Abstract: The present disclosure relates to a metal thin film substrate including: a glass substrate; a pressure-sensitive adhesive layer formed on one surface of the glass substrate; and a metal layer formed on one surface of the pressure-sensitive adhesive layer, wherein the pressure-sensitive adhesive layer contains a silicone-based pressure-sensitive adhesive, a transparent display including the same, a method for patterning the metal thin film substrate, and a method for manufacturing the transparent display.

Abstract: A damper for a vehicle seat includes a vibrating mass member assembly including a vibrating mass member and a fixing member protruding from a side of the vibrating mass member, a guide bush accommodating the fixing member therein, coupled to each of the both sides of the vibrating mass member, and guiding the vibrating mass member to move in all directions, and a mounting bracket having an insertion hole into which the guide bush is inserted and fixedly formed on the vehicle seat. The damper may include an additional fixing member protruding from another side of the vibrating mass member, such that the fixing member and the additional fixing member protrude from both sides of the vibrating mass member.

Abstract: A method for manufacturing a semiconductor device and a semiconductor device produced thereby. For example and without limitation, various aspects of this disclosure provide methods for manufacturing a semiconductor device, and semiconductor devices produced thereby, that comprise forming an interposer including a reinforcement layer.

Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.

Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.

Abstract: Disclosed is a PVD ceramic thin film-coated cutting insert properly usable for machining a hard-to-cut material such as inconel or titanium having low thermal conductivity. The cutting insert for hard-to-cut materials includes a cemented carbide base material having an SMS value of 50-80% obtained by [Formula 1] below, and a ceramic thin film formed on the cemented carbide base material and having a thickness of about 0.4-1.5 ?m. [Formula 1]: SMS=Saturation magnetization value of sintered body×100/TMS, where TMS=2010×Mass ratio of Co.

Abstract: A semiconductor device test system and a semiconductor device test method are provided. The system includes a device under test (DUT) which provides an output voltage to a load connected to an output terminal, automatic test equipment (ATE) which supplies power to the DUT and measures the output voltage of the DUT, and a current mirror which is connected between the ATE and the DUT. The ATE outputs a reference current to the current mirror, and the DUT provides an output current to the current mirror. The output current is obtained by mirroring the reference current from the ATE.

Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.

Abstract: The present invention relates to a cutting tool, which performs, like a drill or a ball end mill, cutting while rotating in a state in which the center of the tip end is in contact with a work material, and includes a wear-resistant layer formed at the tip end thereof, wherein a portion of the wear-resistant layer is selectively removed through tip end polishing from the center of the tip end of the drill or the ball end mill to a predetermined area, so as to restrain micro-brittle wear generated in an ultra-low speed region, and thus remarkably improving the cutting lifespan of the cutting tool such as the drill or the ball end mill.

Abstract: Disclosed is a PVD ceramic thin film-coated cutting insert properly usable for machining a hard-to-cut material such as inconel or titanium having low thermal conductivity. The cutting insert for hard-to-cut materials includes a cemented carbide base material having an SMS value of 50-80% obtained by [Formula 1] below, and a ceramic thin film formed on the cemented carbide base material and having a thickness of about 0.4-1.5 ?m. [Formula 1]: SMS=Saturation magnetization value of sintered body×100/TMS, where TMS=2010×Mass ratio of Co.

Abstract: A cemented carbide comprises particles including a tungsten carbide (WC) as a main component; a binder phase including cobalt (Co) as a main component; and particles including a carbide or a carbonitride of at least one selected from the group consisting of Group 4a, 5a, and 6a elements, or a solid solution thereof, wherein a cubic phase free layer (CFL), in which the carbide or the carbonitride is not formed, is formed from a surface of the cemented carbide to a depth of 5 ?m to 50 ?m.

Abstract: A cutting tool comprises a base material which includes particles including a tungsten carbide (WC) as a main component, a binder phase including cobalt (Co) as a main component, and particles including a carbide or a carbonitride of at least one selected from the group consisting of Group 4a, 5a, and 6a elements, or a solid solution thereof; and a hard film formed on the base material, wherein the hard film comprises at least an alumina layer, a cubic phase free layer (CFL), in which the carbide or the carbonitride is not formed, is formed from a surface of the base material to a depth of 10 ?m to 50 ?m, and a Co content of a surface of the CFL is 80% or more of a maximum Co content of the CFL.

Abstract: Disclosed is a motor comprising a stator and a rotor, wherein the rotor comprises a plurality of rotor cores and a plurality of magnets, and wherein the magnet is configured to have a face facing the center of rotation of the rotor exposed. Accordingly, a motor may minimize a non-magnetization area and enable a magnet to be fully magnetized, when it comes to post magnetization of the magnet.

Abstract: A semiconductor device test system and a semiconductor device test method are provided. The system includes a device under test (DUT) which provides an output voltage to a load connected to an output terminal, automatic test equipment (ATE) which supplies power to the DUT and measures the output voltage of the DUT, and a current mirror which is connected between the ATE and the DUT. The ATE outputs a reference current to the current mirror, and the DUT provides an output current to the current mirror. The output current is obtained by mirroring the reference current from the ATE.

Abstract: A motor that includes a stator having an improved structure is provided. The motor includes a stator that includes stator cores wound with a coil, a rotor disposed in the stator and configured to interact with the stator and to rotate, a shaft mounted on the rotor and configured to rotate with the rotor, a printed circuit board (PCB) electrically connected to the coil, an insulator formed of an insulating material and mounted on the stator, and a terminal pin mounted on the insulator to connect the coil with the PCB. A terminal pin accommodating portion that protrudes in an extension direction of the shaft is provided in one side of the insulator and the terminal pin is accommodated in the terminal pin accommodating portion.

Abstract: Disclosed is a hard coating film formed on a hard base material such as cemented carbide. The hard coating film has a nanoscale multilayered structure to have improved oxidation resistance and wear resistance. The hard coating film is a hard coating film formed on the base material. The first layer is composed of a TiAl nitride having a composition of Ti1-aAla (0.3?a?0.7), and the second layer has a nanoscale multilayered structure or a structure in which the nanoscale multilayered structure is repeatedly laminated at least two times, the nanoscale multilayered structure including a thin layer A composed of an AlTiSi nitride, a thin layer B, a thin layer C composed of a AlCr nitride, and a thin layer D having thicknesses of 3 nm to 20 nm. The thin film B and the thin film D are composed of a TiAl nitride.

Abstract: A cutting tool comprises a base material which includes particles including a tungsten carbide (WC) as a main component, a binder phase including cobalt (Co) as a main component, and particles including a carbide or a carbonitride of at least one selected from the group consisting of Group 4a, 5a, and 6a elements, or a solid solution thereof; and a hard film formed on the base material, wherein the hard film comprises at least an alumina layer, a cubic phase free layer (CFL), in which the carbide or the carbonitride is not formed, is formed from a surface of the base material to a depth of 10 ?m to 50 ?m, and a Co content of a surface of the CFL is 80% or more of a maximum Co content of the CFL.

Abstract: A cemented carbide comprises particles including a tungsten carbide (WC) as a main component; a binder phase including cobalt (Co) as a main component; and particles including a carbide or a carbonitride of at least one selected from the group consisting of Group 4a, 5a, and 6a elements, or a solid solution thereof, wherein a cubic phase free layer (CFL), in which the carbide or the carbonitride is not formed, is formed from a surface of the cemented carbide to a depth of 5 ?m to 50 ?m.

Abstract: A motor apparatus having a high efficiency and reducing manufacturing cost by using a cost effective ferrite permanent magnet includes a rotatable shaft, a fan connected to one side of the shaft to generate a flow of air, a stator including stator cores arranged in a circumferential direction, and a coil wound around the stator core, and a rotor disposed at an inside of the stator and provided in a form of a cylinder having a passage allowing the shaft to pass through the rotor includes a rotor core provided with a protrusion structure and one or more ferrite magnets coupled to the rotor core to provide a magnetic force. By using a ferrite magnet, when compared to a conventional universal motor, a superior efficiency is obtained, and when compared to a BLDC motor using a Nd magnet, a low cost BLDC motor is implemented.

Abstract: Disclosed is an alpha alumina (?-Al2O3) thin film comprising the lower layer formed on the base material made from cemented carbide; and the ?-Al2O3 thin film layer formed on the lower layer, wherein when the ?-Al2O3 thin film layer is divided, from the total thickness (T) thereof, into a D1 layer which is from an interface layer to 0.15T, a D2 layer which is from 0.15T to 0.4T, and a D3 layer which is from 0.4T to 1T, an S1 (D3 layer grain size/D1 layer grain size) is 2-5.5 and an S2 (D2 layer grain size/D1 layer grain size) is 1.5-4.