Abstract: A soil standard for monitoring a cleaning process for a medical instrument, includes two substantially parallel substrates separated with two substantially equal thickness spacers, wherein a gap is formed between the two substrates with soil in the gap. The substrates and spacers can be formed as integral pieces and snapped together.

Abstract: A new method is proposed where a limited amount of MBTH is used to detect a point of interest (POI) of an aldehyde in a test sample. Preferably, it reacts with aldehyde first to form an azine. Only if there is remaining MBTH, it is oxidized to another species which combines with the azine to form formazan. However, if there is enough aldehyde, all the MBTH is converted to azine and there is no formation of blue color. Thus, by using the limiting agent MBTH to test the amount of aldehyde around the point of interest, then less aldehyde would produce more blue color and more aldehyde would produce less blue color. This method is especially useful in the quality control of aldehyde products. The end color may be different depending upon the order of addition of the reactants. For example, if an oxidizing agent and MBTH are mixed before adding the aldehyde, a light green to green/blue color results. This method could be used for solution test or for tests on a solid phase such as on nylon membrane.

Abstract: An invention of lithography process using an improved reflection mask is provided for extreme ultraviolet (EUV) lithography. In the process an incident EUV is transmitted onto the reflection mask at a grazing incident angle. Therefore a reflected EUV develops a pattern image to a photo resist layer on the surface of the wafer, wherein the shape of the pattern image is dependent on the shape of a plurality of reflective regions on the surface of the reflection mask. Specially, the improved reflection mask is more easily fabricated. The surface roughness and the defects of the reflection mask are also more easily controlled. The improved EUV lithography process is more efficient and cheap.

Abstract: A novel immersion medium for immersion lithography is provided. The immersion medium is introduced to fill a gap in between a front surface of a projection lens of a stepper and a top surface of a photoresist layer coated on a substrate positioned on a wafer stage. The present invention is characterized in that the immersion medium has a pH value matching that of the photoresist layer in order to prevent effects caused by photo acid generator (PAG) leaching from the photoresist layer to the immersion medium during exposure.

Abstract: A method for fabricating a mask is provided. A patterned sacrificial layer is formed over a mask material layer, and the patterned sacrificial layer has an etch selectivity different from that of the mask material layer. An isotropic etch process is performed to the mask material layer by using the patterned sacrificial layer as an etch mask to form a mask layer, wherein the dimension of the mask layer is smaller than that of the patterned sacrificial layer.

Abstract: A liquid measuring device is described for carrying out the assay using a gas or vapor permeable but liquid impermeable membrane barrier to control the volume of liquid to be measured or transferred. The membrane may be used in any instance where a fixed volume of liquid needs to be measured.

Abstract: A photomask with desired illumination conditions can be constructed by combining a base pattern of openings with an assist pattern which includes openings that are offset from respectively corresponding openings of the base pattern by a preset angular distance.

Abstract: A lithography method for improving contrast includes the following steps: To provide a light source. To provide a first plate including at least one opening rotates according to at least one angular velocity. To provide a mask having patterns on it. To provide a second plate including at least one block corresponding to the opening rotates according to the same angular velocity as the first plate. The method also includes a step to perform an exposure process such that zero order light diffracted by the mask is hindered by the block.

Abstract: An apparatus, system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined patterns through an exposure mask having light-transmissive openings in correspondence to the predetermined patterns. The exposure mask has areas densely populated with the light-transmissive openings and areas sparsely populated with the light-transmissive openings. Light is attenuated through the densely populated light-transmissive openings by a different amount than through the sparsely populated light-transmissive openings.

Abstract: A chemical vapor sterilization process is enhanced by concentrating a germicide via exploitation of the difference between the vapor pressures of the germicide and its solvent. A diffusion restriction can be placed into the diffusion path to assist this process and the path then opened to provide rapid diffusion of the thus concentrated germicide. The path through the diffusion restriction can be closed to allow the pressure in a sterilization chamber to be lowered prior to receiving the concentrated germicide.

Abstract: A dual phase shifting mask (PSM)/double exposure lithographic process for manufacturing a shrunk semiconductor device. A semiconductor wafer having a photoresist layer coated thereon is provided. A first phase shift mask is disposed over the semiconductor wafer and implementing a first exposure process to expose the photoresist layer to light transmitted through the first phase shift mask so as to form a latent pattern comprising a peripheral unexposed line pattern in the photoresist layer. The first phase shift mask is then replaced with a second phase shift mask and implementing a second exposure process to expose the photoresist layer to light transmitted through the second phase shift mask so as to remove the peripheral unexposed line pattern.

Abstract: A method and an apparatus for sterilizing a lumen device. A lumen and a container having an interface on a wall of the container are enclosed in a chamber. The lumen is placed across the interface so that one end of the lumen is in the container and the other end is in the chamber. Germicide is introduced into the chamber, and a pressure difference is created between the two ends of the lumen, so that the germicide flows through the lumen. The lumen may alternatively be placed across an interface which separates the chamber into two areas. Germicide is introduced into the chamber, and a pressure difference is created between the two areas of the chamber, causing the germicide to flow through the lumen.

Abstract: A method of sterilizing an article includes placing the article into a chamber containing an inner atmosphere and exhausting the inner atmosphere to lower pressure in the chamber. Hydrogen peroxide vapor is present in the chamber during at least a portion of the step of exhausting the inner atmosphere. Exhaustion of the inner atmosphere is terminated and additional hydrogen peroxide is admitted into the chamber. Hydrogen peroxide vapor contacts the article for a sufficient period to effect sterilization of the article.

Abstract: A method of forming at least one wire on a substrate comprising at least one conductive region is provided. AnAn insulatingayer is disposed on the substrate. The method includes forming a hard mask layer on the insulating layer followed by forming at least one recess by removing portions of the hard mask layer and the insulating layer, forming a light blocking layer on the hard mask layer and the recess, and the light blocking layer and the hard mask layer forming a composite layer, forming a gap filling layer filling up the recess on the light blocking layer, forming a photoresist layer on the gap filling layer, aligning a photo mask with the recess by utilizing the composite layer as a mask, and performing an exposure/development process to form at least one pattern above the recess in the photoresist layer.

Abstract: A method and an apparatus for sterilizing a lumen device. A lumen and a container having an interface on a wall of the container are enclosed in a chamber. The lumen is placed across the interface so that one end of the lumen is in the container and the other end is in the chamber. Germicide is introduced into the chamber, and a pressure difference is created between the two ends of the lumen, so that the germicide flows through the lumen. The lumen may alternatively be placed across an interface which separates the chamber into two areas. Germicide is introduced into the chamber, and a pressure difference is created between the two areas of the chamber, causing the germicide to flow through the lumen.

Abstract: A method and an apparatus for sterilizing a lumen device. A lumen and a container having an interface on a wall of the container are enclosed in a chamber. The lumen is placed across the interface so that one end of the lumen is in the container and the other end is in the chamber. Germicide is introduced into the chamber, and a pressure difference is created between the two ends of the lumen, so that the germicide flows through the lumen. The lumen may alternatively be placed across an interface which separates the chamber into two areas. Germicide is introduced into the chamber, and a pressure difference is created between the two areas of the chamber, causing the germicide to flow through the lumen.

Abstract: A method and an apparatus for sterilizing a lumen device. A lumen and a container having an interface on a wall of the container are enclosed in a chamber. The lumen is placed across the interface so that one end of the lumen is in the container and the other end is in the chamber. Germicide is introduced into the chamber, and a pressure difference is created between the two ends of the lumen, so that the germicide flows through the lumen. The lumen may alternatively be placed across an interface which separates the chamber into two areas. Germicide is introduced into the chamber, and a pressure difference is created between the two areas of the chamber, causing the germicide to flow through the lumen.

Abstract: A chemical indicator of an aurin moiety in a substrate to detect the presence of an oxidizing agent.

Abstract: A method for cleaning and sterilizing a medical device comprises the steps of placing the device into a container, contacting the device with a cleaning solution, contacting the device with a liquid sterilant and lowering pressure in the container to vaporize the liquid sterilant in the container, thereby simultaneously completing sterilization of the device and drying the device. The washing and sterilization processes can proceed simultaneously.

Abstract: A dual phase shifting mask (PSM)/double exposure lithographic process for manufacturing a shrunk semiconductor device. A semiconductor wafer having a photoresist layer coated thereon is provided. A first phase shift mask is disposed over the semiconductor wafer and implementing a first exposure process to expose the photoresist layer to light transmitted through the first phase shift mask so as to form a latent pattern comprising a peripheral unexposed line pattern in the photoresist layer. The first phase shift mask is then replaced with a second phase shift mask and implementing a second exposure process to expose the photoresist layer to light transmitted through the second phase shift mask so as to remove the peripheral unexposed line pattern.