Patents by Inventor Tae-Hoon Kwon

Tae-Hoon Kwon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6819800
    Abstract: A moving image compression/decompression apparatus and method that uses, for example, a wavelet transform technique in order to improve a compression rate is disclosed. The moving image compression/decompression apparatus includes an A/D converter for converting moving image data into digital data. The digital data is divided into a plurality of level regions using a wavelet transformer. The apparatus also includes a quantizer for quantizing the data that has been transform with a predetermined weight that corresponds to each of the regions. The apparatus also includes an SZT coder for performing a lossless DPCM coding with respect to the data quantized sequentially form a high level region to a low level regionusing a similarity between the level regions based on a predetermined SZT map.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: November 16, 2004
    Assignee: Rifatron Co., Ltd.
    Inventors: Woo Young Jung, Tae Hoon Kwon
  • Patent number: 6573146
    Abstract: A complementary bipolar transistor having a lateral npn bipolar transistor, a vertical and a lateral pnp bipolar transistor, an integrated injection logic, a diffusion capacitor, a polysilicon capacitor and polysilicon resistors are disclosed. The lateral pnp bipolar transistor has an emitter region and a collector region which includes high-density regions and low-density regions, and the emitter region is formed in an n type tub region. In the integrated injection logic circuit, collector regions are surrounded by a high-density p type region, and low-density p type regions are formed under the collector regions. The diffusion capacitor and the polysilicon capacitor are formed in one substrate. The diffusion regions except the regions formed by diffusing the impurities in the polysilicon resistors into the epitaxial layer are formed before forming the polysilicon resistors, and polysilicon electrodes are formed along with the polysilicon resistors.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: June 3, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hwan Kim, Tae-Hoon Kwon, Cheol-Joong Kim, Suk-Kyun Lee
  • Publication number: 20020122600
    Abstract: A moving image compression/decompression apparatus and method that uses, for example, a wavelet transform technique in order to improve a compression rate is disclosed. The moving image compression/decompression apparatus includes an A/D converter for converting moving image data into digital data. The digital data is divided into a plurality of level regions using a wavelet transformer. The apparatus also includes a quantizer for quantizing the data that has been transform with a predetermined weight that corresponds to each of the regions. The apparatus also includes an SZT coder for performing a lossless DPCM coding with respect to the data quantized sequentially form a high level region to a low level regionusing a similarity between the level regions based on a predetermined SZT map.
    Type: Application
    Filed: April 6, 2001
    Publication date: September 5, 2002
    Inventors: Woo Young Jung, Tae Hoon Kwon
  • Publication number: 20020017703
    Abstract: A complementary bipolar transistor having a lateral npn bipolar transistor, a vertical and a lateral pnp bipolar transistor, an integrated injection logic, a diffusion capacitor, a polysilicon capacitor and polysilicon resistors are disclosed. The lateral pnp bipolar transistor has an emitter region and a collector region which includes high-density regions and low-density regions, and the emitter region is formed in an n type tub region. In the integrated injection logic circuit, collector regions are surrounded by a high-density p type region, and low-density p type regions are formed under the collector regions. The diffusion capacitor and the polysilicon capacitor are formed in one substrate. The diffusion regions except the regions formed by diffusing the impurities in the polysilicon resistors into the epitaxial layer are formed before forming the polysilicon resistors, and polysilicon electrodes are formed along with the polysilicon resistors.
    Type: Application
    Filed: October 16, 2001
    Publication date: February 14, 2002
    Inventors: Jong-Hwan Kim, Tae-Hoon Kwon, Cheol-Joong Kim, Suk-Kyun Lee
  • Patent number: 6326674
    Abstract: A complementary bipolar transistor having a lateral npn bipolar transistor, a vertical and a lateral pnp bipolar transistor, an integrated injection logic, a diffusion capacitor, a polysilicon capacitor and polysilicon resistors are disclosed. The lateral pnp bipolar transistor has an emitter region and a collector region which includes high-density regions and low-density regions, and the emitter region is formed in an n type tub region. In the integrated injection logic circuit, collector regions are surrounded by a high-density p type region, and low-density p type regions are formed under the collector regions. The diffusion capacitor and the polysilicon capacitor are formed in one substrate. The diffusion regions except the regions formed by diffusing the impurities in the polysilicon resistors into the epitaxial layer are formed before forming the polysilicon resistors, and polysilicon electrodes are formed along with the polysilicon resistors.
    Type: Grant
    Filed: November 30, 1999
    Date of Patent: December 4, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hwan Kim, Tae-Hoon Kwon, Cheol-Joong Kim, Suk-Kyun Lee
  • Patent number: 6005283
    Abstract: A complementary bipolar transistor having a lateral npn bipolar trasistor, a vertical and a lateral pnp bipolar transistor, an integrated injection logic, a diffusion capacitor, a polysilicon capacitor and polysilicon resistors are disclosed. The lateral pnp bipolar transistor has an emitter region and a collector region which includes high-density regions and low-density regions, and the emitter region is formed in an n type tub region. In the integrated injection logic circuit, collector regions are surrounded by a high-density p type region, and low-density p type regions are formed under the collector regions. The diffusion capacitor and the polysilicon capacitor are formed in one substrate. The diffusion regions except the regions formed by diffusing the impurities in the polysilicon resistors into the epitaxial layer are formed before forming the polysilicon resistors, and polysilicon electrodes are formed along with the polysilicon resistors.
    Type: Grant
    Filed: October 10, 1997
    Date of Patent: December 21, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Hwan Kim, Tae-Hoon Kwon, Cheol-Joong Kim, Suk-Kyun Lee