Patents by Inventor Tadashi Oomatsu
Tadashi Oomatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11453734Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can accomplish suppression of generation of defects on a pattern and reduction in bridge defects of the pattern at the same time. The pattern forming method of an embodiment of the present invention is a pattern forming method by forming a resist film on a substrate using a resist composition including at least a resin whose polarity increases by the action of an acid, a photoacid generator, and a solvent, exposing the resist film, and then treating the exposed resist film with a treatment liquid to form a pattern, in which the treatment liquid includes two or more organic solvents, a boiling point of at least one organic solvent of the two or more organic solvents is 120° C. to 155° C., a content of the organic solvent having a boiling point of 120° C. to 155° C.Type: GrantFiled: April 29, 2019Date of Patent: September 27, 2022Assignee: FUJIFILM CorporationInventors: Tetsuya Kamimura, Michihiro Shirakawa, Tadashi Oomatsu
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Publication number: 20210139231Abstract: The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.Type: ApplicationFiled: December 31, 2020Publication date: May 13, 2021Applicant: FUJIFILM CorporationInventors: Tetsuya KAMIMURA, Satomi TAKAHASHI, Tadashi OOMATSU, Tetsuya SHIMIZU
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Publication number: 20210132503Abstract: An object of the present invention is to provide a chemical liquid which exhibits excellent defect inhibition performance even after long-term preservation, a kit, a pattern forming method, a chemical liquid manufacturing method, and a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent, an acid component, and a metal component. The content of the acid component is equal to or greater than 1 mass ppt and equal to or smaller than 15 mass ppm with respect to the total mass of the chemical liquid. The content of the metal component is 0.001 to 100 mass ppt with respect to the total mass of the chemical liquid.Type: ApplicationFiled: January 8, 2021Publication date: May 6, 2021Applicant: FUJIFILM CorporationInventors: Tadashi OOMATSU, Tetsuya KAMIMURA, Tetsuya SHIMIZU, Satomi TAKAHASHI, Akihiko OHTSU
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Publication number: 20210130084Abstract: The present invention provides a member which makes is possible to obtain excellent residue defect inhibition properties and excellent bridge defect inhibition properties of a chemical liquid in a case where the member is brought into contact with the chemical liquid. The present invention also provides a container, a chemical liquid storage body, a reactor, a distillation column, a filter unit, a storage tank, a pipe line, and a chemical liquid manufacturing method. The member according to an embodiment of the present invention is a member that will be brought into contact with a chemical liquid. A surface of the member is constituted with stainless steel containing chromium atoms and iron atoms. In a case where an atomic ratio of the chromium atoms to the iron atoms is measured from the surface of the member to a position 10 nm below the surface in a depth direction, a maximum value of the atomic ratio is found in a region extending 3 nm from the surface of the member in the depth direction.Type: ApplicationFiled: January 5, 2021Publication date: May 6, 2021Applicant: FUJIFILM CorporationInventors: Tetsuya SHIMIZU, Tetsuya KAMIMURA, Satomi TAKAHASHI, Tadashi OOMATSU
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Patent number: 10626287Abstract: A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.Type: GrantFiled: December 14, 2016Date of Patent: April 21, 2020Assignee: FUJIFILM CorporationInventors: Hirotaka Kitagawa, Tadashi Oomatsu
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Publication number: 20190258168Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can accomplish suppression of generation of defects on a pattern and reduction in bridge defects of the pattern at the same time. The pattern forming method of an embodiment of the present invention is a pattern forming method by forming a resist film on a substrate using a resist composition including at least a resin whose polarity increases by the action of an acid, a photoacid generator, and a solvent, exposing the resist film, and then treating the exposed resist film with a treatment liquid to form a pattern, in which the treatment liquid includes two or more organic solvents, a boiling point of at least one organic solvent of the two or more organic solvents is 120° C. to 155° C., a content of the organic solvent having a boiling point of 120° C. to 155° C.Type: ApplicationFiled: April 29, 2019Publication date: August 22, 2019Applicant: FUJIFILM CorporationInventors: Tetsuya KAMIMURA, Michihiro SHIRAKAWA, Tadashi OOMATSU
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Patent number: 10373863Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure. A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.Type: GrantFiled: March 24, 2017Date of Patent: August 6, 2019Assignee: FUJIFILM CorporationInventors: Yuichiro Goto, Tadashi Oomatsu
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Patent number: 10246605Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.Type: GrantFiled: February 24, 2017Date of Patent: April 2, 2019Assignee: FUJIFILM CorporationInventors: Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Goto
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Patent number: 10191375Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent.Type: GrantFiled: February 3, 2017Date of Patent: January 29, 2019Assignee: FUJIFILM CorporationInventors: Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Goto
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Publication number: 20180037688Abstract: Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.Type: ApplicationFiled: September 13, 2017Publication date: February 8, 2018Applicant: FUJIFILM CorporationInventors: Yuichiro GOTO, Kazuhiro MARUMO, Hirotaka KITAGAWA, Tadashi OOMATSU
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Patent number: 9862847Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.Type: GrantFiled: December 23, 2015Date of Patent: January 9, 2018Assignee: FUJIFILM CorporationInventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
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Publication number: 20180002561Abstract: Disclosed herein are a resin composition for underlayer film formation which is capable of forming an underlayer film having good adhesiveness to a base material and good surface state, an imprint forming kit, a laminate, a pattern forming method, and a method for producing a device. Provided is a resin composition for underlayer film formation, including a resin, a nucleophilic catalyst, and a solvent, in which the content of the nucleophilic catalyst is 0.01 to 0.3 mass % with respect to the solid content of the resin composition for underlayer film formation.Type: ApplicationFiled: September 12, 2017Publication date: January 4, 2018Applicant: FUJIFILM CorporationInventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
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Publication number: 20170200639Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure. A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.Type: ApplicationFiled: March 24, 2017Publication date: July 13, 2017Applicant: FUJIFILM CorporationInventors: Yuichiro GOTO, Tadashi OOMATSU
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Publication number: 20170158905Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.Type: ApplicationFiled: February 24, 2017Publication date: June 8, 2017Applicant: FUJIFILM CorporationInventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
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Publication number: 20170146907Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent.Type: ApplicationFiled: February 3, 2017Publication date: May 25, 2017Applicant: FUJIFILM CorporationInventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
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Publication number: 20170088743Abstract: A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.Type: ApplicationFiled: December 14, 2016Publication date: March 30, 2017Applicant: FUJIFILM CorporationInventors: Hirotaka KITAGAWA, Tadashi OOMATSU
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Patent number: 9507263Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms?number of oxygen atoms).Type: GrantFiled: April 4, 2014Date of Patent: November 29, 2016Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Shinji Tarutani, Yuichiro Enomoto, Tadashi Oomatsu, Takayuki Ito, Hirotaka Kitagawa, Akiko Hattori
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Publication number: 20160122563Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.Type: ApplicationFiled: December 23, 2015Publication date: May 5, 2016Applicant: FUJIFILM CorporationInventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
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Publication number: 20160009945Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.Type: ApplicationFiled: September 25, 2015Publication date: January 14, 2016Applicant: FUJIFILM CORPORATIONInventors: Yuichiro ENOMOTO, Hirotaka KITAGAWA, Tadashi OOMATSU, Yuichiro GOTO
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Publication number: 20150228498Abstract: To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.Type: ApplicationFiled: April 27, 2015Publication date: August 13, 2015Applicant: FUJIFILM CORPORATIONInventors: Akiko HATTORI, Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro ENOMOTO