Patents by Inventor Tadashi Oomatsu

Tadashi Oomatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • UNDERLYING FILM COMPOSITION FOR IMPRINTS AND PATTERN FORMING METHOD USING THE SAME
    Publication number: 20150014819
    Abstract: Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.
    Type: Application
    Filed: September 24, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Akiko HATTORI, Hirotaka KITAGAWA, Yuichiro ENOMOTO, Tadashi OOMATSU
  • UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME
    Publication number: 20140220353
    Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.
    Type: Application
    Filed: April 4, 2014
    Publication date: August 7, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kunihiko KODAMA, Shinji TARUTANI, Yuichiro ENOMOTO, Tadashi OOMATSU, Takayuki ITO, Hirotaka KITAGAWA, Akiko HATTORI
  • CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN
    Publication number: 20130052431
    Abstract: Provided is a curable composition for imprints capable of ensuring good patternability after repetitive transfer of pattern, and less causative of defects. The curable composition for imprints comprising a polymerizable compound (A), a photo-polymerization initiator (B) and a non-polymerizable compound (C); the non-polymerizable compound (C) dissolving into the curable composition for imprints in an exothermic manner.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 28, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuichiro ENOMOTO, Kunihiko KODAMA, Shinji TARUTANI, Hirotaka KITAGAWA, Tadashi OOMATSU
  • Curable composition for nanoimprint, and patterning method
    Patent number: 8025833
    Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: September 27, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Akinori Fujita, Tadashi Oomatsu, Akiyoshi Goto
  • CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD
    Publication number: 20090283937
    Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
    Type: Application
    Filed: May 26, 2009
    Publication date: November 19, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Akinori FUJITA, Tadashi OOMATSU, Akiyoshi GOTO