Susumu Goto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
Abstract: This invention is to provide an electron beam exposure apparatus and electron lens which realize high resolution and high throughput simultaneously. In an electron beam exposure apparatus for irradiating a mask having a transfer pattern with an electron beam and projecting and transferring the pattern onto a substrate using an electron projecting lens, the electron projecting lens has a magnetic doublet lens. Each of the front- and rear-side electromagnetic lens sections of the magnetic doublet lens is constructed by a non-rotational lens. In each electromagnetic lens section, the non-rotational lens is constructed by a pair of electromagnetic lenses having symmetrical shapes.
Abstract: This invention provides an electron beam projection exposure apparatus which can obtain a large irradiation width while maintaining an electron beam intensity required for exposure. An electron beam emitted by an electron gun (1) is transmitted through a condenser lens (2) and field lens (3), and illuminates a mask (4). The electron beam transmitted through the mask (4) is imaged and irradiated onto a wafer (7) via reduction projection lenses (5, 6), thus forming a pattern on the mask (4) on the wafer (7) by exposure. The electron gun (1) has an electron source, an electron emission surface of which has a circularly recessed central portion, and a ring-shaped electron beam emitted by the peripheral portion of the electron emission surface is used in exposure.
Abstract: The position of an alignment mark is accurately detected independently of distortion of the sectional structure of the alignment mark or the coating state of a resist that covers the alignment mark. This invention provides a position detection apparatus for detecting the position of an alignment mark formed on an object using an electron beam, which has an element electron optical system array (3) for irradiating electron beams onto the object in a matrix, and a deflector (6) for deflecting the plurality of electron beams. The deflector (6) scans the plurality of electron beams on the alignment mark, a reflected electron detector (9) synthesizes and detects reflected electrons or secondary electrons from the alignment mark upon scanning, and the position of the alignment mark is determined on the basis of the displacement amount of the electron beams and the detection result.
Abstract: A beam coordinate system decided by a plurality of beam reference positions and a deflection coordinate system decided by a deflector in a multi-electron beam exposure apparatus are made to coincide in a highly precise fashion and exposure is performed upon rapidly correcting a change in the offset between the two coordinate systems with the passage of time. The apparatus has an adjusting unit for adjusting an XY stage or a deflector based upon a first parameter representing the relationship between the beam coordinate system, which is decided by the plurality of beam reference positions, and the design coordinate system, and a second parameter representing the relationship between the deflection coordinate system, which is decided by the deflector, and the design coordinate system.
Abstract: An apparatus for automatically assembling an inner rotor and an outer rotor substantially applied to an inscribe-type gear pump. Described is the construction and the function of the apparatus for incorporating inner rotors into outer rotors in such a manner that a holding pin which is pressed into a central hole of inner rotor descends together with the inner rotor until the accompanying inner rotor is filled into outer rotor. While the holding pin is lowered together with inner rotor, it is rotated so that gear portions of both rotors can be aligned properly and engage.
Abstract: An alignment system for aligning a mask and a wafer each having an alignment mark, includes an irradiation system for irradiating the alignment marks of the mask and the wafer with an electron beam, a detecting system for detecting the amount of electron beam absorbed by the alignment marks, and an adjusting system for adjusting a relative position of the mask and the wafer, in accordance with the detection, so as to bring the mask and the wafer into a predetermined positional relation.
Abstract: An alignment device including an electron gun for emitting an electron beam, a deflecting electrode for scanningly deflecting the electron beam emitted from the electron gun, a holder for holding an object in a plane of scan, a reference mark with which the object is to be aligned, and a detector for detecting electron beams emerging from the reference mark and the object, which are irradiated by the scanning electron beam, to detect the position of each of the reference mark and the object. On the basis of result of detection by the detector, the object is displaced by a drive source, whereby it is precisely aligned with the reference mark.
Abstract: A polyamide composition comprised of a mixture of 65-95% by weight of polyamide and 35-5% by weight of a copolymer of ethylene series containing unsaturated carboxylic acid components, the mixture having incorporated thereto 0.1-5% by weight of a carbonate compound such as ethylene carbonate or an epoxy compound such as butyl glycidyl ether. This composition is excellent in impact-strength and is thus suitable for use in interior or exterior parts of automobiles and housing materials.