Abstract: An improved method of photoresist removal is disclosed in which a treating solution of ozone and bicarbonate or other suitable radical scavengers is used to treat a substrate for use in an electronic device. The method is particularly well suited to photoresist removal where certain metals such as aluminum, copper and oxides thereof are present on the surface of the substrate. The method is also well suited to the removal of other organic materials as well.

Abstract: A system for increasing the quantity of a gas, e.g., ozone, dissolved in a liquid, e.g., ultrapure deionized water, is provided. Generally, the system provided by the present invention includes a pressurized vessel and an outlet coupled to the pressurized vessel adapted to dispense a stream of the admixture including the liquid and the dissolved gas under sufficiently gentle conditions such that the dispensed admixture comprises an increased quantity of dissolved gas relative to admixture produced and dispensed by conventional methods. Thus, the system of the present invention is able to provide, e.g., ozonated water, continuously, efficiently and without cooling, and thus provides a simple, cost efficient system capable of producing high concentration ozonated water.