Patents by Inventor Tadashi Omatsu

Tadashi Omatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200384416
    Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A is a porous membrane containing a polyimide-based resin.
    Type: Application
    Filed: July 13, 2020
    Publication date: December 10, 2020
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadashi OMATSU, Tetsuya KAMIMURA, Tetsuya SHIMIZU, Satomi TAKAHASHI
  • Publication number: 20200368691
    Abstract: A filtering device is used for obtaining a chemical liquid by purifying a liquid to be purified and includes an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path that includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion. The filter A has a porous membrane made of ultra-high-molecular-weight polyethylene and a resin layer disposed to cover at least a portion of the surface of the porous membrane, and the resin layer includes a resin having a neutral group or an ion exchange group.
    Type: Application
    Filed: August 12, 2020
    Publication date: November 26, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Tetsuya KAMIMURA, Satomi TAKAHASHI, Tadashi OMATSU, Tetsuya SHIMIZU
  • Publication number: 20200368692
    Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series between the inlet portion and the outlet portion and extends from the inlet portion to the outlet portion, in which the filter A includes at least one kind of porous membrane selected from the group consisting of a first porous membrane having a porous base material made of polytetrafluoroethylene and a non-crosslinked coating which is formed to cover the porous base material and contains a perfluorosulfonic acid polymer and a second porous membrane containing polytetrafluoroethylene blended with a perfluorosulfonic acid polymer.
    Type: Application
    Filed: August 12, 2020
    Publication date: November 26, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Tetsuya SHIMIZU, Tetsuya KAMIMURA, Tadashi OMATSU, Satomi TAKAHASHI
  • Publication number: 20200368693
    Abstract: A filtering device for obtaining a chemical liquid by purifying a liquid to be purified has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series between the inlet portion and the outlet portion and extends from the inlet portion to the outlet portion, in which the filter A has a porous base material made of polyfluorocarbon and a coating layer which is disposed to cover the porous base material and contains a first resin having a hydrophilic group.
    Type: Application
    Filed: August 13, 2020
    Publication date: November 26, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OMATSU, Tetsuya KAMIMURA, Tetsuya SHIMIZU, Satomi TAKAHASHI
  • Publication number: 20200360861
    Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified, and the filtering device has an inlet portion, an outlet portion, a filter A, at least one filter B different from the filter A, and a flow path which includes the filter A and the filter B arranged in series and extends from the inlet portion to the outlet portion, in which the filter A has a porous base material made of polyfluorocarbon and a coating layer which is disposed to cover the porous base material and contains a resin having an adsorptive group.
    Type: Application
    Filed: July 20, 2020
    Publication date: November 19, 2020
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadashi OMATSU, Tetsuya Kamimura, Tetsuya Shimizu, Satomi Takahashi
  • Publication number: 20200360862
    Abstract: A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified and has an inlet portion, an outlet portion, a filter A, a filter B different from the filter A, and a flow path extending from the inlet portion to the outlet portion, in which the filter A and the filter B are arranged in series between the inlet portion and the outlet portion and have, and the filter A is selected from the group consisting of predetermined filters A1, A2, and A3.
    Type: Application
    Filed: August 3, 2020
    Publication date: November 19, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Tetsuya KAMIMURA, Tadashi OMATSU, Tetsuya SHIMIZU, Satomi TAKAHASHI
  • Publication number: 20200115105
    Abstract: A container has a base material and a coating layer which is disposed on at least a portion of the base material, contains a composition containing at least one kind of metal component selected from the group consisting of Ti, Al, Mg, Zr, Hf, Fe, Ni, Sn, Zn, Cr, and Mo, and has a thickness equal to or greater than 50 ?m. In a case where the composition contains one kind of metal component, a ratio RCAs calculated by CA1s/CA2s is less than 1.0. Alternatively, in a case where the composition contains two or more kinds of metal components, in at least a portion of the coating layer, an average of RCAs determined for each of two or more kinds of the metal components is less than 1.0.
    Type: Application
    Filed: December 11, 2019
    Publication date: April 16, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi Omatsu, Tetsuya Kamimura, Tetsuya Shimizu
  • Patent number: 10180623
    Abstract: The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: January 15, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Satoshi Wakamatsu, Tadashi Omatsu
  • Publication number: 20180120706
    Abstract: Provided are a pattern forming method including (1) a step of forming a resist underlayer film on a substrate to be processed, (2) a step of forming a resist film on the resist underlayer film, using a resist composition containing (A) a resin having a repeating unit containing a Si atom, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, (3) a step of exposing the resist film, (4) a step of developing the exposed resist film using a developer including an organic solvent, thereby forming a negative tone resist pattern, and (5) a step of processing the resist underlayer film and the substrate to be processed, using the resist pattern as a mask, thereby forming a pattern, in which the content of the resin (A) is 20% by mass or more with respect to the total solid content of the resist composition.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Keiyu OU, Naoya HATAKEYAMA, Akiyoshi GOTO, Keita KATO, Takashi YAKUSHIJI, Tadashi OMATSU
  • Patent number: 9868846
    Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: January 16, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Yuichiro Enomoto, Kazuyuki Usuki, Tadashi Omatsu, Hirotaka Kitagawa
  • Publication number: 20170363955
    Abstract: The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.
    Type: Application
    Filed: August 2, 2017
    Publication date: December 21, 2017
    Inventors: Satoshi WAKAMATSU, Tadashi OMATSU
  • Patent number: 9724916
    Abstract: An aspect of the present invention provides an ejection volume correction method for an inkjet head, including: an arranging step of ejecting functional ink as ink droplets from nozzles of an inkjet head so as to discretely arrange the ink droplets on a front surface of a substrate; a contacting step of filling the functional ink in between a mold and the substrate by causing the mold to contact the ink droplets arranged on the front surface of the substrate; a curing step of curing the filled functional ink so as to generate a functional film; a separating step of separating the mold from the functional film; a measuring step of measuring a thickness of the functional film; and a correcting step of correcting an ejection volume from the nozzles based on the measured thickness.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: August 8, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Kenichi Kodama, Tadashi Omatsu
  • Patent number: 9354356
    Abstract: A polymer film that has an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (i) and (ii), and that further has a surface energy of at least one surface is from 50 mN/m to 80 mN/m: 0?Re(630)?10, and |Rth(630)|?25;??(i) and |Re(400)?Re(700)|?10, and |Rth(400)?Rth(700)|?35.??(ii) in the formulae, Re(?) and Rth(?) are measurement values at the wavelength of ? nm, and an optically-compensatory film, an optical material such as a polarizer and a liquid-crystal display device using the polymer film.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: May 31, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Omatsu, Hajime Nakayama, Akihiro Matsufuji, Osamu Takahashi, Shigeaki Nimura, Yousuke Nishiura
  • Patent number: 9195090
    Abstract: A polymer film that has: a ratio R (VT/VM) of a sound velocity in a transverse direction VT to a sound velocity in a machine direction VM of from 1.05 to 1.50; and an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (I): (I) 0?Re(630)?10, and |Rth(630)|?25, wherein Re(?) represents an in-plane retardation at a wavelength of ? (nm); and Rth(?) represents a thickness-direction retardation at a wavelength of ? (nm).
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: November 24, 2015
    Assignee: FUJIFILM Corporation
    Inventor: Tadashi Omatsu
  • Patent number: 9091804
    Abstract: A polymer film that has an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (i) and (ii), and that further has a surface energy of at least one surface is from 50 mN/m to 80 mN/m: 0?Re(630)?10, and |Rth(630)|?25; and??(i) |Re(400)?Re(700)|?10, and |Rth(400)?Rth(700)|?35.??(ii) in the formulae, Re(?) and Rth(?) are measurement values at the wavelength of ? nm, and an optically-compensatory film, an optical material such as a polarizer and a liquid-crystal display device using the polymer film.
    Type: Grant
    Filed: August 5, 2005
    Date of Patent: July 28, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Omatsu, Hajime Nakayama, Akihiro Matsufuji, Osamu Takahashi, Shigeaki Nimura, Takako Nishiura
  • Patent number: 9005512
    Abstract: A resist layer constituted by a resist composition (which may include unavoidable impurities) including a polymerizable compound that includes polyfunctional monomers that become polymers having three dimensional structures by cross linking when polymerized and a polymerization initiating agent which is activated by one of light and an electron beam is formed on a substrate. A surface of a mold having a predetermined pattern of protrusions and recesses is pressed against the resist layer. Light is irradiated onto the resist layer to cure the resist layer. The mold is separated from the resist layer under conditions that the temperature of the resist layer is 40° C. or greater.
    Type: Grant
    Filed: October 9, 2012
    Date of Patent: April 14, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Omatsu, Satoshi Wakamatsu
  • Patent number: 8894187
    Abstract: A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: November 25, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Kenichi Kodama, Tadashi Omatsu, Satoshi Wakamatsu, Kunihiko Kodama
  • Patent number: 8851636
    Abstract: A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: October 7, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Kenichi Kodama, Tadashi Omatsu, Satoshi Wakamatsu, Kunihiko Kodama
  • Publication number: 20140285550
    Abstract: A nozzle ejects a functional liquid having a viscosity of not less than 5 millipascal·second and not more than 20 millipascal·second, onto a substrate. The functional liquid inside a pressure chamber connected to the nozzle is pressurized. A drive voltage having a pull waveform element which causes the pressure chamber to expand from a steady state and a push waveform element which causes the expanded pressure chamber to contract, is generated with a relationship between a slope ?1 representing voltage change per unit time in the pull waveform element, the viscosity ? of the functional liquid, a resonance period Tc of the head, and a slope ?2 representing voltage change per unit time in the push waveform element satisfying (2/Tc)??1?(?/10) and ?2??1.
    Type: Application
    Filed: September 23, 2013
    Publication date: September 25, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kenichi KODAMA, Kunihiko KODAMA, Tadashi OMATSU
  • Publication number: 20140210140
    Abstract: A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Tadashi OMATSU, Kazuharu Nakamura, Satoshi Wakamatsu