow through the common portion, stopping the flush fluid from flowing into the common portion, removing the flush fluid from the common portion, causing the second fluid to flow through the common portion, and continuously circulating the first fluid to and from a reservoir without the first liquid entering the common portion of the flow system. The continuously circulating of the first fluid begins a) after stopping the fluid liquid from flowing into the common portion of the flow system and b) prior to or during the second fluid flowing through the common portion of the flow system.

Abstract: A method of planarizing a substrate comprises dispensing formable material onto a substrate, contacting, at a planarizing station at a first location, a superstrate held by a superstrate chuck with the formable material on the substrate, thereby forming a multilayer structure including the superstrate, a film of the formable material, and the substrate, releasing the superstrate from the superstrate chuck, moving the multilayer structure from the first location to a curing station located at a second location away from the first location, the curing station including an array of light-emitting diodes, and curing the film of the multilayer structure by exposing the film to light emitted from the array of light-emitting diodes.

Abstract: A planarization system, comprising a superstrate chuck including a holding surface configured to hold a superstrate, an inflatable membrane having an inner diameter defining an inner edge, an outer diameter defining an outer edge, and, a midpoint between the inner edge and the outer edge in a radial direction, wherein the inflatable membrane is disposed radially outward of the holding surface of the superstrate chuck, and a purge gas channel disposed radially inward of the midpoint of the inflatable membrane and radially outward of the holding surface of the superstrate chuck.

Abstract: A shaping system comprises a dispensing station configured to dispense formable material on a substrate, a shaping station configured to contact the dispensed formable material on the substrate with a plate, a positioning system configured to move the substrate having the dispensed formable material from the dispensing system to the shaping station, and a cover having one or more walls. While the substrate having the dispensed formable material is moved by the positioning system from the dispensing station to the shaping station, the cover is positioned to enclose the substrate and the dispensed formable material such that a ratio of a diameter of the substrate to a distance between the cover and the substrate to 80:1 to 30:1.