Abstract: A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting.

Abstract: An aspect of the present invention provides an ejection volume correction method for an inkjet head, including: an arranging step of ejecting functional ink as ink droplets from nozzles of an inkjet head so as to discretely arrange the ink droplets on a front surface of a substrate; a contacting step of filling the functional ink in between a mold and the substrate by causing the mold to contact the ink droplets arranged on the front surface of the substrate; a curing step of curing the filled functional ink so as to generate a functional film ; a separating step of separating the mold from the functional film; a measuring step of measuring a thickness of the functional film; and a correcting step of correcting an ejection volume from the nozzles based on the measured thickness.

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

Abstract: A polymer film that has: a ratio R (VT/VM) of a sound velocity in a transverse direction VT to a sound velocity in a machine direction VM of from 1.05 to 1.50; and an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (I): (I) 0?Re(630)?10, and |Rth(630)|?25, wherein Re(?) represents an in-plane retardation at a wavelength of ? (nm); and Rth(?) represents a thickness-direction retardation at a wavelength of ? (nm).

Abstract: Positions on a mold at which foreign matter is present are detected, and adhered position information related to the positions is obtained. Corresponding position information related to positions on a substrate, which are positions that correspond to the positions of the foreign matter when a pattern of protrusions and recesses and a surface of the substrate on which a curable composition is coated face each other and undergo a predetermined positioning operation, is generated based on the adhered position information. At least one droplet of the curable composition is arranged at the positions of the substrate. The pattern of protrusions and recesses is pressed against the surface of the substrate on which the composition is coated while administering the predetermined positioning operation. The curable composition is cured, and the mold is separated from the cured composition. Thereby, foreign matter adhered to molds can be removed efficiently and at low cost.

Abstract: Droplets of resist material are coated using the ink jet method under conditions that: the viscosity of the resist material is within a range from 8 cP to 20 cP, the surface energy of the resist material is within a range from 25 mN/m to 35 mN/m, the amount of resist material in each of the droplets is within a range from 1 pl to 10 pl, and the placement intervals among the droplets are within a range from 10 ?m to 1000 ?m. A mold is pressed against the surface of the substrate in a He and/or a depressurized atmosphere such that: an intersection angle formed between a main scanning direction of the ink jet method and the direction of the lines of the linear pattern of protrusions and recesses, which is an intersection angle when pressing the mold against the surface of the substrate, is within a range from 30° to 90°.

Abstract: A polymer film that has: a ratio R (VT/VM) of a sound velocity in a transverse direction VT to a sound velocity in a machine direction VM of from 1.05 to 1.50; and an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (I): (I) 0?Re(630)?10, and |Rth(630)|?25, wherein Re(?) represents an in-plane retardation at a wavelength of ? (nm); and Rth(?) represents a thickness-direction retardation at a wavelength of ? (nm).

Abstract: A nanoimprinting mold has a fine pattern of protrusions and recesses constituted by a plurality of linear protrusions and a plurality of recesses on the surface thereof. The pattern of protrusions and recesses includes at least one recess having an end portion of a predetermined shape. The predetermined shape is that which has a cross section with a smaller aspect ratio than an aspect ratio of a cross section of a connecting portion, which is a portion of the recess having the end portion other than the end portion and continuous therewith. Thereby, the collapse of the end portions of protrusions of a pattern on curable resin when a mold is pressed against the curable resin on a substrate then separated therefrom can be suppressed, in nanoimprinting that employs a mold having a predetermined fine pattern of protrusions and recesses on the surface thereof.

Abstract: A polymer film that has an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (i) and (ii), and that further has a surface energy of at least one surface is from 50 mN/m to 80 mN/m: 0?Re(630)?10, and |Rth(630)|?25;??(i) and |Re(400)?Re(700)|?10, and |Rth(400)?Rth(700)|?35.??(ii) in the formulae, Re(?) and Rth(?) are measurement values at the wavelength of ? nm, and an optically-compensatory film, an optical material such as a polarizer and a liquid-crystal display device using the polymer film.

Abstract: To provide a resist composition including: at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.; a fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater; and a fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.

Abstract: Collapse of resist patterns in the formation of resist patterns that employ chemically amplified resist material is suppressed. A method for forming a resist pattern includes the steps of: coating a substrate with a chemically amplified resist material; exposing the resist material; and developing the exposed resist material, to form a resist pattern having an aspect ratio AR of 1.5 or greater in a resist film formed by the resist material. A close contact process that improves close contact properties between the substrate and the resist film is controlled such that the thickness of residual film of the resist film is greater than or equal to 1 nm and less than or equal to 1.83·AR+1.73 nm.

Abstract: Volatilization of a photocuring composition is suppressed while reducing residual gas in a nanoimprinting method. A nanoimprinting method transfers the shapes of protrusions and recesses of a mold onto a photocuring composition layer formed on a substrate, by placing the mold and the photocuring composition layer in close contact. One or both of the mold and the substrate is formed by quartz. The mold and the substrate are placed in close contact with a gas having at least 70% He by volume and a pressure within a range from 10 kPa to 90 kPa interposed therebetween.

Abstract: The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.

Abstract: A polymer film that has: a ratio R (VT/VM) of a sound velocity in a transverse direction VT to a sound velocity in a machine direction VM of from 1.05 to 1.50; and an in-plane retardation Re(?) and a thickness-direction retardation Rth(?) satisfying formula (I): (I) 0?Re(630)?10, and |Rth(630)|25, wherein Re(?) represents an in-plane retardation at a wavelength of ? (nm); and Rth(?) represents a thickness-direction retardation at a wavelength of ? (nm).

Abstract: A method of producing a cellulose derivative film, the method comprising: forming a film with a solvent cast method from a dope including a cellulose derivative satisfying following conditions (a) and (b): (a) at least one among three hydroxyl groups included in a glucose unit of cellulose is substituted by a substituent of which a polarizability anisotropy ?? represented as following Expression (1) is 2.5×10?24 cm3 or higher: Expression (1): ??=?x?(?y+?z)/2, wherein ?x, ?y and ?z is as defined in the specification; and (b) when a substitution degree by a substituent of which ?? is 2.5×10?24 cm3 or higher is PA, and a substitution degree by a substituent of which ?? is lower than 2.5×10?24 cm3 is PB, the PA and PB satisfy following Expressions (3) and (4): Expression (3): 2PA+PB>3.0; and Expression (4): PA>0.2.

Abstract: A cellulose derivative film having high optical isotropy over the whole visible region and high durability against high temperature and humidity conditions is provided. The film contains a cellulose derivative having a substituent the polarizability anisotropy ?? (=?x?(?y+?z)/2) of which is 2.5×10?24 cm3 or more, and the film has an in-plane retardation Re and a thickness direction retardation Rth satisfying the respective inequalities: |Rth(589)|?25 nm and |Re(589)|?10 nm. Also provided are an optical compensation film, a polarizing plate, and a liquid crystal device that use the cellulose derivative film and exhibit excellent viewing angle characteristics and durability.

Abstract: To provide a mold structure used to produce a discrete track medium, including in a surface of the mold structure: a plurality of line pattern forming concave portions which are positioned so as to be adjacent and substantially parallel to each other; and a communicating concave portion which is positioned so as to intersect the line pattern forming concave portions and connects the line pattern forming concave portions.

Abstract: To provide a resist composition including: at least one polymerizable compound having a viscosity of 100 mPa·s or less at 25° C.; a fluorine-containing compound A having a viscosity of 5,000 mPa·s or greater at 25° C., and a fluorine content of 10% by mass or greater; and a fluorine-containing compound B having a viscosity of 2,000 mPa·s or less at 25° C., and a fluorine content of 10% by mass or greater.

Abstract: To provide a mold structure used to produce a discrete track medium, including in a surface of the mold structure: a plurality of line pattern forming concave portions which are positioned so as to be adjacent and substantially parallel to each other; and a communicating concave portion which is positioned so as to intersect the line pattern forming concave portions and connects the line pattern forming concave portions.

Abstract: A method of producing a cellulose derivative film, the method comprising: forming a film with a solvent cast method from a dope including a cellulose derivative satisfying following conditions (a) and (b): (a) at least one among three hydroxyl groups included in a glucose unit of cellulose is substituted by a substituent of which a polarizability anisotropy ?? represented as following Expression (1) is 2.5×10?24 cm3 or higher: Expression (1): ??=?x?(?y+?z)/2, wherein ?x, ?y and ?z is as defined in the specification; and (b) when a substitution degree by a substituent of which ?? is 2.5×10?24 cm3 or higher is PA, and a substitution degree by a substituent of which ?? is lower than 2.5×10?24 cm3 is PB, the PA and PB satisfy following Expressions (3) and (4): Expression (3): 2PA+PB>3.0; and Expression (4): PA>0.2.