Patents by Inventor Tadashi Oomatsu

Tadashi Oomatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210139231
    Abstract: The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.
    Type: Application
    Filed: December 31, 2020
    Publication date: May 13, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Tetsuya KAMIMURA, Satomi TAKAHASHI, Tadashi OOMATSU, Tetsuya SHIMIZU
  • Publication number: 20210130084
    Abstract: The present invention provides a member which makes is possible to obtain excellent residue defect inhibition properties and excellent bridge defect inhibition properties of a chemical liquid in a case where the member is brought into contact with the chemical liquid. The present invention also provides a container, a chemical liquid storage body, a reactor, a distillation column, a filter unit, a storage tank, a pipe line, and a chemical liquid manufacturing method. The member according to an embodiment of the present invention is a member that will be brought into contact with a chemical liquid. A surface of the member is constituted with stainless steel containing chromium atoms and iron atoms. In a case where an atomic ratio of the chromium atoms to the iron atoms is measured from the surface of the member to a position 10 nm below the surface in a depth direction, a maximum value of the atomic ratio is found in a region extending 3 nm from the surface of the member in the depth direction.
    Type: Application
    Filed: January 5, 2021
    Publication date: May 6, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Tetsuya SHIMIZU, Tetsuya KAMIMURA, Satomi TAKAHASHI, Tadashi OOMATSU
  • Publication number: 20210132503
    Abstract: An object of the present invention is to provide a chemical liquid which exhibits excellent defect inhibition performance even after long-term preservation, a kit, a pattern forming method, a chemical liquid manufacturing method, and a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent, an acid component, and a metal component. The content of the acid component is equal to or greater than 1 mass ppt and equal to or smaller than 15 mass ppm with respect to the total mass of the chemical liquid. The content of the metal component is 0.001 to 100 mass ppt with respect to the total mass of the chemical liquid.
    Type: Application
    Filed: January 8, 2021
    Publication date: May 6, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Tetsuya KAMIMURA, Tetsuya SHIMIZU, Satomi TAKAHASHI, Akihiko OHTSU
  • Patent number: 10626287
    Abstract: A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.
    Type: Grant
    Filed: December 14, 2016
    Date of Patent: April 21, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Tadashi Oomatsu
  • Publication number: 20190258168
    Abstract: An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can accomplish suppression of generation of defects on a pattern and reduction in bridge defects of the pattern at the same time. The pattern forming method of an embodiment of the present invention is a pattern forming method by forming a resist film on a substrate using a resist composition including at least a resin whose polarity increases by the action of an acid, a photoacid generator, and a solvent, exposing the resist film, and then treating the exposed resist film with a treatment liquid to form a pattern, in which the treatment liquid includes two or more organic solvents, a boiling point of at least one organic solvent of the two or more organic solvents is 120° C. to 155° C., a content of the organic solvent having a boiling point of 120° C. to 155° C.
    Type: Application
    Filed: April 29, 2019
    Publication date: August 22, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Tetsuya KAMIMURA, Michihiro SHIRAKAWA, Tadashi OOMATSU
  • Patent number: 10373863
    Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure. A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: August 6, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu
  • Patent number: 10246605
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: April 2, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Goto
  • Patent number: 10191375
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: January 29, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Goto
  • Publication number: 20180037688
    Abstract: Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.
    Type: Application
    Filed: September 13, 2017
    Publication date: February 8, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Kazuhiro MARUMO, Hirotaka KITAGAWA, Tadashi OOMATSU
  • Patent number: 9862847
    Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
    Type: Grant
    Filed: December 23, 2015
    Date of Patent: January 9, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
  • Publication number: 20180002561
    Abstract: Disclosed herein are a resin composition for underlayer film formation which is capable of forming an underlayer film having good adhesiveness to a base material and good surface state, an imprint forming kit, a laminate, a pattern forming method, and a method for producing a device. Provided is a resin composition for underlayer film formation, including a resin, a nucleophilic catalyst, and a solvent, in which the content of the nucleophilic catalyst is 0.01 to 0.3 mass % with respect to the solid content of the resin composition for underlayer film formation.
    Type: Application
    Filed: September 12, 2017
    Publication date: January 4, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170200639
    Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure. A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.
    Type: Application
    Filed: March 24, 2017
    Publication date: July 13, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Tadashi OOMATSU
  • Publication number: 20170158905
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.
    Type: Application
    Filed: February 24, 2017
    Publication date: June 8, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170146907
    Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device. A resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and at least one group selected from a group represented by General Formula (B), an oxiranyl group and an oxetanyl group, a nonionic surfactant and a solvent.
    Type: Application
    Filed: February 3, 2017
    Publication date: May 25, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro GOTO
  • Publication number: 20170088743
    Abstract: A resin composition for underlayer film formation capable of forming an underlayer film having good adhesiveness and excellent surface flatness, a layered product, a method for forming a pattern and a process for producing a device are provided. The resin composition for underlayer film formation includes a resin having a group represented by General Formula (A) and a group represented by General Formula (B), and a solvent. Ra1 represents a hydrogen atom or a methyl group, Rb1 and Rb2 each independently represents an unsubstituted linear or branched alkyl group having 1 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, Rb3 represents an unsubstituted linear or branched alkyl group having 2 to 20 carbon atoms or an unsubstituted cycloalkyl group having 3 to 20 carbon atoms, and Rb2 and Rb3 may be bonded to each other to form a ring.
    Type: Application
    Filed: December 14, 2016
    Publication date: March 30, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Hirotaka KITAGAWA, Tadashi OOMATSU
  • Patent number: 9507263
    Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms?number of oxygen atoms).
    Type: Grant
    Filed: April 4, 2014
    Date of Patent: November 29, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Shinji Tarutani, Yuichiro Enomoto, Tadashi Oomatsu, Takayuki Ito, Hirotaka Kitagawa, Akiko Hattori
  • Publication number: 20160122563
    Abstract: The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
    Type: Application
    Filed: December 23, 2015
    Publication date: May 5, 2016
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu, Hirotaka Kitagawa, Yuichiro Enomoto, Kenichi Kodama
  • Publication number: 20160009945
    Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.
    Type: Application
    Filed: September 25, 2015
    Publication date: January 14, 2016
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Hirotaka KITAGAWA, Tadashi OOMATSU, Yuichiro GOTO
  • Publication number: 20150228498
    Abstract: To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.
    Type: Application
    Filed: April 27, 2015
    Publication date: August 13, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akiko HATTORI, Tadashi OOMATSU, Hirotaka KITAGAWA, Yuichiro ENOMOTO
  • Publication number: 20150014819
    Abstract: Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.
    Type: Application
    Filed: September 24, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akiko HATTORI, Hirotaka KITAGAWA, Yuichiro ENOMOTO, Tadashi OOMATSU