Abstract: A chemical vapor sterilization process is enhanced by concentrating a germicide via exploitation of the difference between the vapor pressures of the germicide and its solvent. A diffusion restriction can be placed into the diffusion path to assist this process and the path then opened to provide rapid diffusion of the thus concentrated germicide. The path through the diffusion restriction can be closed to allow the pressure in a sterilization chamber to be lowered prior to receiving the concentrated germicide.

Abstract: To avoid the yield of wafers that undergo immersion lithography influencing by delay of post exposure baking (PEB), an operation system adjusts a speed of inputting the wafers to undergo immersion lithography according to a status of wafers that have finished exposure and are waiting for baking. Therefore, the wafers that have finished exposure are transmitted to be baked efficiently and on time.

Abstract: A chemical vapor sterilization process is enhanced by flowing a portion of the sterilant vapor through an instrument container using a normal portion of the exhaust process. Preferably, an exhaust conduit which draws a vacuum on a sterilization chamber is oriented so that the container is adjacent an inlet to the conduit.

Abstract: Provided is a method of decontaminating an area, and related device. The method comprises releasing a germicidal agent into the area from a germicidal source, controlling the germicidal agent concentration in the area to a predetermined concentration that does not exceed a Permissible Exposure Limit, and contacting microorganisms in the area with the germicidal agent to decontaminate the area. The device comprises a releasing mechanism configured to release a germicidal agent from a germicidal source at a predetermined concentration into the area such that the predetermined concentration of germicidal agent in the area does not exceed a Permissible Exposure Limit.

Abstract: A chemical vapor sterilization process is enhanced by concentrating a germicide via exploitation of the difference between the vapor pressures of the germicide and its solvent. A diffusion restriction can be placed into the diffusion path to assist this process and the path then opened to provide rapid diffusion of the thus concentrated germicide. The path through the diffusion restriction can be closed to allow the pressure in a sterilization chamber to be lowered prior to receiving the concentrated germicide.

Abstract: A method for monitoring a cleaning process for a medical instrument, includes the steps of placing the instrument in a cleaning chamber; placing a soil standard in the cleaning chamber; cleaning the instrument and the soil standard with a cleaning solution; and detecting whether soil remains on said soil standard. The soil standard includes two substantially parallel substrates separated with two substantially equal thickness spacers, wherein a gap is formed between the two substrates with soil in the gap.

Abstract: A method for cleaning and sterilizing a medical device comprises the steps of: placing the device into a container; cleaning the device in the container with a cleaning solution; rinsing the device in the container with a rinse solution; and vaporizing a liquid substance in the container to create a sterilant vapor and contacting the device with the vapor to effect sterilization of the device.

Abstract: A method and device provide for delivering fluid for cleaning and/or decontamination to a lumen in a medical device. A tube having a plurality of openings therethrough is inserted into the lumen of the medical device the fluid is flowed through the tube, out of the openings and into the lumen.

Abstract: A method and device provide for inactivating microorganisms on tissue exposed through a surgical incision. The method includes the steps of: applying a coating of a solution comprising hydrogen peroxide to the tissue; and force drying the solution on the tissue so as to concentrate the solution on the tissue. The concentrated solution kills microorganisms.

Abstract: A liquid measuring device is described for carrying out the assay using a gas or vapor permeable but liquid impermeable membrane barrier to control the volume of liquid to be measured or transferred. The membrane may be used in any instance where a fixed volume of liquid needs to be measured.

Abstract: The present invention provides a method for designing a mask. First, a main pattern including at least a strip pattern is formed on the mask substrate. A shift feature is added to one end of the strip pattern of the main pattern. Either the phase shift or the optical transmission or both of the shift feature can be adjusted to optimize the resultant critical dimension between line-ends of the main pattern, thus improving pullback of the line-ends of the strip pattern in the main pattern.

Abstract: A method and an apparatus for sterilizing a lumen device. A lumen and a container having an interface on a wall of the container are enclosed in a chamber. The lumen is placed across the interface so that one end of the lumen is in the container and the other end is in the chamber. Germicide is introduced into the chamber, and a pressure difference is created between the two ends of the lumen, so that the germicide flows through the lumen. The lumen may alternatively be placed across an interface which separates the chamber into two areas. Germicide is introduced into the chamber, and a pressure difference is created between the two areas of the chamber, causing the germicide to flow through the lumen.

Abstract: A method and apparatus provide for automatically cleaning and decontaminating medical instruments. The method comprising the steps of: a) placing the medical instruments into a container after their use in a medical procedure; b) closing the container to seal the instruments inside whereby to prevent personnel contact with the instruments and any contaminants which might be thereon; c) inserting the sealed container into a washer/decontaminator and sealing the washer/decontaminator; d) the washer/decontaminator automatically opening the container and applying a washing fluid thereto to wash the instruments within the container; and e) the washer/decontaminator automatically applying a disinfectant to the container to disinfect the instruments whereby to allow safe handling thereof by personnel.

Abstract: A method and apparatus provides for sterilizing a device in a container. The method comprising the steps of: a) placing the device into the container; b) processing the device, the container and a lid for the container in a sterilization process with the lid separated from the container; and c) after sterilizing a contact surface on the container where the lid meets the container, and while maintaining the container and the lid in a sterile environment, placing the lid onto the container, whereby to prevent contamination of the device upon its removal from the container via contact with the contact surface.

Abstract: A method and apparatus provides for cleaning and sterilizing a device in one machine. The method comprises the steps of: a) placing the device into a container; b) placing the container into a washing/sterilization apparatus; c) the washing/sterilization apparatus washing the device by applying a washing fluid to an interior of the container to wash the device; d) after washing the device, and without removing the device from the washing/sterilization apparatus, the washing/sterilization apparatus packaging the device in a bacteria impermeable package; e) the washing/sterilization apparatus sterilizing the device by exposing the device to a sterilizing vapor; and f) removing the device while it remains in the package whereby to preserve its sterility until use.

Abstract: A method of forming a pattern comprising steps as follow. A substrate comprising a layer to be etched is provided. A first resist layer is formed on the substrate. The top of the first resist layer is patterned. A second resist layer is formed on the first resist layer being patterned. A portion of the second resist layer is removed. The first resist layer, the second resist layer, and the layer to be etched are etched. A fine pattern can be obtained using the method of the present invention, while the resist layer used is not too thin. Thus, the bad adhesion of the resist layer to the substrate and the less etch resistance of the resist layer for protecting underlying layers will not occur.

Abstract: A container provides for soaking medical instruments. The container includes a basin for receiving one or more medical instruments, a fill level sensor for detecting presence of a soaking substance at a minimum fill level, a lid closure sensor which detects closure of a lid onto the basin, and a timer adapted to begin a timing sequence when both the fill lever sensor detects presence of the soaking substance at the minimum fill level and the lid closure sensor detects closure of the lid. Proper soaking of the instruments prior to a full cleaning procedure improves the reliability of the cleaning procedure.

Abstract: Devices and methods for sterilizing lumens involve a booster that is attached to the lumen. In preferred embodiments, the contact area between the lumen and the booster enhances the penetration of an antimicrobial agent to the contact area.

Abstract: A method of moving bubbles includes utilizing optical tweezers to form a bright photoresist area and a dark photoresist area in the photoresist layer. The bubbles in the photoresist layer move from the bright photoresist area to the dark photoresist area.

Abstract: A method for characterizing line width roughness of printed features is provided. A wafer having thereon a plurality of gratings formed within a test key region is prepared. The wafer is transferred to a spectroscopic ellipsometry tool having a light source, a detector and a computer. A polarized light beam emanated from the light source is directed onto the gratings. Spectrum data of reflected light is measured and recorded. The spectrum data is compared to a library linked to the computer in real time. The library contains a plurality of contact-hole model based spectra created by incorporating parameter values that describes the line width roughness. The spectrum data is matched with the contact-hole model based spectra, thereby determining the parameter values.