Patents by Inventor Suzanne M. Coley
Suzanne M. Coley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940732Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.Type: GrantFiled: April 15, 2021Date of Patent: March 26, 2024Assignee: Rohm and Haas Electronic Materials LLCInventors: Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Suzanne M. Coley, Li Cui, Paul J. LaBeaume, Deyan Wang
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Publication number: 20240019779Abstract: A compound represented by Formula (1): wherein X is a group having a valency of r; each R1 is independently an organic group comprising an acid-labile group; m is an integer greater than or equal to 1; k is an integer from 1 to 5; and r is an integer from 2 to 10, wherein the compound is non-polymeric, and wherein Ar1, L1, L2, R2, and R3 are as defined herein.Type: ApplicationFiled: May 20, 2022Publication date: January 18, 2024Inventors: Li Cui, Emad Aqad, Yinjie Cen, Conner A. Hoelzel, James F. Cameron, Jong Keun Park, Suzanne M. Coley, Choong-Bong Lee
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Patent number: 11762294Abstract: A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C4-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2Type: GrantFiled: August 31, 2020Date of Patent: September 19, 2023Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, Suzanne M. Coley, Iou-Sheng Ke
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Patent number: 11733609Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.Type: GrantFiled: July 8, 2021Date of Patent: August 22, 2023Assignee: Rohm and Haas Electronic Materials LLCInventors: Charlotte A. Cutler, Li Cui, Shintaro Yamada, Paul J. LaBeaume, Suzanne M. Coley, James F. Cameron, Daniel Greene
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Publication number: 20230213862Abstract: A photoresist composition, comprising: a first polymer comprising: a first repeating unit comprising a hydroxyaryl group; a second repeating unit comprising a first acid-labile group; and a third repeating unit comprising a first base-soluble group having a pKa of 12 or less, and not comprising a hydroxyaryl group; wherein the first, second, and third repeating units of the first polymer are different from each other, and the first polymer is free of lactone groups; a second polymer comprising: a first repeating unit comprising a second acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a second base-soluble group having a pKa of 12 or less; wherein the first, second, and third repeating units of the second polymer are structurally different from each other; and a solvent, wherein the first polymer and the second polymer are different from each other.Type: ApplicationFiled: December 20, 2022Publication date: July 6, 2023Inventors: Li Cui, Suzanne M. Coley, Emad Aqad, Yinjie Cen, Jong Keun Park, Choong-Bong Lee, James F. Cameron
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Patent number: 11506979Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.Type: GrantFiled: December 7, 2017Date of Patent: November 22, 2022Assignee: Rohm and Haas Electronic Materials LLCInventors: Li Cui, Paul J. LaBeaume, Charlotte A. Cutler, Suzanne M. Coley, Shintaro Yamada, James F. Cameron, William Williams
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Publication number: 20220197141Abstract: A method of forming a pattern on a substrate, the method including: forming a photoresist underlayer over a surface of the substrate, the photoresist underlayer formed from a composition including a polymer having a glass transition temperature of less than 110° C. and a solvent; subjecting the photoresist underlayer to a metal precursor, where the metal precursor infiltrates a free volume of the photoresist underlayer; and exposing the metal precursor-treated photoresist underlayer to an oxidizing agent to provide a metallized photoresist underlayer.Type: ApplicationFiled: December 17, 2020Publication date: June 23, 2022Inventors: Joshua Kaitz, Michael Finch, Paul J. LaBeaume, Shintaro Yamada, Suzanne M. Coley
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Publication number: 20220197142Abstract: A method of forming a pattern on a substrate, the method including: forming a photoresist underlayer over a surface of the substrate, wherein the photoresist underlayer is formed from a composition comprising a polymer and a solvent, and the photoresist underlayer has a carbon content of greater than 47 at %; subjecting the photoresist underlayer to a a metal precursor, where the metal precursor infiltrates a free volume of the photoresist underlayer; and exposing the metal precursor-treated photoresist underlayer to an oxidizing agent to provide a metallized photoresist underlayer.Type: ApplicationFiled: December 17, 2020Publication date: June 23, 2022Inventors: Joshua Kaitz, Michael Finch, Paul J. LaBeaume, Shintaro Yamada, Suzanne M. Coley
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Patent number: 11360387Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from ?5 to 13 and having pendently-bound siloxane moieties are provided.Type: GrantFiled: June 29, 2018Date of Patent: June 14, 2022Assignee: Rohm and Haas Electronic Materials LLCInventors: Li Cui, Paul J. LaBeaume, James F. Cameron, Charlotte A. Cutler, Shintaro Yamada, Suzanne M. Coley, Iou-Sheng Ke
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Publication number: 20220091506Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.Type: ApplicationFiled: August 31, 2021Publication date: March 24, 2022Inventors: Ke Yang, Emad Aqad, James F. Cameron, Suzanne M. Coley, Manibarsha Goswami, ChoongBong Lee, Bhooshan Popere, James W. Thackeray, Brandon Wenning
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Publication number: 20220066321Abstract: An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.Type: ApplicationFiled: August 31, 2020Publication date: March 3, 2022Inventors: Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, James F. Cameron, Emad Aqad, Iou-Sheng Ke, Suzanne M. Coley
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Publication number: 20220066320Abstract: A photoresist underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; R1 is hydrogen, substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2-30 heterocycloalkyl, substituted or unsubstituted C2-30 alkenyl, substituted or unsubstituted C2-30 alkynyl, substituted or unsubstituted C6-30 aryl, substituted or unsubstituted C7-30 arylalkyl, substituted or unsubstituted C7-30 alkylaryl, substituted or unsubstituted C3-30 heteroaryl, or substituted or unsubstituted C1-30 heteroarylalkyl; and R2 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C1-30 heteroalkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C2Type: ApplicationFiled: August 31, 2020Publication date: March 3, 2022Inventors: Joshua Kaitz, Sheng Liu, Li Cui, Shintaro Yamada, Suzanne M. Coley, Iou-Sheng Ke
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Publication number: 20210397093Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, and one or more condensable silicon monomers are provided.Type: ApplicationFiled: July 8, 2021Publication date: December 23, 2021Inventors: Charlotte A. Cutler, Li Cui, Shintaro Yamada, Paul J. LaBeaume, Suzanne M. Coley, James F. Cameron, Daniel Greene
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Patent number: 11175581Abstract: Polyarylene resins and compositions containing them are useful as underlayers in semiconductor manufacturing processes.Type: GrantFiled: November 2, 2017Date of Patent: November 16, 2021Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLCInventors: Sheng Liu, Shintaro Yamada, James F. Cameron, Li Cui, Suzanne M. Coley, Joshua A. Kaitz, Keren Zhang
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Publication number: 20210341840Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein: Ar1 is chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, and a C4-30 fused heteroocyclic aromatic ring system; Z is a substituent independently chosen from OR1, protected hydroxyl, carboxyl, protected carboxyl, SR1, protected thiol, —O—C(?O)—C1-6 alkyl, halogen, and NHR2; wherein each R1 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl; each R2 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(?O)—R1, and S(?O)2—R1; x is an inType: ApplicationFiled: April 15, 2021Publication date: November 4, 2021Inventors: Sheng Liu, James F. Cameron, Shintaro YAMADA, Iou-Sheng KE, Keren ZHANG, Suzanne M. Coley, Li Cui, Paul J. LaBeaume, Deyan Wang
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Publication number: 20210247695Abstract: Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.Type: ApplicationFiled: April 30, 2021Publication date: August 12, 2021Inventors: Sheng Liu, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Daniel Greene, Paul J. LaBeaume, Li Cui, Suzanne M. Coley
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Publication number: 20200379347Abstract: A resist underlayer composition including a polymer having a polymer backbone and a substituted or unsubstituted fullerene group pendant to the polymer backbone, and a solvent in an amount of from 50 to 99.9 weight % based on the total resist underlayer composition.Type: ApplicationFiled: May 31, 2019Publication date: December 3, 2020Inventors: Li Cui, Shintaro Yamada, Iou-Sheng Ke, Paul J. LaBeaume, Suzanne M. Coley, James F. Cameron, Keren Zhang, Joshua Kaitz
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Patent number: 10818493Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.Type: GrantFiled: December 13, 2018Date of Patent: October 27, 2020Assignee: Rohm and Haas Electronic Materials LLCInventors: Suzanne M. Coley, Paul J. LaBeaume, Shintaro Yamada, Cecilia W. Kiarie, Li Cui, Bhooshan Popere
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Patent number: 10790146Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.Type: GrantFiled: November 2, 2017Date of Patent: September 29, 2020Assignee: Rohm and Haas Electronic Materials LLCInventors: Shintaro Yamada, Li Cui, Christopher Gilmore, Joshua A. Kaitz, Sheng Liu, James F. Cameron, Suzanne M. Coley
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Publication number: 20200142309Abstract: Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.Type: ApplicationFiled: October 10, 2019Publication date: May 7, 2020Inventors: Sheng LIU, James F. Cameron, Shintaro Yamada, Iou-Sheng Ke, Keren Zhang, Daniel Greene, Paul J. LaBeaume, Li Cui, Suzanne M. Coley