Patents by Inventor Tadayuki Yamaguchi
Tadayuki Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8065113Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from an assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when problems arise, repair from the control device (1) is possible. The control device (1) tallies sample data and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and it can perform external quality control in real time.Type: GrantFiled: September 4, 2009Date of Patent: November 22, 2011Assignee: Sysmex CorporationInventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Patent number: 8010223Abstract: There is provided a quality control system capable of displaying a display screen regarding quality control of an testing, including a display control part for performing a display control of the display screen regarding the quality control, wherein the display control part displays the display screen on a display in accordance with a category of a quality control sample used by a user.Type: GrantFiled: April 20, 2007Date of Patent: August 30, 2011Assignee: Sysmex CorporationInventors: Tadayuki Yamaguchi, Minoru Takayanagi, Takeshi Matsumoto, Tamiko Fujita
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Patent number: 8007968Abstract: In the present invention, patterning for the first time is performed on a film to be worked above the front surface of a substrate, and the actual dimension of the pattern formed by the patterning for the first time is measured. Based on the dimension measurement result of the patterning or the first time, the condition of patterning for the second time is then set. In this event, the condition of the patterning for the second time is set so that a difference between the dimension of the patterning for the first time and its target dimension is equal to a difference between the dimension of the patterning for the second time and its target dimension. Thereafter, the patterning for the second time is performed under the set patterning condition.Type: GrantFiled: July 25, 2007Date of Patent: August 30, 2011Assignee: Tokyo Electron LimitedInventors: Yoshiaki Yamada, Tadayuki Yamaguchi, Yuuichi Yamamoto, Yasuhito Saiga, Kazuo Sawai
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Patent number: 7998741Abstract: The objective of the present invention is to provide a remote control method which allows a technician, etc. in a support center to remote-control a clinical specimen processing device, and a remote control system, a status informing device and a control apparatus used for such a method. The remote control method of the present invention, which is a remote control method for remote-controlling the clinical specimen processing device that processes a clinical specimen, is designed so that an image of the clinical specimen processing device is picked up by an image pickup device, and the image picked up by the image pickup device is supplied to a control apparatus located at a remote place from the clinical specimen processing device through a communication network so that the picked-up image is displayed on the control apparatus.Type: GrantFiled: August 31, 2005Date of Patent: August 16, 2011Assignee: Sysmex CorporationInventors: Mizuho Nishikiori, Tadayuki Yamaguchi, Hiroshi Murakami
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Publication number: 20110191409Abstract: The objective of the present invention is to provide a remote control method which allows a technician, etc. in a support center to remote-control a clinical specimen processing device, and a remote control system, a status informing device and a control apparatus used for such a method. The remote control method of the present invention, which is a remote control method for remote-controlling the clinical specimen processing device that processes a clinical specimen, is designed so that an image of the clinical specimen processing device is picked up by an image pickup device, and the image picked up by the image pickup device is supplied to a control apparatus located at a remote place from the clinical specimen processing device through a communication network so that the picked-up image is displayed on the control apparatus.Type: ApplicationFiled: March 28, 2011Publication date: August 4, 2011Inventors: Mizuho Nishikiori, Tadayuki Yamaguchi, Hiroshi Murakami
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Patent number: 7925461Abstract: A quality control method using a plurality of analyzers and a control device connected to the analyzers via a network, the method comprising: (a) measuring quality control samples by the analyzers; (b) collecting a plurality of quality control data obtained by measuring the quality control samples; (c) implementing a quality control by the control device based on the collected quality control data; (d) obtaining uncertainty of measurement of analyzer based on uncertainty of analyzer calibration and the quality control data; (e) outputting a result of the quality control; and (f) outputting the uncertainty of measurement is disclosed. A quality control system and an analyzer are also disclosed.Type: GrantFiled: September 21, 2007Date of Patent: April 12, 2011Assignee: Sysmex CorporationInventors: Tadayuki Yamaguchi, Atsushi Shirakami, Etsuro Shinkai, Yasuhiro Ochi
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Patent number: 7901149Abstract: A substrate on which a resist film has been formed is transferred to an aligner and subjected to exposure processing. The substrate is then subjected to post-exposure baking in a second processing system. The substrate is then transferred again to the aligner and subjected to exposure processing. The substrate for which exposure processing for the second time has been finished is transferred to a first processing system and again subjected to post-exposure baking. The time periods from the ends of the exposure processing to the starts of the post-exposure baking for the first time and the second time are controlled to be equal. In pattern forming processing in which exposure processing is performed a plurality of times between the resist film forming processing and the developing treatment, a pattern with a desired dimension can be finally formed.Type: GrantFiled: July 19, 2007Date of Patent: March 8, 2011Assignee: Tokyo Electron LimitedInventors: Yoshiaki Yamada, Tadayuki Yamaguchi, Yuuichi Yamamoto, Yasuhito Saiga
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Publication number: 20100127885Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from an assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when problems arise, repair from the control device (1) is possible. The control device (1) tallies sample data and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and it can perform external quality control in real time.Type: ApplicationFiled: November 19, 2009Publication date: May 27, 2010Inventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Patent number: 7725297Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when troubles arise repair from the control device (1) is possible. The control device (1) tallies sample data, and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and can perform external quality control in real time.Type: GrantFiled: August 15, 2007Date of Patent: May 25, 2010Assignee: Sysmex CorporationInventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Publication number: 20100057873Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from an assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when problems arise, repair from the control device (1) is possible. The control device (1) tallies sample data and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and it can perform external quality control in real time.Type: ApplicationFiled: September 4, 2009Publication date: March 4, 2010Inventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Patent number: 7606680Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from an assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when problems arise, repair from the control device (1) is possible. The control device (1) tallies sample data and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and it can perform external quality control in real time.Type: GrantFiled: August 15, 2007Date of Patent: October 20, 2009Assignee: Sysmex CorporationInventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Publication number: 20090258304Abstract: In the present invention, patterning for the first time is performed on a film to be worked above the front surface of a substrate, and the actual dimension of the pattern formed by the patterning for the first time is measured. Based on the dimension measurement result of the patterning or the first time, the condition of patterning for the second time is then set. In this event, the condition of the patterning for the second time is set so that a difference between the dimension of the patterning for the first time and its target dimension is equal to a difference between the dimension of the patterning for the second time and its target dimension. Thereafter, the patterning for the second time is performed under the set patterning condition.Type: ApplicationFiled: July 25, 2007Publication date: October 15, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Yoshiaki Yamada, Tadayuki Yamaguchi, Yuuichi Yamamoto, Yasuhito Saiga, Kazuo Sawai
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Publication number: 20090234905Abstract: A maintenance information management method comprising steps of: by a terminal processing apparatus, transmitting, to a management apparatus via a network, maintenance work information about an analyzer on which maintenance work has been performed; storing, in a maintenance work information storage section of the management apparatus, the maintenance work information transmitted via the network; and transmitting, to the terminal processing apparatus via the network, the maintenance work information of the analyzer, which is stored in the maintenance work information storage section.Type: ApplicationFiled: March 10, 2009Publication date: September 17, 2009Applicant: SYSMEX CORPORATIONInventors: Tadayuki YAMAGUCHI, Takeshi Matsumoto
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Publication number: 20090208879Abstract: In the present invention, a substrate on which a resist film has been formed is transferred to an aligner and subjected to exposure processing. The substrate is then subjected to post-exposure baking in a second processing system. The substrate is then transferred again to the aligner and subjected to exposure processing. The substrate for which exposure processing for the second time has been finished is transferred to a first processing system and again subjected to post-exposure baking. The time periods from the ends of the exposure processing to the starts of the post-exposure baking for the first time and the second time are controlled to be equal. According to the present invention, in pattern forming processing in which exposure processing is performed a plurality of times between the resist film forming processing and the developing treatment, a pattern with a desired dimension can be finally formed.Type: ApplicationFiled: July 19, 2007Publication date: August 20, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Yoshiaki Yamada, Tadayuki Yamaguchi, Yuuichi Yamamoto, Yasuhito Saiga
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Publication number: 20090199052Abstract: A management system includes a plurality of analyzers; and a computer system connected to the analyzers via a network, wherein each of the analyzers comprises: a data transmitter for transmitting data produced by the analyzer to the computer system via the network, and wherein the computer system includes a memory under control of a processor, the memory storing instructions enabling the processor to carry out operations, comprising: (a) receiving a plurality of data transmitted from the data transmitters of the plurality of analyzers; (b) generating an aggregate result used for determining a determination condition for making a determination as to whether or not a notification to a user of the analyzer is required based on the plurality of received data; and (c) outputting the aggregate result. A computer system and a method of providing information are also disclosed.Type: ApplicationFiled: January 30, 2009Publication date: August 6, 2009Inventors: Tadayuki Yamaguchi, Atsushi Shirakami, Takeshi Matsumoto
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Publication number: 20090185151Abstract: A substrate processing system (100) includes a first automated substrate transfer line or main transfer line (20) configured to transfer wafers (W) over the entire system and to transfer wafers to and from respective process sections, and a second automated substrate transfer line or auxiliary transfer line (30) configured to transfer wafers (W) inside a photolithography process section (1a). The auxiliary transfer line (30) is disposed as a transfer mechanism independent of the main transfer line (20). An OHT (31) is configured to travel around on the auxiliary transfer line (30) having a loop shape, so as to transfer wafers (W) to and from and among the respective process apparatuses in the photolithography process section (1a).Type: ApplicationFiled: June 15, 2007Publication date: July 23, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Yuichi Yamamoto, Tadayuki Yamaguchi, Yasuhito Saiga, Yoshiaki Yamada
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Patent number: 7403873Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when troubles arise repair from the control device (1) is possible. The control device (1) tallies sample data, and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and can perform external quality control in real time.Type: GrantFiled: April 14, 2005Date of Patent: July 22, 2008Assignee: Sysmex CorporationInventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Publication number: 20080114559Abstract: A quality control method using a plurality of analyzers and a control device connected to the analyzers via a network, the method comprising: (a) measuring quality control samples by the analyzers; (b) collecting a plurality of quality control data obtained by measuring the quality control samples; (c) implementing a quality control by the control device based on the collected quality control data; (d) obtaining uncertainty of measurement of analyzer based on uncertainty of analyzer calibration and the quality control data; (e) outputting a result of the quality control; and (f) outputting the uncertainty of measurement is disclosed. A quality control system and an analyzer are also disclosed.Type: ApplicationFiled: September 21, 2007Publication date: May 15, 2008Inventors: Tadayuki Yamaguchi, Atsushi Shirakami, Etsuro Shinkai, Yasuhiro Ochi
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Publication number: 20080046503Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when troubles arise repair from the control device (1) is possible. The control device (1) tallies sample data, and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and can perform external quality control in real time.Type: ApplicationFiled: August 15, 2007Publication date: February 21, 2008Applicant: SYSMEX CORPORATIONInventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama
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Publication number: 20080046208Abstract: The present invention quickly resolves troubles in an analyzer and performs effective external quality control management. An analyzer (2) and a control device (1) are connected by a network (3). Error data and sample data taken from assay of a quality control substance are transmitted from the control device (1) to the analyzer (2). The analyzer (2) is made to be remotely operable from the control device (1) and when troubles arise repair from the control device (1) is possible. The control device (1) tallies sample data, and provides the tally results to a Web page. The analyzer (2) accesses the Web page using a WWW browser, and can perform external quality control in real time.Type: ApplicationFiled: August 15, 2007Publication date: February 21, 2008Applicant: SYSMEX CORPORATIONInventors: Ken'ichi Okuno, Hiroyuki Morihara, Tadayuki Yamaguchi, Tomomi Sugiyama