Patents by Inventor Steven George Hansen
Steven George Hansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8786824Abstract: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; ranking the pixel groups according to how a change in state of a pixel group affects a lithographic metric; and for each pixel group in order of ranking, determining whether to adjust the illumination shape by changing the state of the pixel group based on a calculation of the lithographic metric as a result of a change in state of the pixel group.Type: GrantFiled: June 10, 2010Date of Patent: July 22, 2014Assignee: ASML Netherlands B.V.Inventor: Steven George Hansen
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Patent number: 8576377Abstract: A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.Type: GrantFiled: December 7, 2007Date of Patent: November 5, 2013Assignee: ASML Netherlands B.V.Inventors: Steven George Hansen, Heine Melle Mulder, Robert Kazinczi
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Publication number: 20130179847Abstract: Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.Type: ApplicationFiled: December 18, 2012Publication date: July 11, 2013Applicant: ASML NETHERLANDS B.V.Inventor: Steven George Hansen
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Publication number: 20130044302Abstract: A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.Type: ApplicationFiled: July 16, 2012Publication date: February 21, 2013Applicant: ASML Netherlands B.V.Inventors: Heine Melle MULDER, Steven George Hansen, Thijs Johan Henry Hollink
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Patent number: 8043797Abstract: A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase shift mask using a multipole illumination that includes an on-axis component and an off-axis component, the mask pattern including non-printing assist features configured for a pitch larger than twice a minimum pitch of the mask pattern, and projecting an image of the illuminated mask pattern onto the substrate.Type: GrantFiled: April 27, 2005Date of Patent: October 25, 2011Assignee: ASML Netherlands B.V.Inventor: Steven George Hansen
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Publication number: 20110244401Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.Type: ApplicationFiled: June 15, 2011Publication date: October 6, 2011Applicant: ASML Netherlands B.V.Inventors: Theodore A. PAXTON, Todd J. DAVIS, Todd D. HIAR, Cassandra May OWEN, Steven George HANSEN, James J. HUNTER
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Publication number: 20110228247Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.Type: ApplicationFiled: March 18, 2011Publication date: September 22, 2011Inventors: Heine Melle Mulder, Steven George Hansen, Johannes Catharinus Hubertus Mulkens, Markus Deguenther
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Patent number: 7981595Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.Type: GrantFiled: July 11, 2005Date of Patent: July 19, 2011Assignee: ASML Netherlands B.V.Inventors: Theodore A. Paxton, Todd J. Davis, Todd D. Hiar, Cassandra May Owen, Steven George Hansen, James J. Hunter
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Publication number: 20110139027Abstract: Improved low k1 lithographic imaging is disclosed by optimizing or improving an illumination polarization condition. The polarization condition may be a pre-defined spatially varying polarization, or a spatially customized local polarization of bright illumination points based on tracking a value of a desired lithographic response. Several non-traditional polarization conditions, e.g., TM/TE polarization (with or without a central TM region), diagonal polarization, and Y+X polarization (typically for dark field illumination) are disclosed, that offer substantial imaging advantages for specific lithographic problems, especially at low k1 values. The initial polarization definition may be limited to specific fixed polarization angles.Type: ApplicationFiled: November 22, 2010Publication date: June 16, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Steven George HANSEN
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Patent number: 7906270Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.Type: GrantFiled: March 23, 2005Date of Patent: March 15, 2011Assignee: ASML Netherlands B.V.Inventors: Theodore A Paxton, Todd J Davis, Todd D. Hiar, Cassandra May Owen, Steven George Hansen
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Patent number: 7898644Abstract: By proper selection of illumination configuration, mask transmission, and mask bias, complex patterns of contact holes may be imaged with sufficient latitude for manufacturing at minimum half-pitches of k1=0.40 or below. In an embodiment, a method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The method includes illuminating a mask pattern of an attenuated phase shift mask with an illumination configuration including on-axis and off-axis components, the off-axis component of the illumination being an annular illumination extending near a pupil edge, and projecting an image of the illuminated mask pattern onto the substrate.Type: GrantFiled: March 31, 2008Date of Patent: March 1, 2011Assignee: ASML Netherlands B.V.Inventor: Steven George Hansen
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Publication number: 20100315614Abstract: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; ranking the pixel groups according to how a change in state of a pixel group affects a lithographic metric; and for each pixel group in order of ranking, determining whether to adjust the illumination shape by changing the state of the pixel group based on a calculation of the lithographic metric as a result of a change in state of the pixel group.Type: ApplicationFiled: June 10, 2010Publication date: December 16, 2010Applicant: ASML Netherlands B.V.Inventor: Steven George Hansen
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Patent number: 7781149Abstract: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.Type: GrantFiled: March 23, 2006Date of Patent: August 24, 2010Assignee: ASML Netherlands B.V.Inventors: Theodore Allen Paxton, Steven George Hansen, Cassandra May Owen, Todd J. Davis, Todd David Hiar, James J Hunter
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Patent number: 7684013Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.Type: GrantFiled: May 18, 2006Date of Patent: March 23, 2010Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Steven George Hansen, Donis George Flagello, Wolfgang Singer, Bernd Peter Geh, Vladan Blahnik
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Patent number: 7528934Abstract: A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto the substrate at a plurality of positions spaced apart from a reference plane that substantially coincides with or is substantially parallel to a surface of the substrate.Type: GrantFiled: September 28, 2005Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventor: Steven George Hansen
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Patent number: 7471375Abstract: A method for configuring the optical transfer of a patterning device pattern onto a substrate with a lithographic apparatus is presented. The method includes adjusting an intensity of a first illumination shape relative to a second illumination shape, the first and the second illumination shapes defining respectively a first illumination area and a second illumination area within a pupil plane of an illumination system of the lithographic apparatus, while maintaining the first and second illumination areas substantially constant, and illuminating the patterning device pattern with the first and second illumination shapes.Type: GrantFiled: February 14, 2006Date of Patent: December 30, 2008Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Luis Alberto Colina Santamaria Colina, Steven George Hansen
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Publication number: 20080186468Abstract: A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.Type: ApplicationFiled: December 7, 2007Publication date: August 7, 2008Applicant: ASML Netherlands B.V.Inventors: Steven George Hansen, Heine Melle Mulder, Robert Kazinczi
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Publication number: 20080158529Abstract: A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.Type: ApplicationFiled: May 2, 2007Publication date: July 3, 2008Applicant: ASML Netherlands B.V.Inventor: Steven George Hansen
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Patent number: 7256873Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.Type: GrantFiled: January 28, 2004Date of Patent: August 14, 2007Assignee: ASML Netherlands B.V.Inventors: Jozef Maria Finders, Donis George Flagello, Steven George Hansen
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Patent number: 7245356Abstract: A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.Type: GrantFiled: November 17, 2005Date of Patent: July 17, 2007Assignee: ASML Netherlands B.V.Inventor: Steven George Hansen