Abstract: An apparatus and method for a dispenser with nozzles configured to eject lines of droplets of formable material onto a substrate in response to ejection signals. The fluid dispenser dispenses a first line of ejected droplets of formable material onto a first location on the substrate. A line camera generates camera signals that are representative of the first line of ejected droplets. The camera signals are analyzed to identify malfunctioning nozzles. The fluid dispenser dispenses a second line of ejected droplets of formable material onto a second location on the substrate that compensates for the one or more malfunctioning nozzles.

Abstract: A pulsation dampener for a dispensing system comprising a housing, a diaphragm comprising at least one fluoropolymer layer, the diaphragm dividing the housing into a first compartment and a second compartment, an inlet port and an outlet port each in fluid communication with the first compartment thereby providing a flow path for a liquid to enter the first compartment via the first inlet port and exit the first compartment via the outlet port, and at least one gas disposed within the second compartment, the at least one gas having a kinetic diameter of 0.36 nm or greater, wherein the fluoropolymer of the at least one fluoropolymer layer and the at least one gas are selected such that a gas transmittance rate of the at least one gas through the diaphragm is from 0 mbar*L/second to 1*10?5 mbar*L/second.

Abstract: An apparatus may include a superstrate. The superstrate may have a body with a first side, a second side opposite the first side, and a first diameter. The superstrate may also include a mesa on the first side of the body. The mesa may have a second diameter. The center point of the body can be different from the center point of the mesa.

Abstract: A fluid dispenser calibration system includes a fluid dispenser having a plurality of nozzles, a balance having a balance surface, and a mask positioned between the fluid dispenser and the balance surface. A nozzle pitch is a distance between two adjacent nozzles. The balance measures mass of fluid dispensed from a single nozzle and measures a change in mass on the balance surface. The balance surface has a linear dimension that is greater than the nozzle pitch. The mask includes an aperture and a catch region. The aperture allows fluid dispensed from the single nozzle to impact the balance surface. The catch region catches fluid dispensed from remaining nozzles in the plurality of nozzles.

Abstract: A fluid dispenser calibration system includes a fluid dispenser having a plurality of nozzles, a balance having a balance surface, and a mask positioned between the fluid dispenser and the balance surface. A nozzle pitch is a distance between two adjacent nozzles. The balance measures mass of fluid dispensed from a single nozzle and measures a change in mass on the balance surface. The balance surface has a linear dimension that is greater than the nozzle pitch. The mask includes an aperture and a catch region. The aperture allows fluid dispensed from the single nozzle to impact the balance surface. The catch region catches fluid dispensed from remaining nozzles in the plurality of nozzles.

Abstract: An apparatus and method for a dispenser with nozzles configured to eject lines of droplets of formable material onto a substrate in response to ejection signals. The fluid dispenser dispenses a first line of ejected droplets of formable material onto a first location on the substrate. A line camera generates camera signals that are representative of the first line of ejected droplets. The camera signals are analyzed to identify malfunctioning nozzles. The fluid dispenser dispenses a second line of ejected droplets of formable material onto a second location on the substrate that compensates for the one or more malfunctioning nozzles.

Abstract: A cap, a method of using a cap, and a system for using the cap. The cap is capable of being fitted to a bottle. The cap includes a transfer port; and a vent port. The vent port includes a membrane and a valve.

Abstract: A cap, a method of using a cap, and a system for using the cap. The cap is capable of being fitted to a bottle. The cap includes a transfer port; and a vent port. The vent port includes a membrane and a valve.

Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.

Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.

Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.

Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.

Abstract: The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array

Abstract: A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.

Abstract: Gas confinement systems and methods are described. In particular, systems and methods are described that include a barrier that confines purging gas and restricts flow of purging gas to other elements within a nano-lithography system. The barrier can be adjusted to accommodate and/or control desired pressure variations between working and external environments.

Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.

Abstract: Imprint lithography systems and methods for transporting and dispensing polymerizable material on a substrate are described. In one implementation, the transport system utilizes a dispense head, dispense guard, and a shielding block when dispensing the polymerizable material. In another implementation, the transport system comprises one or more filters positioned in an inline manifold for particle reduction or ion reduction.

Abstract: The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array

Abstract: The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array

Abstract: A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.