Abstract: Disclosed is a blood-brain barrier vascular network implemented in a microfluidic chip. The blood-brain bather vascular network structure (BBB on a chip) (in vitro blood-brain bather (BBB)-on-a chip) formed in a microfluidic chip manufactured by a present manufacturing method of the in vitro blood-brain barrier (BBB)-on-a chip may reconstruct the blood-brain barrier in a real human body more similarly due to a specific cell configuration, compared to the conventional in vitro blood-brain barrier (BBB)-on-a chip, and thus may be used as a more accurate in vitro blood-brain barrier, and may be used for the development of various cellular therapeutic agents or drugs that work in the treatment of various brain diseases.

Abstract: Disclosed is a blood-brain barrier vascular network implemented in a microfluidic chip. The blood-brain bather vascular network structure (BBB on a chip) (in vitro blood-brain bather (BBB)-on-a chip) formed in a microfluidic chip manufactured by a present manufacturing method of the in vitro blood-brain barrier (BBB)-on-a chip may reconstruct the blood-brain barrier in a real human body more similarly due to a specific cell configuration, compared to the conventional in vitro blood-brain barrier (BBB)-on-a chip, and thus may be used as a more accurate in vitro blood-brain barrier, and may be used for the development of various cellular therapeutic agents or drugs that work in the treatment of various brain diseases.

Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.

Abstract: An image sensing device includes an image sensor including a first sub-pixel array and a second sub-pixel array. The first sub-pixel array includes a plurality of first pixels having a first color filter, and the second sub-pixel array includes a plurality of second pixels having a second color filter and a plurality of third pixels for phase detection. The image sensor may generate first pixel values from the first pixels, second pixel values from the second pixels and third pixel values from the third pixels. The image sensing device also includes an image processor suitable for generating a first image value corresponding to the first sub-pixel array based on the first pixel values and generating a second image value corresponding to the second sub-pixel array based on the first to third pixel values.

Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.

Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.

Abstract: An image sensing device includes an image sensor including a first sub-pixel array and a second sub-pixel array. The first sub-pixel array includes a plurality of first pixels having a first color filter, and the second sub-pixel array includes a plurality of second pixels having a second color filter and a plurality of third pixels for phase detection. The image sensor may generate first pixel values from the first pixels, second pixel values from the second pixels and third pixel values from the third pixels. The image sensing device also includes an image processor suitable for generating a first image value corresponding to the first sub-pixel array based on the first pixel values and generating a second image value corresponding to the second sub-pixel array based on the first to third pixel values.

Abstract: Provided are a rotatable display device and a method of displaying content using the same. The display device includes a display; and a controller configured to control the display to display first video content based on a first source, sense pivoting of the display while the first video content is displayed, and control the display, in response to the pivoting, to display second video content based on at least one second source different from the first source, the second video content being different from the first video content.

Abstract: In a method of manufacturing a semiconductor device, a mask layer and a first layer may be sequentially formed on a substrate. The first layer may be patterned by a photolithography process to form a first pattern. A silicon oxide layer may be formed on the first pattern. A coating pattern including silicon may be formed on the silicon oxide layer. The mask layer may be etched using a second pattern as an etching mask to form a mask pattern, and the second pattern may includes the first pattern, the silicon oxide layer and the coating pattern. The mask pattern may have a uniform size.

Abstract: A method of manufacturing a semiconductor device, including forming an etching target film on a substrate; forming an anti-reflection film on the etching target film; forming a photoresist film on the anti-reflection film; exposing the photoresist film; performing heat treatment on the anti-reflection film and the photoresist film to form a covalent bond between the anti-reflection film and the photoresist film; and developing the photoresist film.

Abstract: A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.

Abstract: In a method of manufacturing a semiconductor device, a mask layer and a first layer may be sequentially formed on a substrate. The first layer may be patterned by a photolithography process to form a first pattern. A silicon oxide layer may be formed on the first pattern. A coating pattern including silicon may be formed on the silicon oxide layer. The mask layer may be etched using a second pattern as an etching mask to form a mask pattern, and the second pattern may includes the first pattern, the silicon oxide layer and the coating pattern. The mask pattern may have a uniform size.

Abstract: A method of manufacturing a semiconductor device, including forming an etching target film on a substrate; forming an anti-reflection film on the etching target film; forming a photoresist film on the anti-reflection film; exposing the photoresist film; performing heat treatment on the anti-reflection film and the photoresist film to form a covalent bond between the anti-reflection film and the photoresist film; and developing the photoresist film.

Abstract: A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.

Abstract: The inventive concept provides methods of manufacturing semiconductor devices having a fine pattern. In some embodiments, the methods comprise forming an etch-target film on a substrate, forming a first mask pattern on the etch-target film, forming a second mask pattern by performing an ion implantation process in the first mask pattern, and etching the etch-target film using the second mask pattern.

Abstract: The inventive concept provides methods of manufacturing semiconductor devices having a fine pattern. In some embodiments, the methods comprise forming an etch-target film on a substrate, forming a first mask pattern on the etch-target film, forming a second mask pattern by performing an ion implantation process in the first mask pattern, and etching the etch-target film using the second mask pattern.

Abstract: A method of manufacturing an inkjet printhead, in which a solvent included in a positive photoresist composition or in a non-photosensitive soluble polymer composition which is used to form a sacrificial layer has a different polarity from that of a solvent included in a negative photoresist composition that is used to form at least one of a channel forming layer and a nozzle layer.

Abstract: A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.