Abstract: A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.

Abstract: An electrode plate, configured to be coupled to an electrode in a plasma processing system, comprises a plurality of gas injection holes configured to receive gas injection devices. The electrode plate comprises three or more mounting holes, wherein the electrode plate is configured to be coupled with an electrode in the plasma processing system by aligning and coupling the three or more mounting holes with three or more mounting screws attached to the electrode.

Abstract: A plasma reactor including a process chamber, a holding structure constructed arranged to hold a plasma source assembly and a support structure constructed and arranged to support a chuck assembly. The holding structure at least partially constitutes a wall of said vacuum chamber. The support structure supporting or holding the chuck assembly can be coupled to a lift mechanism which can raise or lower the chuck assembly relative to the plasma source assembly. The lift mechanism can be disposed above or below the process chamber.

Abstract: A method and system are provided for monitoring erosion of system components in a plasma processing system. The system components contain a gas emitter that can release a sensor gas into a plasma process environment. The sensor gas can produce characteristic fluorescent light emission when exposed to a plasma. The method can evaluate erosion of system components in a plasma, by monitoring fluorescent light emission and a mass signal from the sensor gas. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners.

Abstract: An access assembly for a process chamber, including a wall segment constructed and arranged to access the process chamber, a mounting assembly constructed and arranged to couple the wall segment to the process chamber, and a sealing plate mounted to the process chamber. The sealing plate is constructed and arranged to isolate the wall segment from a volume inside the process chamber.

Abstract: A gas delivery system for a plasma apparatus including a first plate having a gas inlet, and a second plate having a plurality of holes. The second plate is coupled to the first plate and spaced apart from the second to form a plenum chamber. A baffle honeycomb core is disposed between the first plate and the second plate in side the plenum chamber. The honeycomb core can be comprised of one or more spaced apart honeycomb panels. A surface of one of the honeycomb panels or a surface of the first panel can be contoured to control the pressure distribution of a gas in the plenum chamber. The gas delivery assembly for a plasma apparatus also includes a first plate having a gas inlet and a second plate coupled to the first plate to form a plenum chamber therebetween. The second plate includes a gas injection plate having a plurality of holes. The gas injection plate has a contoured surface such that a length of each of the plurality of holes varies depending on location of the holes on the contoured surface.

Abstract: A toy vehicle has a tractor and trailer that is countable to the tractor. The tractor includes a tractor hitch assembly and an operating assembly for propelling the tractor in forward and reverse directions and for turning the tractor 360° in place. The trailer has a trailer body and a tongue extending therefrom with a trailer hitch assembly connected to the trailer tongue. The tractor and trailer hitch assemblies are arranged and countable together to enable relative pitch and roll between the tractor and trailer and rotation of the tractor under the trailer tongue at least on a flat surface.

Abstract: An etch profile tailoring system (100), for use with an etching process carried out on a wafer (130), has a scavenging plate (170) with a baseline etch profile, and at least one etch profile tuning structure (such as a plug) (160) replaceably disposed with respect to the scavenging plate (170) and configured to alter the baseline etch profile during the etching process so as to arrive at a desired etch profile. A method of performing maintenance on an etch profile tailoring system (100) involves the steps of performing an etching process on a wafer in accordance with a desired etch profile, determining whether or not maintenance should be performed, and (if the maintenance decision indicates that maintenance should be performed) replacing with a second plug before conducting an etching process on additional wafers.