Abstract: In a gas purge apparatus, a load port apparatus, an installation stand for a purging container, and a gas purge method, the inside of the purging container can be filled with a cleaning gas without inclining the purging container. A control means drives a nozzle driving mechanism to move a purge nozzle toward a purge port based on a fixing detection signal detected by a fixing detection sensor showing that the purging container is fixed on a table.

Abstract: In a gas purge apparatus, a load port apparatus, an installation stand for a purging container, and a gas purge method, the inside of the purging container is filled with a cleaning gas until just before transportation, and a placement failure does not happen to the next purging container to be placed. A purge nozzle is moved to a direction separating from a purge port after detecting a movement of a table on which the purging container is installed to an undock position and a stop of a feeding of the cleaning gas.

Abstract: An object is to prevent the partial pressure of oxidative gas over time in an FOUP mounted on an FIMS system and left open. A surface purge unit is provided on a side opposite to the opening of the FOUP in such a way that wafers supported in the FOUP is located between the opening and the surface purge unit. The surface purge unit ejects inert gas from a plurality of vent holes provided in its surface toward the opening. Uniform purging or replacement of the interior of the FOUP with inert gas can be achieved by creating inert gas flow from an inert gas supply part extending over a surface in the direction from the interior of the FOUP toward the opening along the wafer surface.

Abstract: A load port unit can prevent or control leakage of inert gas from an EFEM system to the outside. The load port unit used in the EFEM system is provided with an air inlet that opens on a side facing a mini-environment between the upper end of an opener driving unit and the lower end of the pod. The width of the air inlet opening is larger than the width of the opening of the pod. With this arrangement, surplus gas is sucked from the pod when gas purging is performed on the pod.

Abstract: A gas purge unit 20 introduces a cleaning gas into a purging container 2 with an opening 2b therethrough. The gas purge unit 20 includes a first nozzle outlet 26 and a second nozzle outlet 28. The first nozzle outlet 26 blows out the cleaning gas from a lateral side line part of the opening 2b toward the inside of the purging container 2. The second nozzle outlet 28 blows out the cleaning gas from the lateral side line part of the opening 2b toward an opening surface of the opening 2b.

Abstract: An object is to prevent down flow gas from entering into a pod in an open state in an EFEM system. An upper canopy is provided along the upper edge of an opening portion on the mini-environment side to block down flow along the opening portion. The upper canopy provides a space in which inert gas supplied through a supply port provided in the pod flows into the mini-environment through the opening of the pod after circulating inside the pod. The down flow has no effect in this space, and the entrance of down flow into the pod can be prevented.

Abstract: To prevent an inert gas from stagnating in an internal space of a mount base of a load port apparatus, the load port apparatus includes: an outside air supply device for introducing an air from an external space, in which an operator works, into the internal space of the mount base; a casing surrounding a space in which a drive mechanism for a door is arranged; and a duct through which a gas inside the internal space of the casing is dischargeable.

Abstract: An object is to prevent the partial pressure of oxidative gas over time in an FOUP mounted on an FIMS system and left open. A surface purge unit is provided on a side opposite to the opening of the FOUP in such a way that wafers supported in the FOUP is located between the opening and the surface purge unit. The surface purge unit ejects inert gas from a plurality of vent holes provided in its surface toward the opening. Uniform purging or replacement of the interior of the FOUP with inert gas can be achieved by creating inert gas flow from an inert gas supply part extending over a surface in the direction from the interior of the FOUP toward the opening along the wafer surface.

Abstract: A system prevents oxidative gases in a FOUP which is fixed to an FIMS system in an open state from increasing over time. A tower type gas supply port extending from the bottom of the FOUP to inside is provided. Nitrogen can be supplied into the FOUP through the gas supply port in addition to nitrogen purge through the pod opening, when the pod is mounted on the FIMS. Two gas flows thus formed cooperate to create a gas flow flowing along the side of the FOUP opposite to the opening and to the opening. Thus, the gas in the interior of the FOUP is remounted with nitrogen uniformly.

Abstract: To prevent an increase with the passage of time in partial pressure of oxidizing gas in a FOUP, which is fixed to a FIMS system in an open state, a gas feed port is arranged on a lower surface of the FOUP so as to feed nitrogen to an inside of the FOUP through the gas feed port in a state where the FOUP is mounted on the FIMS system, in addition to nitrogen purge from an opening of the FOUP. A nitrogen feed system, which feeds nitrogen in a state where the FOUP is mounted on the FIMS system, is controlled so as to feed nitrogen at a low flow rate and a low pressure capable of suppressing the stirring-up of dust, which has a size that may cause a problem in wiring to be formed on a wafer, from the gas feed port and the like.

Abstract: Provided is a load port apparatus capable of suppressing leakage of an inert gas from a mini-environment. The load port apparatus includes: a main base configured to partition the mini-environment from an external space, the main base including an opening portion facing an opening of a pod and communicating the mini-environment to the external space; and a door configured to open and close the opening portion and hold a lid. With this, wafers are insertable and removable between the pod and the mini-environment. The load port apparatus further includes a flexible sealing plate arranged so as to project from the main base toward an inside of the opening portion, the flexible sealing plate being configured to abut against an abutment surface surrounding the opening of the pod.

Abstract: To generate a gas-curtain for a load-port-apparatus and to supply a purge-gas into a pod by a single gas source, provided is a gas purge device including: purge nozzles extending along an outer side of side edges of the opening portion; a curtain nozzle arranged above an upper edge of the opening portion; a gas supply pipe arranged in parallel to each purge nozzle, for supplying an inert gas to the purge nozzle and the curtain nozzle, the gas being supplied from the gas supply pipe to the purge nozzle in a direction orthogonal to an extending direction of the gas supply pipe; and a conductance adjusting unit arranged at an end portion of the gas supply pipe, for generating a pressure loss in a gas flow in a configuration in which the gas is supplied to the curtain nozzle at the end portion of the gas supply pipe.

Abstract: A load port unit can prevent or control leakage of inert gas from an EFEM system to the outside. The load port unit used in the EFEM system is provided with an air inlet that opens on a side facing a mini-environment between the upper end of an opener driving unit and the lower end of the pod. The width of the air inlet opening is larger than the width of the opening of the pod. With this arrangement, surplus gas is sucked from the pod when gas purging is performed on the pod.

Abstract: The partial pressure of an oxidizing gas within a FOUP fixed to a FIMS system and placed in an open state is prevented from increasing with the lapse of time. To that end, a gas supply port is arranged in the bottom face of the FOUP to enable nitrogen supply into the FOUP through the gas supply port with a pod mounted on the FIMS system. A nitrogen supply system for supplying nitrogen with the FOUP mounted is controlled so as to make a nitrogen supply at such a low flow rate and pressure as to be able to prevent dust or the like having such sizes as to possibly cause problems in wiring lines to be formed on a wafer from being stirred up from the gas supply port or the like.

Abstract: To generate a gas-curtain for a load-port-apparatus and to supply a purge-gas into a pod by a single gas source, provided is a gas purge device including: purge nozzles extending along an outer side of side edges of the opening portion; a curtain nozzle arranged above an upper edge of the opening portion; a gas supply pipe arranged in parallel to each purge nozzle, for supplying an inert gas to the purge nozzle and the curtain nozzle, the gas being supplied from the gas supply pipe to the purge nozzle in a direction orthogonal to an extending direction of the gas supply pipe; and a conductance adjusting unit arranged at an end portion of the gas supply pipe, for generating a pressure loss in a gas flow in a configuration in which the gas is supplied to the curtain nozzle at the end portion of the gas supply pipe.

Abstract: To prevent an inert gas from stagnating in an internal space of a mount base of a load port apparatus, the load port apparatus includes: an outside air supply device for introducing an air from an external space, in which an operator works, into the internal space of the mount base; a casing surrounding a space in which a drive mechanism for a door is arranged; and a duct through which a gas inside the internal space of the casing is dischargeable.