Patents by Inventor Susumu Ueno

Susumu Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

Method for reactivating sulfonated resin catalyst

Publication number: 20030224925

Abstract: A sulfonated resin catalyst whose activity has lowered as a result of use in the polymerization of silicone oil is reactivated by washing the catalyst with a low molecular weight siloxane medium, volatilizing off the siloxane medium under atmospheric or reduced pressure, and removing water from the catalyst.

Type: Application

Filed: May 30, 2003

Publication date: December 4, 2003

Inventors: Hiroshi Nakayama, Masao Maruyama, Hiromi Nakabayashi, Susumu Ueno
Conductive silicon composite, preparation thereof, and negative electrode material for non-aqueous electrolyte secondary cell

Publication number: 20030215711

Abstract: A conductive silicon composite in which particles of the structure that silicon crystallites are dispersed in silicon dioxide are coated on their surfaces with carbon affords satisfactory cycle performance when used as the negative electrode material in a non-aqueous electrolyte secondary cell.

Type: Application

Filed: September 19, 2002

Publication date: November 20, 2003

Inventors: Mikio Aramata, Satoru Miyawaki, Susumu Ueno, Hirofumi Fukuoka, Kazuma Momii
Purification of silicone oil

Publication number: 20030212286

Abstract: An unpurified silicone oil is treated with fibrous activated carbon, yielding a silicone oil of high purity, which will find use in the electric and electronic industry and as cosmetics.

Type: Application

Filed: May 13, 2003

Publication date: November 13, 2003

Inventors: Hiroshi Nakayama, Masao Maruyama, Hiromi Nakabayashi, Susumu Ueno
Preparation of organohalosilanes

Publication number: 20030199705

Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.

Type: Application

Filed: April 23, 2003

Publication date: October 23, 2003

Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
Preparation of diorganodichlorosilane

Patent number: 6632956

Abstract: A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlCl3 or AlBr3 and a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlCl3 or the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.

Type: Grant

Filed: August 15, 2002

Date of Patent: October 14, 2003

Assignee: Shin-Etsu Chemical Co., Ltd.

Inventors: Akihito Tsukuno, Hiroyuki Kobayashi, Yukinori Satoh, Hideaki Ozeki, Yoshihiro Shirota, Susumu Ueno
Preparation of organopolysiloxanes

Publication number: 20030153711

Abstract: For the preparation of organopolysiloxanes, water glass diluted with water to a concentration of 3 to 15 wt % is reacted with a triorganohalosilane in the presence of an acid and an oxygen-containing solvent such as isobutyl alcohol, methyl isobutyl ketone or 1-pentanol. The invention achieves a considerable reduction of the environmental load, an improved utilization of reactants, an improved yield, and a cost reduction, and enables production of low viscosity MQ resins.

Type: Application

Filed: January 23, 2003

Publication date: August 14, 2003

Inventors: Kiyoyuki Mutoh, Yasuhito Mohara, Susumu Ueno
Electrostatic image developer

Publication number: 20030138716

Abstract: By simultaneously atomizing a siloxane and two organometallic compounds of different metals M1 and M2 exclusive of silicon in a flame for combustion, spherical amorphous ternary complex oxide fine particles are obtained which are substantially free of chlorine, have a particle size of 10-500 nm, and have a silica content A of 1-99 wt %, a M1 oxide content B of 1-90 wt % and a M2 oxide content C of 1-90 wt %, all based on the weight of oxides excluding carbon, provided that A+B+C≈100. An electrostatic image developer comprising the fine particles is improved in fluidity and cleanability and bears a uniform and stable quantity of electric charge.

Type: Application

Filed: November 19, 2002

Publication date: July 24, 2003

Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
Conductive silicon oxide powder, preparation thereof, and negative electrode material for non-aqueous electrolyte secondary cell

Publication number: 20030118905

Abstract: A conductive silicon oxide powder in which particles of silicon oxide having the formula: SiOx wherein 1≦x<1.6 are covered on their surfaces with a conductive carbon coating by chemical vapor deposition treatment is useful as a negative electrode active material to construct a lithium ion secondary cell having a high capacity and improved cycle performance.

Type: Application

Filed: September 9, 2002

Publication date: June 26, 2003

Inventors: Hirofumi Fukuoka, Satoru Miyawaki, Kazuma Momii, Mikio Aramata, Susumu Ueno
Preparation of diorganodichlorosilane

Publication number: 20030109735

Abstract: A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlCl3 or AlBr3 and a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlCl3 or the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.

Type: Application

Filed: August 15, 2002

Publication date: June 12, 2003

Inventors: Akihito Tsukuno, Hiroyuki Kobayashi, Yukinori Satoh, Hideaki Ozeki, Yoshihiro Shirota, Susumu Ueno
Hydrophobic silica fine powder and making method

Publication number: 20030103890

Abstract: A hydrophobic silica fine powder is prepared by premixing a hydrophilic silica fine powder with a dimer diol siloxane or cyclic siloxane as a hydrophobizing agent, mixing them in a ball mill for achieving dispersion and for achieving cleavage or disintegration and consolidation, and thereafter heating at 100-300° C. in an ammonia or amine-containing atmosphere. The powder has an aerated bulk density of 100-300 g/l, a specific surface area of 40-300 m2/g, a primary particle diameter of 10-120 nm, and a degree of hydrophobization of 40-80 as measured by methanol titration and is less bulky, easy to handle and disperse and stable in a kneaded mixture.

Type: Application

Filed: November 27, 2002

Publication date: June 5, 2003

Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
Spherical particles of silica-containing compound oxide and method of production

Publication number: 20030086855

Abstract: By using a halogen-free siloxane and an organometallic compound containing at least one metal other than silicon as feed stocks, and simultaneously atomizing and burning them in a flame, spherical particles of silica-containing compound oxide are prepared which are substantially halogen-free, consist of 0.5-99% by weight of metal oxides and the balance of silica, and have a particle size of 10 nm to 3 &mgr;m. The particles are useful as a filler in epoxy resin base semiconductor sealants, a refractive index modifier or the like.

Type: Application

Filed: July 23, 2002

Publication date: May 8, 2003

Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
Spherical silica particles and method of production

Patent number: 6551567

Abstract: Spherical, non-crystalline silica particles made by burning a non-halogenated siloxane starting material are substantially halogen-free, and have a content of metallic impurities other than silicon of not more than 1 ppm, a particle size of 10 nm to 10 &mgr;m and a specific surface area of 3-300 m2/g. Production of the particles is carried out by oxidative combustion of the non-halogenated siloxane in a flame at a high adiabatic flame temperature to effect the formation of a large number of core particles and promote their coalescence and growth.

Type: Grant

Filed: August 15, 2001

Date of Patent: April 22, 2003

Assignee: Shin-Etsu Chemical Co., Ltd.

Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
Electrostatic image developer

Publication number: 20030059700

Abstract: By atomizing a siloxane and an organic titanium compound for flame combustion, spherical complex oxide fine particles of amorphous silica-titania are obtained having a particle size of 10-300 nm, a specific surface area of 10-100 m2/g, and a titania content of 1-99% by weight. By hydrophobizing the fine particles and adding them to a toner, a developer is obtained which is improved in fluidity, cleanability and uniform and stable charging.

Type: Application

Filed: June 26, 2002

Publication date: March 27, 2003

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
Preparation of organohalosilanes

Publication number: 20030055277

Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.

Type: Application

Filed: August 29, 2002

Publication date: March 20, 2003

Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
Lithium-containing silicon oxide powder and making method

Publication number: 20030053945

Abstract: A lithium ion secondary cell having a high capacity, improved first charge/discharge efficiency and improved cycle performance is obtainable using as the negative electrode material a lithium-containing silicon oxide powder having the formula: SiLixOy wherein x and y are 0<x<1.0 and 0<y<1.5, with the lithium being fused and partially crystallized.

Type: Application

Filed: September 5, 2002

Publication date: March 20, 2003

Inventors: Hirofumi Fukuoka, Satoru Miyawaki, Mikio Aramata, Susumu Ueno, Kazuma Momii, Takeshi Fukuda
Electrostatic image developer

Publication number: 20030044706

Abstract: By atomizing a siloxane and an organic titanium compound for flame combustion, spherical complex oxide fine particles of amorphous silica-titania are obtained having a particle size of 10-300 nm, a specific surface area of 20-100 m2/g, and a titania content of 1-99% by weight. By hydrophobizing the fine particles and adding them to a toner, a developer is obtained which is improved in fluidity, cleanability and uniform and stable charging.

Type: Application

Filed: March 29, 2002

Publication date: March 6, 2003

Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
Preparation of organohalosilanes

Patent number: 6506923

Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.

Type: Grant

Filed: February 14, 2002

Date of Patent: January 14, 2003

Assignee: Shin-Etsu Chemical Co., Ltd.

Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka
Co-catalyst and process for the preparation of organohalosilanes

Publication number: 20020183536

Abstract: In a Rochow process, organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst and a co-catalyst. The invention uses as the co-catalyst a powder of co-catalyst active element-copper alloy containing substantial strain energy because this co-catalyst can reduce the activation time taken until a steady state is reached, which has been an outstanding problem in Rochow reaction, maintain the steady state over time and increase the selectivity of desired diorganodihalosilane for eventually increasing the yield based on the starting silicon.

Type: Application

Filed: April 10, 2002

Publication date: December 5, 2002

Inventors: Mikio Aramata, Hideaki Ozeki, Akio Muraida, Susumu Ueno, Toshio Shinohara, Tetsuya Inukai
Silicon oxide powder and making method

Publication number: 20020159941

Abstract: A silicon oxide powder represented by the formula: SiOx wherein 1.05≦x≦1.5 and having a BET specific surface area of 5-300 m2/g is useful as a negative electrode material to construct a lithium ion secondary cell having a high capacity and improved cycle performance.

Type: Application

Filed: February 26, 2002

Publication date: October 31, 2002

Inventors: Hirofumi Fukuoka, Satoru Miyawaki, Kenji Ooka, Susumu Ueno, Mikio Aramata, Takeshi Fukuda
Preparation of organohalosilanes

Publication number: 20020156310

Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.

Type: Application

Filed: February 14, 2002

Publication date: October 24, 2002

Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka

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