Patents by Inventor Tadabumi Tomita

Tadabumi Tomita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8742263
    Abstract: Provided is an anisotropically conductive member that has a dramatically increased density of disposed conductive paths, can be used as an electrically connecting member or inspection connector for electronic components such as semiconductor devices even today when still higher levels of integration have been achieved, and has excellent flexibility. The anisotropically conductive member includes an insulating base and a plurality of conductive paths made of a conductive material, insulated from one another, and extending through the insulating base in the thickness direction of the insulating base, one end of each of the conductive paths protruded on one side of the insulating base, the other end of each of the conductive paths exposed or protruded on the other side thereof. The insulating base is made of a resin material and the conductive paths are formed at a density of at least 1,000,000 conductive paths/mm2.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: June 3, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Tadabumi Tomita, Yusuke Hatanaka, Shinya Suzuki, Atsushi Matsuura, Yoshinori Hotta, Akio Uesugi
  • Patent number: 8516690
    Abstract: An anisotropic conductive joint package in which an anisotropic conductive film is joined to at least one conductive material selected from among the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), magnesium (Mg), nickel (Ni), a tin oxide doped with indium (ITO), molybdenum (Mo), iron (Fe), palladium (Pd), beryllium (Be), and rhenium (Re).
    Type: Grant
    Filed: December 1, 2008
    Date of Patent: August 27, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Yoshinori Hotta, Tadabumi Tomita
  • Publication number: 20120168218
    Abstract: Provided is an anisotropically conductive member that has a dramatically increased density of disposed conductive paths, can be used as an electrically connecting member or inspection connector for electronic components such as semiconductor devices even today when still higher levels of integration have been achieved, and has excellent flexibility. The anisotropically conductive member includes an insulating base and a plurality of conductive paths made of a conductive material, insulated from one another, and extending through the insulating base in the thickness direction of the insulating base, one end of each of the conductive paths protruded on one side of the insulating base, the other end of each of the conductive paths exposed or protruded on the other side thereof. The insulating base is made of a resin material and the conductive paths are formed at a density of at least 1,000,000 conductive paths/mm2.
    Type: Application
    Filed: February 17, 2010
    Publication date: July 5, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadabumi Tomita, Yusuke Hatanaka, Shinya Suzuki, Atsushi Matsuura, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20110300400
    Abstract: High aspect-ratio metal members such as a nanopillar, a nanorod, and the like, and a method of producing the same. The present invention provides high aspect-ratio metal members such as a nanopillar or a nanorod, and a method of producing the same, such metal members being produced by filling the micropores of an anodized film having a degree of ordering of 70% or more with a metal having an aspect ratio of 5 or more, followed by baking in inert gas atmosphere or in a vacuum at 300° C. or more to 1000° C. or less to improve crystallinity.
    Type: Application
    Filed: February 17, 2010
    Publication date: December 8, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Tadabumi Tomita, Yoshinori Hotta
  • Publication number: 20110043239
    Abstract: An object of the present invention is to provide a probe card which has good stability of the connection between testing electrodes and test electrodes even after exposure to high temperatures in the burn-in test, and is less susceptible to displacements in the positions of contact between the testing electrodes and conductive portions or between the conductive portions and probe needles or the test electrodes even after repeated use of the probe card. The probe card of the present invention is a probe card which includes a testing circuit board having the testing electrodes formed so as to correspond to the test electrodes and an anisotropic conductive member electrically connecting the test electrodes with the testing electrodes.
    Type: Application
    Filed: March 9, 2009
    Publication date: February 24, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi, Yusuke Hatanaka
  • Publication number: 20100294547
    Abstract: An anisotropic conductive joint package in which an anisotropic conductive film is joined to at least one conductive material selected from among the group consisting of gold (Au), silver (Ag), copper (Cu), aluminum (Al), magnesium (Mg), nickel (Ni), a tin oxide doped with indium (ITO), molybdenum (Mo), iron (Fe), palladium (Pd), beryllium (Be), and rhenium (Re).
    Type: Application
    Filed: December 1, 2008
    Publication date: November 25, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Yusuke Hatanaka, Yoshinori Hotta, Tadabumi Tomita
  • Patent number: 7838105
    Abstract: Disclosed is a microstructure comprising an aluminum anodized film bearing through micropores, wherein a surface of the microstructure is covered with a protective film for preventing hydration of the aluminum anodized film. The microstructure may be used as a porous alumina membrane filter excellent in filtration rate and its stability with time.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: November 23, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Patent number: 7824535
    Abstract: A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.
    Type: Grant
    Filed: January 30, 2007
    Date of Patent: November 2, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20100248151
    Abstract: A method of making a printing plate which has easy removability of engraving residue generated in laser engraving and has excellent reproducibility of thin lines is provided. The method includes in the following order: engraving by laser irradiation a relief forming layer of a printing plate precursor, the relief forming layer including a binder polymer having a glass transition temperature (Tg) of 20° C. or higher; and treating a surface of the engraved relief forming layer with an emulsion cleaner.
    Type: Application
    Filed: March 25, 2010
    Publication date: September 30, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadabumi TOMITA, Hiroshi TASHIRO, Hisao YAMAMOTO
  • Patent number: 7722754
    Abstract: A method of manufacturing a microstructure wherein an aluminum member having an aluminum substrate and a micropore-bearing anodized film present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving the anodized film until a barrier layer has a thickness of 3 to 50 nm, and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized film so that a ratio of a diameter of a micropore opening “a” to a micropore diameter at a height “a/2” from a micropore bottom “b” (a/b) is in a range of 0.9 to 1.1, whereby the microstructure having micropores formed on a surface thereof is obtained. The manufacturing method enables microstructures having an ordered array of pits to be obtained in a short period of time.
    Type: Grant
    Filed: June 11, 2007
    Date of Patent: May 25, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Patent number: 7648760
    Abstract: In a method of manufacturing a microstructure, an aluminum member having an aluminum substrate and a micropore-bearing anodized layer present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving 0.001 to 20 wt % of a material constituting the anodized layer and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized layer, thereby obtaining the microstructure having micropores formed on a surface thereof. This method enables a microstructure having an ordered array of pits to be obtained in a short period of time.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: January 19, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Patent number: 7435488
    Abstract: Described is a structural body including at least partially an aluminum member having on a surface an anodized film with micropores present, in which: the micropores have a coefficient of variation in pore size of 5 to 50%; and the micropores are each sealed with a metal. The structural body can generate localized plasmon resonance having a sufficiently large intensity and be produced at low cost through a simple production process, and having a large surface area.
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: October 14, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20080081173
    Abstract: In a method of manufacturing a microstructure, an aluminum member having an aluminum substrate and a micropore-bearing anodized layer present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving 0.001 to 20 wt % of a material constituting the anodized layer and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized layer, thereby obtaining the microstructure having micropores formed on a surface thereof. This method enables a microstructure having an ordered array of pits to be obtained in a short period of time.
    Type: Application
    Filed: February 5, 2007
    Publication date: April 3, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20080070056
    Abstract: Disclosed is a microstructure comprising an aluminum anodized film bearing through micropores, wherein a surface of the microstructure is covered with a protective film for preventing hydration of the aluminum anodized film. The microstructure may be used as a porous alumina membrane filter excellent in filtration rate and its stability with time.
    Type: Application
    Filed: September 17, 2007
    Publication date: March 20, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Yusuke HATANAKA, Tadabumi TOMITA, Yoshinori HOTTA, Akio UESUGI
  • Publication number: 20080057293
    Abstract: A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.
    Type: Application
    Filed: January 30, 2007
    Publication date: March 6, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20080029399
    Abstract: A method of manufacturing structures includes a stripping step in which an aluminum member that includes an aluminum substrate and an anodized layer present on a surface of the aluminum substrate and that serves as a cathode is electrolyzed to strip the anodized layer from the aluminum substrate to obtain a structure composed of the anodized layer. Electrolysis in the stripping step is carried out in such a way that a current passes over a surface of the anodized layer. Structures having a well-ordered array of pits can be obtained in a short time without the use of substances such as chromic acid that are deleterious to the environment.
    Type: Application
    Filed: February 9, 2007
    Publication date: February 7, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Tadabumi Tomita, Shinya Suzuki
  • Publication number: 20070289945
    Abstract: A method of manufacturing a microstructure wherein an aluminum member having an aluminum substrate and a micropore-bearing anodized film present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving the anodized film until a barrier layer has a thickness of 3 to 50 nm, and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized film so that a ratio of a diameter of a micropore opening “a” to a micropore diameter at a height “a/2” from a micropore bottom “b” (a/b) is in a range of 0.9 to 1.1, whereby the microstructure having micropores formed on a surface thereof is obtained. The manufacturing method enables microstructures having an ordered array of pits to be obtained in a short period of time.
    Type: Application
    Filed: June 11, 2007
    Publication date: December 20, 2007
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Patent number: 7299749
    Abstract: A lithographic printing plate support comprising a substrate having thereon a porous layer comprising metal oxide particles bound by a compound containing a metal atom and a phosphorus atom.
    Type: Grant
    Filed: February 5, 2004
    Date of Patent: November 27, 2007
    Assignee: Fujifilm Corporation
    Inventors: Tadabumi Tomita, Yoshinori Hotta
  • Publication number: 20070021298
    Abstract: A metal particle type reaction catalyst comprising: a metallic member having micropores; and a metal having catalytic activity, wherein the micropores are filled with the metal having catalytic activity, and a catalytic-reaction apparatus comprising: a microreactor; and the metal particle type reaction catalyst disposed in the microreactor.
    Type: Application
    Filed: July 19, 2006
    Publication date: January 25, 2007
    Inventors: Kazuto Kunita, Tadabumi Tomita
  • Publication number: 20060234396
    Abstract: Disclosed is a method for producing a structure having: a stripping step in which an aluminum member including an aluminum substrate and an anodized layer present on the aluminum substrate, which layer contains micropores having an average pore diameter of 10 to 500 nm and a coefficient of variation in pore diameter of less than 30%, is electrolyzed in an aqueous acid solution by using the aluminum member for a cathode to thereby strip the anodized layer off the aluminum substrate so as to produce a structure composed of the anodized layer with a plurality of recesses. The method can produce a structure having regularly arranged recesses in a reduced time.
    Type: Application
    Filed: April 18, 2006
    Publication date: October 19, 2006
    Inventors: Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi