Patents by Inventor Susumu Ueno

Susumu Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5411675
    Abstract: A polymer scale preventive agent for use in polymerization of a monomer having an ethylenically unsaturated double bond, comprising:(A) at least one compound selected from the group consisting of diaminobenzenes and diaminonaphthalenes,(B) a hydroxynaphthoquinone, and(C) an acid. The polymerization vessel having a coating comprising the polymer scale preventive agent on its inner wall, etc. is effective in preventing deposition of polymer scale, and the polymeric product has a high whiteness and is of high quality.
    Type: Grant
    Filed: September 24, 1992
    Date of Patent: May 2, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Usuki, Susumu Ueno
  • Patent number: 5360857
    Abstract: A polymer scale preventive agent for use in polymerization of vinyl chloride monomer or a monomer mixture containing vinyl chloride monomer as a major component, comprising:(A) a naphthoquinone natural dye and(B) a polyvinyl alcohol with a saponification degree of at least 50 mol %. The polymer scale preventive agent is formed as coating on the inner wall, etc. of a polymerization vessel. Deposition of polymer scale can be always effectively prevented. Polymers with a high whiteness can be produced, and products formed from the polymer have only a small number of fish eyes.
    Type: Grant
    Filed: March 17, 1993
    Date of Patent: November 1, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hajime Kitamura, Susumu Ueno, Mikio Watanabe, Masahiro Usuki, Toshihiko Nakano
  • Patent number: 5354817
    Abstract: A polymer scale preventive agent for use in polymerization of a haloethylene or a monomer mixture containing the same, comprising:(A) an aromatic compound having at least one group selected from the class consisting of primary, secondary and tertiary amino groups, quaternary ammonium groups and the azo group and/or a dye having at least one group selected from said class, and(B) an alkali metal or ammonium salt of a polyvinylsulfonic acid, and(C) a naphthoquinone natural dye; a polymerization vessel having a coating comprising said scale preventive agnet. A process of preparing a haloethylene polymer using the vessel can produce a polymer of high quality without polymer scale deposition.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: October 11, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Usuki, Hajime Kitamura, Susumu Ueno, Mikio Watanabe, Richard W. Armentrout, Thomas J. Pollock
  • Patent number: 5292834
    Abstract: A method of preventing polymer scale deposition in a polymerization vessel in polymerization of a particular monomer having an ethylenic double bond having a high dissolving power against the conventional scale preventive coatings, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has been previously coated with a first coating liquid comprising:(A) a water-soluble anionic dye, and(B) a metal salt, to form a first coating, and the first coating thus formed has been then coated with a second coating liquid comprising:(C) an alkaline earth metal compound, and at least one member selected from the group consisting of:(D) a water-soluble anionic dye and(E) an inorganic colloid,to form a second coating. Polymer scale deposition can be effectively prevented.
    Type: Grant
    Filed: July 10, 1991
    Date of Patent: March 8, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Watanabe, Masahiro Usuki, Susumu Ueno
  • Patent number: 5264601
    Abstract: N,O-bis(trimethylsilyl)acetamide is improved in thermal stability by adding about 0.01 to 5 mol % of a 2-mercaptobenzothiazole or a salt thereof thereto.
    Type: Grant
    Filed: July 29, 1992
    Date of Patent: November 23, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Susumu Ueno, Masao Maruyama
  • Patent number: 5262497
    Abstract: Polymer scale deposition from a polymerization medium in which a monomer having an ethylenic double bond is polymerized, is prevented by conducting the polymerization in a polymerization vessel having a coating by applying a liquid comprising (A) an organic compound containing at least one member selected from the group consisting of a sulfonic acid group and a carboxylic acid group and having a molecular weight of 1000 or less and (B) a water-insoluble compound having an absorption band in the visible light range of 540 to 750 nm, the compounds (A) and (B) having been dissolved or dispersed in (C) an ester-based organic solvent, and having a pH of 3 or less; to the inner wall surfaces of said polymerization vessel. Polymer scale can be effectively prevented and polymeric products are barely colored.
    Type: Grant
    Filed: June 5, 1992
    Date of Patent: November 16, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Watanabe, Masahiro Usuki, Susumu Ueno
  • Patent number: 5244986
    Abstract: A method of preventing polymer scale deposition in a polymerization vessel in polymerization of a particular monomer having an ethylenic double bond having a high dissolving power against the conventional scale preventive coatings, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has been previously coated with a first coating solution comprising:(A) a water-soluble anionic dye, and(B) at least one member selected from the group consisting of inorganic colloids and cationic dyes, to form a first coating, and the first coating thus formed has been then coated with a second coating solution comprising:(C) an alkaline earth metal compound, and at least one member selected from the group consisting of:(D) a water-soluble anionic dye and(E) an inorganic colloid, to form a second coating. The polymerization vessel having the double coating as prepared above is also disclosed. Polymer scale deposition can be effectively prevented.
    Type: Grant
    Filed: September 4, 1992
    Date of Patent: September 14, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Watanabe, Masahiro Usuki, Susumu Ueno
  • Patent number: 5241022
    Abstract: The present invention relates to a coating solution for preventing adhesion of polymer scale and a method for preventing scale adhesion during preparation of polymers which can provide polymers having high quality without coloring thereof while preventing adhesion of polymer scale to a polymerizer when a monomer having an ethylenically unsaturated double bond is polymerized. A coating solution for preventing adhesion of polymer scale which comprises anaphthoquinone natural dyestuffs, anthraquinone natural dyestuffs, tannin natural dyestuffs, xanthone natural dyestuffs, flavonoid natural dyestuffs, or/and benzoquinone natural dyestuffs and a polyvinyl alcohol having a degree of saponification of not less than 70 mole % was applied on at least a part of a polymerizer which comes in contact with a monomer having an ethylenically unsaturated double bond and was dried to give a coating film during polymerization thereof.
    Type: Grant
    Filed: January 22, 1992
    Date of Patent: August 31, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Watanabe, Hajime Kitamura, Susumu Ueno, Masahiro Usuki, Masayoshi Yono
  • Patent number: 5229471
    Abstract: A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising:(A) a polyvinyl alcohol, and(B) a water-soluble polymeric compound having a carboxyl group which may be in the form of a salt, and a polymer scale preventive agent comprising said (A) and (B). Deposition of polymer scale can be effectively prevented. Since the components (A) and (B) have no poisonousness, safety of operators are ensured.
    Type: Grant
    Filed: September 6, 1990
    Date of Patent: July 20, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Susumu Ueno, Ichiro Kaneko, Mikio Watanabe
  • Patent number: 5214113
    Abstract: A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising:(A) a lignin, and(B) a cellulose derivative; and a polymer scale preventive agent comprising said components (A) and (B).Deposition of polymer scale can be effectively prevented; polymers with high whiteness can be prepared; the scale preventive agent used has no poisonousness and are highly safe, therefore this method can be performed with high safe.
    Type: Grant
    Filed: September 6, 1990
    Date of Patent: May 25, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Susumu Ueno, Ichiro Kaneko, Mikio Watanabe
  • Patent number: 5214112
    Abstract: A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising:(A) a water-soluble nitrogen-containing cationic polymeric compound, and(B) a water-soluble anionic polymeric compound; and a polymer scale preventive agent comprising said (A) and (B). Polymer scale deposition is effectively prevented, and polymers with high whiteness can be prepared.
    Type: Grant
    Filed: September 6, 1990
    Date of Patent: May 25, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Susumu Ueno, Ichiro Kaneko, Mikio Watanabe
  • Patent number: 5147455
    Abstract: A method of preventing polymer scale deposition during polymerization of a monomer having an ethylenically double bond in a polymerization vessel, comprising the step of carrying out said polymerization in a polymerization vessel of which the inner wall surface has a coating comprising a water-soluble polysaccharide; and a polymer scale preventive agent comprising polysaccharide. By use of the method or agent, deposition of polymer scale can be effectively prevented; in addition, polymers with a high whiteness can be prepared. Moreover, the scale preventive agent used has no poisonousness or the like and is highly safe.
    Type: Grant
    Filed: May 24, 1991
    Date of Patent: September 15, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Watanabe, Masahiro Usuki, Susumu Ueno
  • Patent number: 5142003
    Abstract: Scale deposits during polymerization of monomers containing ethylene-type double bonds are prevented by coating the reactor walls and parts with cationic dyes oxidized with hydrogen peroxide.
    Type: Grant
    Filed: June 19, 1991
    Date of Patent: August 25, 1992
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Masahiro Usuki, Mikio Watanabe, Susumu Ueno
  • Patent number: 5130386
    Abstract: A method of preventing polymer scale deposition in a polymerization vessel during polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has been previously coated with a coating solution containing(A) a tannin, and(B) a water-soluble polymeric compound, followed by drying to form a coating; a scale preventive agent comprising the components (A) and (B); and a polymerization vessel having said coating on the inner wall thereof. Polymer scale deposition on the inner wall, etc. of the polymerization vessel can be effectively prevented.
    Type: Grant
    Filed: March 1, 1990
    Date of Patent: July 14, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ichiro Kaneko, Toshihide Shimizu, Susumu Ueno, Mikio Watanabe
  • Patent number: 5098968
    Abstract: A method of preventing polymer scale deposition in a polymerization vessel during polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has a coating comprising a reaction product of a tannin and an acid halide. Polymer scale deposition on the inner wall, etc. of the polymerization vessel can be effectively prevented. The preventive agent used has neither risk of produced polymer being colored nor toxicity.
    Type: Grant
    Filed: May 1, 1990
    Date of Patent: March 24, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Ichiro Kaneko, Mikio Watanabe
  • Patent number: 5098750
    Abstract: This invention relates to a composite molded article where a polymer film of superior weather resistance, adhesion and surface smoothness is made into an integral composite body on the surface of polynorbornene base material by utilizing reaction injection molding in combination with an in-mold coating process. By means of this invention, it is possible to manufacture three dimensional composite molded articles, composite molded articles of complex shapes and deep-drawn composite molded articles. The composite molded articles of this invention can be used for a variety of purposes, such as automobile parts, electrical parts, construction, etc.
    Type: Grant
    Filed: August 6, 1990
    Date of Patent: March 24, 1992
    Assignee: The B. F. Goodrich Company
    Inventors: Susumu Ueno, Kin-ichi Okumura, Motoyuki Yamato
  • Patent number: 5037904
    Abstract: A method of preventing polymer scale deposition in a polymerization vessel during polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has a coating comprising a reaction product of a tannin and an aldehyde; a scale preventive agent comprising said reaction product; and a polymerization vessel having said coating on the inner wall thereof. Polymer scale deposition on the inner wall, etc. of the polymerization vessel can be effectively prevented.
    Type: Grant
    Filed: February 1, 1990
    Date of Patent: August 6, 1991
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Ichiro Kaneko, Mikio Watanabe
  • Patent number: 4853435
    Abstract: A thermosetting resin of a norbornene monomer is prepared by bulk-polymerizing a norbornene monomer in a mold in the presence of a metathesis catalyst system and further in the presence of a dicyclopentadiene heat-polymerized resin in an amount of 15 to 150 parts by weight per 100 parts by weight of the monomer.
    Type: Grant
    Filed: March 22, 1988
    Date of Patent: August 1, 1989
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Motoyuki Yamato, Susumu Ueno, Kin-ichi Okumura, Masao Fuchi
  • Patent number: 4824717
    Abstract: A mesh screen of polyester filaments for screen printing is subjected to a treatment with low temperature plasma in an atmosphere of a non-oxidizing inorganic gas to such an extent that a crosslinked layer having a thickness of 0.001 to 0.1 .mu.m is formed on the surface of the polyester filaments and the surface of the filaments is provided with protrusions and concavities having a diameter of 0.01 to 0.1 .mu.m in a distribution density of 1000 to 6000 per .mu.m.sup.2 of the surface area of the filament. The thus treated mesh screen is advantageously improved, with no adverse influences on the mechanical strength, in respect of the adhesion between the filament surface and a photosensitive resin composition applied to the mesh screen for photolithographic patterning. The plasmatreated mesh screen is also advantageous in respect of the decreased resistance against transfer of a printing ink through open meshes.
    Type: Grant
    Filed: December 23, 1987
    Date of Patent: April 25, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toru Nakanishi, Shigehiro Hoshida, Susumu Ueno
  • Patent number: 4765860
    Abstract: The invention provides a method for the preparation of a flexible base for printed circuit board of the type formed of lamination of a flexible sheet-like polymeric base and a metal, e.g. copper, foil adhesively bonded to the surface thereof by use of an adhesive, in which the surface of the polymeric base prior to bonding of the metal foil is subjected to exposure to low temperature plasma so that the adhesive bonding strength between the polymeric base and the metal foil can be greatly improved.
    Type: Grant
    Filed: October 27, 1987
    Date of Patent: August 23, 1988
    Inventors: Susumu Ueno, Hajime Kitamura, Kaname Inoue