Abstract: Polyurethane foams are made by curing a reaction mixture that contains an aromatic polyisocyanate, at least one isocyanate-reactive material having an average functionality of at least 2 and an equivalent weight of at least 200 per isocyanate-reactive group, at least one blowing agent, at least one surfactant and at least one catalyst, at least one acetoacetate ester or amide and at least one aminoalcohol or alkylhydroxylamine. Foams so produced emit low levels of formaldehyde, acetaldehyde and propionaldehyde.

Abstract: A method for automatically detecting the data type of data in a column includes receiving a request to import data into a base and determining the data type of the column by applying a set of inferrers to the column. In response to an inferrer returning true, the method selects the data type corresponding to the inferrer as the data type of the column and casts the data in the column to the selected type. A method for importing, converting, and presenting data based on data loss metrics includes receiving a request to import data into a database and determining data loss metrics for each of a set of data types. A user interface is configured to display some of the data types in conjunction with data loss metrics. The method further includes receiving a selection of one of the data types and casting the data to the selected type.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: Polyurethane foams are made by curing a reaction mixture that contains an aromatic polyisocyanate, at least one isocyanate-reactive material having an average functionality of at least 2 and an equivalent weight of at least 200 per isocyanate-reactive group, at least one blowing agent, at least one surfactant and at least one catalyst, at least one acetoacetate ester or amide and at least one aminoalcohol or alkylhydroxylamine. Foams so produced emit low levels of formaldehyde, acetaldehyde and propionaldehyde.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: Various embodiments provide semiconductor devices and fabrication methods. In an exemplary method, a dielectric layer can be formed on a semiconductor substrate. A plurality of pillar structures having a matrix arrangement can be formed on the dielectric layer. A plurality of sidewall spacers can be formed on the dielectric layer. Each sidewall spacer can be formed on a sidewall surface of one of the plurality of pillar structures. A distance between adjacent pillar structures in a same row or in a same column can be less than or equal to a double of a thickness of the each sidewall spacer on the sidewall surface. The plurality of pillar structures can be removed. The dielectric layer can be etched using the plurality of sidewall spacers as an etch mask to form a plurality of trenches or through holes in the dielectric layer.

Abstract: A method of fabricating a miniaturized semiconductor or other such device takes advantage of a self-reorganization characteristic of an in-situ dissociable diblock copolymer to form a circular via hole that is centrally disposed relative to other device features. In one embodiment, the method is used to form a dual damascene structure. During formation of the dual damascene structure, due to the self-reorganization characteristics of the monomer constituents of the diblock copolymer, the position of the via hole can be ensured to be self aligned with the position of the trench, thus improving the performance and yield of the so formed semiconductor devices, and lowering fabrication costs.

Abstract: The present invention provides stabilized cream formulations of oxymetazoline and uses thereof. The present invention also provides a method of treating facial erythema associated with rosacea in a patient in need of such treatment, comprising topically administering once or twice daily to the site of erythema on the face of the patient a pharmaceutical composition comprising 0.5%, 1.0% or 1.5% oxymetazoline or a pharmaceutically acceptable salt thereof as the sole active ingredient.

Abstract: Local interconnect structures and fabrication methods are provided. A dielectric layer can be formed on a semiconductor substrate. A first film layer can be patterned on the dielectric layer to define a region surrounded by a local interconnect structure to be formed. A sidewall spacer can be formed and patterned surrounding the first film layer on an exposed surface portion of the dielectric layer. A second film layer can be formed on the exposed surface portion of the dielectric layer and can have a top surface substantially flushed with a top surface of the sidewall spacer. The patterned sidewall spacer can be removed to form a first opening. After forming the first opening, the dielectric layer can be etched to form a second opening through the dielectric layer. The second opening can be filled with a conductive material to form the local interconnect structure.

Abstract: A method is provided for fabricating a semiconductor structure. The method includes providing a to-be-etched layer; and forming a hard mask layer on the to-be-etched layer. The method also includes forming a photoresist layer on the hard mask layer; and forming a patterned photoresist layer having openings exposing the hard mask layer by exposing and developing the photoresist layer. Further, the method includes forming sidewall spacers on side surfaces of the openings; and forming a patterned hard mask layer by etching the hard mask layer using the patterned photoresist layer and the sidewall spacers as an etching mask such that patterns in the hard mask layer have a substantially right angle at edge. Further, the method also includes forming to-be-etched patterns by etching the to-be-etched layer based on the patterned hard mask layer.

Abstract: A semiconductor device and method of fabricating the device are provided, the method including providing an insulating layer, wherein the insulating layer covers an active region and a gate of at least one semiconductor device; forming connection holes to the active region in the insulating layer to expose at least part of the active region, wherein the connection holes include a first portion of a first width and a second portion of a second width, the first portion of the connection holes being adjacent to the active region, and the first width being less than the second width; filling the connection holes with a metal material to form the contacts to the active region. As such, contacts formed for the active region also include a first portion of a first width and a second portion of a second width.